Erbium-doped planar waveguides with atomic layer deposition method

Kimmo Solehmainen, Päivi Heimala, Markku Kapulainen, Kirsi Polamo, Runar Törnqvist

Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

1 Citation (Scopus)
Original languageEnglish
Title of host publicationRare-Earth-Doped Materials and Devices VII
PublisherInternational Society for Optics and Photonics SPIE
Pages121-128
ISBN (Print)0-8194-4790-0
DOIs
Publication statusPublished - 2003
MoE publication typeA4 Article in a conference publication
EventRare-Earth-Doped Materials and Devices VII: Part of Integrated Optoelectronic Devices symposium, OPTO 2003 - San Jose, United States
Duration: 28 Jan 200330 Jan 2003

Publication series

SeriesProceedings of SPIE
Volume4990
ISSN0277-786X

Conference

ConferenceRare-Earth-Doped Materials and Devices VII
CountryUnited States
CitySan Jose
Period28/01/0330/01/03

Keywords

  • aluminium oxide
  • atomic layer deposition
  • erbium
  • optical amplification
  • optical waveguides

Cite this

Solehmainen, K., Heimala, P., Kapulainen, M., Polamo, K., & Törnqvist, R. (2003). Erbium-doped planar waveguides with atomic layer deposition method. In Rare-Earth-Doped Materials and Devices VII (pp. 121-128). International Society for Optics and Photonics SPIE. Proceedings of SPIE, Vol.. 4990 https://doi.org/10.1117/12.474758