Etching through silicon wafer in inductively coupled plasma

Sami Franssila, Jyrki Kiihamäki, Jani Karttunen

Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientific

Original languageEnglish
Title of host publicationConference on High Aspect Ratio Microstructure Technology, HARMST'99
Pages24 - 25
Publication statusPublished - 1999
MoE publication typeB3 Non-refereed article in conference proceedings
EventConference on High Aspect Ratio Microstructure Technology, HARMST '99 - Kisarazu, Japan
Duration: 13 Jun 199915 Jun 1999

Conference

ConferenceConference on High Aspect Ratio Microstructure Technology, HARMST '99
CountryJapan
CityKisarazu
Period13/06/9915/06/99

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