Abstract
| Original language | English |
|---|---|
| Pages (from-to) | 701-704 |
| Number of pages | 4 |
| Journal | Synthetic Metals |
| Volume | 139 |
| Issue number | 3 |
| DOIs | |
| Publication status | Published - 2003 |
| MoE publication type | A1 Journal article-refereed |
| Event | Fifth International Topical Conference on Optical Probes of Conjugated Polymers and Organic and Inorganic Nanostructures - Venice, Italy Duration: 9 Feb 2003 → 14 Feb 2003 |
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Keywords
- opals
- functionalisation
- thin films
- photonic crystals
- nanoimprint lithography
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Exploring integration prospects of opal-based photonic crystals. / Romanov, S.G. (Corresponding Author); Ferrand, P.; Egen, M.; Zentel, R.; Ahopelto, Jouni; Gaponik, N.; Eychmueller, A.; Rogach, A.L.; Sotomayor Torres, C.M.
In: Synthetic Metals, Vol. 139, No. 3, 2003, p. 701-704.Research output: Contribution to journal › Article › Scientific › peer-review
TY - JOUR
T1 - Exploring integration prospects of opal-based photonic crystals
AU - Romanov, S.G.
AU - Ferrand, P.
AU - Egen, M.
AU - Zentel, R.
AU - Ahopelto, Jouni
AU - Gaponik, N.
AU - Eychmueller, A.
AU - Rogach, A.L.
AU - Sotomayor Torres, C.M
PY - 2003
Y1 - 2003
N2 - Different methods of functionalisation of thin opal films are discussed, including synthesis of opals on pre-patterned substrates, post-synthesis electron beam lithography, preparation of opals with heterogeneous photonic band gap structure and integrating opals with light sources. These approaches have been tested experimentally and key technological problems have been identified.
AB - Different methods of functionalisation of thin opal films are discussed, including synthesis of opals on pre-patterned substrates, post-synthesis electron beam lithography, preparation of opals with heterogeneous photonic band gap structure and integrating opals with light sources. These approaches have been tested experimentally and key technological problems have been identified.
KW - opals
KW - functionalisation
KW - thin films
KW - photonic crystals
KW - nanoimprint lithography
U2 - 10.1016/S0379-6779(03)00245-5
DO - 10.1016/S0379-6779(03)00245-5
M3 - Article
VL - 139
SP - 701
EP - 704
JO - Synthetic Metals
JF - Synthetic Metals
SN - 0379-6779
IS - 3
ER -