Experimental study of Evanohm thin film resistors at subkelvin temperatures

A.F. Satrapinski, A.M. Savin, S. Novikov, Ossi Hahtela

    Research output: Contribution to journalArticleScientificpeer-review

    4 Citations (Scopus)

    Abstract

    Thin film resistors, based on the Evanohm (Ni75%Cr20%Cu2.5%Al2.5%) alloy, have been investigated at cryogenic temperatures. The objective of the study is the development of the high value resistor for precision electrical measurements at low temperature and particularly for metrological triangle experiments. Thin film resistors of different configurations have been designed and fabricated by the thermal evaporation process. The resistivity of investigated resistors is 110 × 10−8 Ω m; the resistance exhibits a Kondo minimum at a temperature near 30 K and increases with further reduction of temperature. In the temperature range 50–65 mK, the temperature coefficient reaches −20 × 10−3 K−1. Power dependence measurements at subkelvin temperatures demonstrate that noticeable electron overheating takes place only at the power level above 10 pW for a 500 kΩ resistor. The electron–phonon coupling constant for the fabricated Evanohm thin films has been derived from experimental results.
    Original languageEnglish
    Number of pages5
    JournalMeasurement Science and Technology
    Volume19
    Issue number5
    DOIs
    Publication statusPublished - 2008
    MoE publication typeA1 Journal article-refereed

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    resistors
    Resistors
    Thin Films
    Experimental Study
    Thin films
    thin films
    Temperature
    temperature
    cryogenic temperature
    triangles
    electrical measurement
    Resistivity
    Evaporation
    Thermal evaporation
    evaporation
    Triangle
    Cryogenics
    electrical resistivity
    Electron
    coefficients

    Cite this

    Satrapinski, A.F. ; Savin, A.M. ; Novikov, S. ; Hahtela, Ossi. / Experimental study of Evanohm thin film resistors at subkelvin temperatures. In: Measurement Science and Technology. 2008 ; Vol. 19, No. 5.
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    abstract = "Thin film resistors, based on the Evanohm (Ni75{\%}Cr20{\%}Cu2.5{\%}Al2.5{\%}) alloy, have been investigated at cryogenic temperatures. The objective of the study is the development of the high value resistor for precision electrical measurements at low temperature and particularly for metrological triangle experiments. Thin film resistors of different configurations have been designed and fabricated by the thermal evaporation process. The resistivity of investigated resistors is 110 × 10−8 Ω m; the resistance exhibits a Kondo minimum at a temperature near 30 K and increases with further reduction of temperature. In the temperature range 50–65 mK, the temperature coefficient reaches −20 × 10−3 K−1. Power dependence measurements at subkelvin temperatures demonstrate that noticeable electron overheating takes place only at the power level above 10 pW for a 500 kΩ resistor. The electron–phonon coupling constant for the fabricated Evanohm thin films has been derived from experimental results.",
    author = "A.F. Satrapinski and A.M. Savin and S. Novikov and Ossi Hahtela",
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    Experimental study of Evanohm thin film resistors at subkelvin temperatures. / Satrapinski, A.F.; Savin, A.M.; Novikov, S.; Hahtela, Ossi.

    In: Measurement Science and Technology, Vol. 19, No. 5, 2008.

    Research output: Contribution to journalArticleScientificpeer-review

    TY - JOUR

    T1 - Experimental study of Evanohm thin film resistors at subkelvin temperatures

    AU - Satrapinski, A.F.

    AU - Savin, A.M.

    AU - Novikov, S.

    AU - Hahtela, Ossi

    PY - 2008

    Y1 - 2008

    N2 - Thin film resistors, based on the Evanohm (Ni75%Cr20%Cu2.5%Al2.5%) alloy, have been investigated at cryogenic temperatures. The objective of the study is the development of the high value resistor for precision electrical measurements at low temperature and particularly for metrological triangle experiments. Thin film resistors of different configurations have been designed and fabricated by the thermal evaporation process. The resistivity of investigated resistors is 110 × 10−8 Ω m; the resistance exhibits a Kondo minimum at a temperature near 30 K and increases with further reduction of temperature. In the temperature range 50–65 mK, the temperature coefficient reaches −20 × 10−3 K−1. Power dependence measurements at subkelvin temperatures demonstrate that noticeable electron overheating takes place only at the power level above 10 pW for a 500 kΩ resistor. The electron–phonon coupling constant for the fabricated Evanohm thin films has been derived from experimental results.

    AB - Thin film resistors, based on the Evanohm (Ni75%Cr20%Cu2.5%Al2.5%) alloy, have been investigated at cryogenic temperatures. The objective of the study is the development of the high value resistor for precision electrical measurements at low temperature and particularly for metrological triangle experiments. Thin film resistors of different configurations have been designed and fabricated by the thermal evaporation process. The resistivity of investigated resistors is 110 × 10−8 Ω m; the resistance exhibits a Kondo minimum at a temperature near 30 K and increases with further reduction of temperature. In the temperature range 50–65 mK, the temperature coefficient reaches −20 × 10−3 K−1. Power dependence measurements at subkelvin temperatures demonstrate that noticeable electron overheating takes place only at the power level above 10 pW for a 500 kΩ resistor. The electron–phonon coupling constant for the fabricated Evanohm thin films has been derived from experimental results.

    U2 - 10.1088/0957-0233/19/5/055102

    DO - 10.1088/0957-0233/19/5/055102

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    VL - 19

    JO - Measurement Science and Technology

    JF - Measurement Science and Technology

    SN - 0957-0233

    IS - 5

    ER -