Fabrication of mesas with micro- and nanopatterned surface relief used as working stamps for step and stamp imprint lithography

Arne Schleunitz, Christian Spreu, Tomi Haatainen, Anna Klukowska, Helmut Schift (Corresponding Author)

    Research output: Contribution to journalArticleScientificpeer-review

    6 Citations (Scopus)

    Abstract

    A manufacturing concept to fabricate working stamps with defined mesa structures using combined nanoimprint and photolithography is presented. OrmoStamp, an UV-curable organic-inorganic hybrid polymer, was used as mold material. 30 μm high large mesa structures (4×4 mm2) with sharp borders and almost vertical sidewalls were manufactured. On top they featured nanograting patterns with 200 nm height and lateral size as a surface relief. The good thermal decoupling of stamp body and imprinted substrate and the high planarity (divergence <50 nm) make the stamp very suitable for thermal step and repeat nanoimprint lithography of confined patterns with low stitching errors. Up to 210 imprints were performed with a single mesa into a 325 nm thin layer of mr-I 7030E.
    Original languageEnglish
    Pages (from-to)c6m37-c6m40
    Number of pages4
    JournalJournal of Vacuum Science and Technology B: Nanotechnology and Microelectronics
    Volume28
    Issue number6
    DOIs
    Publication statusPublished - 2010
    MoE publication typeA1 Journal article-refereed

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