Fabrication of ion-exchanged channel waveguides directly into integrated circuit mask plates

Seppo Honkanen, Ari Tervonen, Hans von Bagh, Arto Salin, Matti Leppihalme

Research output: Contribution to journalArticleScientificpeer-review

11 Citations (Scopus)

Abstract

Optical channel waveguides have been fabricated into integrated circuit lithography mask plates by silver‐sodium ion exchange.
The process combines the advantages of Ag thin‐film ion sources and the accurate and reliable patterning of chromium films on mask plates.
The process is potentially suitable for cheap mass production, since no lithography is needed during the actual waveguide fabrication. The tailoring of waveguide cross sections by modifying the electric field distribution inside the glass is also presented.
Original languageEnglish
Pages (from-to)296-298
JournalApplied Physics Letters
Volume51
Issue number5
DOIs
Publication statusPublished - 1987
MoE publication typeA1 Journal article-refereed

Fingerprint

integrated circuits
masks
waveguides
fabrication
lithography
ion sources
chromium
electric fields
glass
cross sections
ions

Cite this

Honkanen, Seppo ; Tervonen, Ari ; Bagh, Hans von ; Salin, Arto ; Leppihalme, Matti. / Fabrication of ion-exchanged channel waveguides directly into integrated circuit mask plates. In: Applied Physics Letters. 1987 ; Vol. 51, No. 5. pp. 296-298.
@article{36ff153f75a64ee8bf3e04ec91df153f,
title = "Fabrication of ion-exchanged channel waveguides directly into integrated circuit mask plates",
abstract = "Optical channel waveguides have been fabricated into integrated circuit lithography mask plates by silver‐sodium ion exchange. The process combines the advantages of Ag thin‐film ion sources and the accurate and reliable patterning of chromium films on mask plates. The process is potentially suitable for cheap mass production, since no lithography is needed during the actual waveguide fabrication. The tailoring of waveguide cross sections by modifying the electric field distribution inside the glass is also presented.",
author = "Seppo Honkanen and Ari Tervonen and Bagh, {Hans von} and Arto Salin and Matti Leppihalme",
year = "1987",
doi = "10.1063/1.98448",
language = "English",
volume = "51",
pages = "296--298",
journal = "Applied Physics Letters",
issn = "0003-6951",
number = "5",

}

Honkanen, S, Tervonen, A, Bagh, HV, Salin, A & Leppihalme, M 1987, 'Fabrication of ion-exchanged channel waveguides directly into integrated circuit mask plates', Applied Physics Letters, vol. 51, no. 5, pp. 296-298. https://doi.org/10.1063/1.98448

Fabrication of ion-exchanged channel waveguides directly into integrated circuit mask plates. / Honkanen, Seppo; Tervonen, Ari; Bagh, Hans von; Salin, Arto; Leppihalme, Matti.

In: Applied Physics Letters, Vol. 51, No. 5, 1987, p. 296-298.

Research output: Contribution to journalArticleScientificpeer-review

TY - JOUR

T1 - Fabrication of ion-exchanged channel waveguides directly into integrated circuit mask plates

AU - Honkanen, Seppo

AU - Tervonen, Ari

AU - Bagh, Hans von

AU - Salin, Arto

AU - Leppihalme, Matti

PY - 1987

Y1 - 1987

N2 - Optical channel waveguides have been fabricated into integrated circuit lithography mask plates by silver‐sodium ion exchange. The process combines the advantages of Ag thin‐film ion sources and the accurate and reliable patterning of chromium films on mask plates. The process is potentially suitable for cheap mass production, since no lithography is needed during the actual waveguide fabrication. The tailoring of waveguide cross sections by modifying the electric field distribution inside the glass is also presented.

AB - Optical channel waveguides have been fabricated into integrated circuit lithography mask plates by silver‐sodium ion exchange. The process combines the advantages of Ag thin‐film ion sources and the accurate and reliable patterning of chromium films on mask plates. The process is potentially suitable for cheap mass production, since no lithography is needed during the actual waveguide fabrication. The tailoring of waveguide cross sections by modifying the electric field distribution inside the glass is also presented.

U2 - 10.1063/1.98448

DO - 10.1063/1.98448

M3 - Article

VL - 51

SP - 296

EP - 298

JO - Applied Physics Letters

JF - Applied Physics Letters

SN - 0003-6951

IS - 5

ER -