Etching through silicon wafer in inductively coupled plasma

Sami Franssila, Jyrki Kiihamäki, Jani Karttunen

    Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientific

    Original languageEnglish
    Title of host publicationConference on High Aspect Ratio Microstructure Technology, HARMST'99
    Pages24 - 25
    Publication statusPublished - 1999
    MoE publication typeB3 Non-refereed article in conference proceedings
    EventConference on High Aspect Ratio Microstructure Technology, HARMST '99 - Kisarazu, Japan
    Duration: 13 Jun 199915 Jun 1999

    Conference

    ConferenceConference on High Aspect Ratio Microstructure Technology, HARMST '99
    CountryJapan
    CityKisarazu
    Period13/06/9915/06/99

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