Fabrication of mesas with micro- and nanopatterned surface relief used as working stamps for step and stamp imprint lithography

Arne Schleunitz, Christian Spreu, Tomi Haatainen, Anna Klukowska, Helmut Schift (Corresponding Author)

    Research output: Contribution to journalArticleScientificpeer-review

    6 Citations (Scopus)

    Abstract

    A manufacturing concept to fabricate working stamps with defined mesa structures using combined nanoimprint and photolithography is presented. OrmoStamp, an UV-curable organic-inorganic hybrid polymer, was used as mold material. 30 μm high large mesa structures (4×4 mm2) with sharp borders and almost vertical sidewalls were manufactured. On top they featured nanograting patterns with 200 nm height and lateral size as a surface relief. The good thermal decoupling of stamp body and imprinted substrate and the high planarity (divergence <50 nm) make the stamp very suitable for thermal step and repeat nanoimprint lithography of confined patterns with low stitching errors. Up to 210 imprints were performed with a single mesa into a 325 nm thin layer of mr-I 7030E.
    Original languageEnglish
    Pages (from-to)c6m37-c6m40
    Number of pages4
    JournalJournal of Vacuum Science and Technology B: Nanotechnology and Microelectronics
    Volume28
    Issue number6
    DOIs
    Publication statusPublished - 2010
    MoE publication typeA1 Journal article-refereed

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    Lithography
    Nanoimprint lithography
    Fabrication
    Photolithography
    Polymers
    Substrates
    Hot Temperature

    Cite this

    @article{6e27f84013a14454b2a56a10ea1c2a8d,
    title = "Fabrication of mesas with micro- and nanopatterned surface relief used as working stamps for step and stamp imprint lithography",
    abstract = "A manufacturing concept to fabricate working stamps with defined mesa structures using combined nanoimprint and photolithography is presented. OrmoStamp, an UV-curable organic-inorganic hybrid polymer, was used as mold material. 30 μm high large mesa structures (4×4 mm2) with sharp borders and almost vertical sidewalls were manufactured. On top they featured nanograting patterns with 200 nm height and lateral size as a surface relief. The good thermal decoupling of stamp body and imprinted substrate and the high planarity (divergence <50 nm) make the stamp very suitable for thermal step and repeat nanoimprint lithography of confined patterns with low stitching errors. Up to 210 imprints were performed with a single mesa into a 325 nm thin layer of mr-I 7030E.",
    author = "Arne Schleunitz and Christian Spreu and Tomi Haatainen and Anna Klukowska and Helmut Schift",
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    volume = "28",
    pages = "c6m37--c6m40",
    journal = "Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics",
    issn = "2166-2746",
    publisher = "AVS Science and Technology Society",
    number = "6",

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    Fabrication of mesas with micro- and nanopatterned surface relief used as working stamps for step and stamp imprint lithography. / Schleunitz, Arne; Spreu, Christian; Haatainen, Tomi; Klukowska, Anna; Schift, Helmut (Corresponding Author).

    In: Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics, Vol. 28, No. 6, 2010, p. c6m37-c6m40.

    Research output: Contribution to journalArticleScientificpeer-review

    TY - JOUR

    T1 - Fabrication of mesas with micro- and nanopatterned surface relief used as working stamps for step and stamp imprint lithography

    AU - Schleunitz, Arne

    AU - Spreu, Christian

    AU - Haatainen, Tomi

    AU - Klukowska, Anna

    AU - Schift, Helmut

    N1 - Project code: 21975

    PY - 2010

    Y1 - 2010

    N2 - A manufacturing concept to fabricate working stamps with defined mesa structures using combined nanoimprint and photolithography is presented. OrmoStamp, an UV-curable organic-inorganic hybrid polymer, was used as mold material. 30 μm high large mesa structures (4×4 mm2) with sharp borders and almost vertical sidewalls were manufactured. On top they featured nanograting patterns with 200 nm height and lateral size as a surface relief. The good thermal decoupling of stamp body and imprinted substrate and the high planarity (divergence <50 nm) make the stamp very suitable for thermal step and repeat nanoimprint lithography of confined patterns with low stitching errors. Up to 210 imprints were performed with a single mesa into a 325 nm thin layer of mr-I 7030E.

    AB - A manufacturing concept to fabricate working stamps with defined mesa structures using combined nanoimprint and photolithography is presented. OrmoStamp, an UV-curable organic-inorganic hybrid polymer, was used as mold material. 30 μm high large mesa structures (4×4 mm2) with sharp borders and almost vertical sidewalls were manufactured. On top they featured nanograting patterns with 200 nm height and lateral size as a surface relief. The good thermal decoupling of stamp body and imprinted substrate and the high planarity (divergence <50 nm) make the stamp very suitable for thermal step and repeat nanoimprint lithography of confined patterns with low stitching errors. Up to 210 imprints were performed with a single mesa into a 325 nm thin layer of mr-I 7030E.

    U2 - 10.1116/1.3497022

    DO - 10.1116/1.3497022

    M3 - Article

    VL - 28

    SP - c6m37-c6m40

    JO - Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics

    JF - Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics

    SN - 2166-2746

    IS - 6

    ER -