Fabrication of mesas with micro- and nanopatterned surface relief used as working stamps for step and stamp imprint lithography

Arne Schleunitz, Christian Spreu, Tomi Haatainen, Anna Klukowska, Helmut Schift (Corresponding Author)

Research output: Contribution to journalArticleScientificpeer-review

6 Citations (Scopus)

Abstract

A manufacturing concept to fabricate working stamps with defined mesa structures using combined nanoimprint and photolithography is presented. OrmoStamp, an UV-curable organic-inorganic hybrid polymer, was used as mold material. 30 μm high large mesa structures (4×4 mm2) with sharp borders and almost vertical sidewalls were manufactured. On top they featured nanograting patterns with 200 nm height and lateral size as a surface relief. The good thermal decoupling of stamp body and imprinted substrate and the high planarity (divergence <50 nm) make the stamp very suitable for thermal step and repeat nanoimprint lithography of confined patterns with low stitching errors. Up to 210 imprints were performed with a single mesa into a 325 nm thin layer of mr-I 7030E.
Original languageEnglish
Pages (from-to)c6m37-c6m40
Number of pages4
JournalJournal of Vacuum Science and Technology B: Nanotechnology and Microelectronics
Volume28
Issue number6
DOIs
Publication statusPublished - 2010
MoE publication typeA1 Journal article-refereed

Fingerprint

Lithography
Nanoimprint lithography
Fabrication
Photolithography
Polymers
Substrates
Hot Temperature

Cite this

@article{6e27f84013a14454b2a56a10ea1c2a8d,
title = "Fabrication of mesas with micro- and nanopatterned surface relief used as working stamps for step and stamp imprint lithography",
abstract = "A manufacturing concept to fabricate working stamps with defined mesa structures using combined nanoimprint and photolithography is presented. OrmoStamp, an UV-curable organic-inorganic hybrid polymer, was used as mold material. 30 μm high large mesa structures (4×4 mm2) with sharp borders and almost vertical sidewalls were manufactured. On top they featured nanograting patterns with 200 nm height and lateral size as a surface relief. The good thermal decoupling of stamp body and imprinted substrate and the high planarity (divergence <50 nm) make the stamp very suitable for thermal step and repeat nanoimprint lithography of confined patterns with low stitching errors. Up to 210 imprints were performed with a single mesa into a 325 nm thin layer of mr-I 7030E.",
author = "Arne Schleunitz and Christian Spreu and Tomi Haatainen and Anna Klukowska and Helmut Schift",
note = "Project code: 21975",
year = "2010",
doi = "10.1116/1.3497022",
language = "English",
volume = "28",
pages = "c6m37--c6m40",
journal = "Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics",
issn = "2166-2746",
publisher = "AVS Science and Technology Society",
number = "6",

}

Fabrication of mesas with micro- and nanopatterned surface relief used as working stamps for step and stamp imprint lithography. / Schleunitz, Arne; Spreu, Christian; Haatainen, Tomi; Klukowska, Anna; Schift, Helmut (Corresponding Author).

In: Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics, Vol. 28, No. 6, 2010, p. c6m37-c6m40.

Research output: Contribution to journalArticleScientificpeer-review

TY - JOUR

T1 - Fabrication of mesas with micro- and nanopatterned surface relief used as working stamps for step and stamp imprint lithography

AU - Schleunitz, Arne

AU - Spreu, Christian

AU - Haatainen, Tomi

AU - Klukowska, Anna

AU - Schift, Helmut

N1 - Project code: 21975

PY - 2010

Y1 - 2010

N2 - A manufacturing concept to fabricate working stamps with defined mesa structures using combined nanoimprint and photolithography is presented. OrmoStamp, an UV-curable organic-inorganic hybrid polymer, was used as mold material. 30 μm high large mesa structures (4×4 mm2) with sharp borders and almost vertical sidewalls were manufactured. On top they featured nanograting patterns with 200 nm height and lateral size as a surface relief. The good thermal decoupling of stamp body and imprinted substrate and the high planarity (divergence <50 nm) make the stamp very suitable for thermal step and repeat nanoimprint lithography of confined patterns with low stitching errors. Up to 210 imprints were performed with a single mesa into a 325 nm thin layer of mr-I 7030E.

AB - A manufacturing concept to fabricate working stamps with defined mesa structures using combined nanoimprint and photolithography is presented. OrmoStamp, an UV-curable organic-inorganic hybrid polymer, was used as mold material. 30 μm high large mesa structures (4×4 mm2) with sharp borders and almost vertical sidewalls were manufactured. On top they featured nanograting patterns with 200 nm height and lateral size as a surface relief. The good thermal decoupling of stamp body and imprinted substrate and the high planarity (divergence <50 nm) make the stamp very suitable for thermal step and repeat nanoimprint lithography of confined patterns with low stitching errors. Up to 210 imprints were performed with a single mesa into a 325 nm thin layer of mr-I 7030E.

U2 - 10.1116/1.3497022

DO - 10.1116/1.3497022

M3 - Article

VL - 28

SP - c6m37-c6m40

JO - Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics

JF - Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics

SN - 2166-2746

IS - 6

ER -