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Excellent silicon surface passivation using dimethylaluminium chloride as Al source for atomic layer deposited Al2O3
Shuo Li (Corresponding Author), Yameng Bao, Mikko Laitinen, Timo Sajavaara, Matti Putkonen, Hele Savin
Research output: Contribution to journal › Article › Scientific › peer-review
14
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(Scopus)