Fabrication of micro-optical structures by applying negative tone hybrid glass materials and greyscale lithography

Ari Kärkkäinen, J.T. Rantala, M.R. Descour

Research output: Contribution to journalArticleScientificpeer-review

9 Citations (Scopus)

Abstract

Direct lithographic patterning of lenslet arrays with lens sags up to 75 /spl mu/m and opto-mechanical structures with thickness up to 118 /spl mu/m is demonstrated. using negative tone hybrid glass materials and greyscale and binary photomasks.
The hybrid glass material features a maximum extinction coefficient of 2.0 /spl times/ 10/sup -4/ /spl mu/m/sup -1/ between 450 and 1600 nm, a refractive index of 1.531 at 632.8 nm and an estimated Abbe number of 45.
The patterned structures exhibit rms surface roughness between 10 to 45 nm.
Original languageEnglish
Pages (from-to)23-24
JournalElectronics Letters
Volume38
Issue number1
DOIs
Publication statusPublished - 2002
MoE publication typeA1 Journal article-refereed

Fingerprint

Lithography
Fabrication
Glass
Photomasks
Lenses
Refractive index
Surface roughness

Keywords

  • nanoimprint lithography

Cite this

Kärkkäinen, Ari ; Rantala, J.T. ; Descour, M.R. / Fabrication of micro-optical structures by applying negative tone hybrid glass materials and greyscale lithography. In: Electronics Letters. 2002 ; Vol. 38, No. 1. pp. 23-24.
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Fabrication of micro-optical structures by applying negative tone hybrid glass materials and greyscale lithography. / Kärkkäinen, Ari; Rantala, J.T.; Descour, M.R.

In: Electronics Letters, Vol. 38, No. 1, 2002, p. 23-24.

Research output: Contribution to journalArticleScientificpeer-review

TY - JOUR

T1 - Fabrication of micro-optical structures by applying negative tone hybrid glass materials and greyscale lithography

AU - Kärkkäinen, Ari

AU - Rantala, J.T.

AU - Descour, M.R.

PY - 2002

Y1 - 2002

N2 - Direct lithographic patterning of lenslet arrays with lens sags up to 75 /spl mu/m and opto-mechanical structures with thickness up to 118 /spl mu/m is demonstrated. using negative tone hybrid glass materials and greyscale and binary photomasks. The hybrid glass material features a maximum extinction coefficient of 2.0 /spl times/ 10/sup -4/ /spl mu/m/sup -1/ between 450 and 1600 nm, a refractive index of 1.531 at 632.8 nm and an estimated Abbe number of 45. The patterned structures exhibit rms surface roughness between 10 to 45 nm.

AB - Direct lithographic patterning of lenslet arrays with lens sags up to 75 /spl mu/m and opto-mechanical structures with thickness up to 118 /spl mu/m is demonstrated. using negative tone hybrid glass materials and greyscale and binary photomasks. The hybrid glass material features a maximum extinction coefficient of 2.0 /spl times/ 10/sup -4/ /spl mu/m/sup -1/ between 450 and 1600 nm, a refractive index of 1.531 at 632.8 nm and an estimated Abbe number of 45. The patterned structures exhibit rms surface roughness between 10 to 45 nm.

KW - nanoimprint lithography

U2 - 10.1049/el:20020032

DO - 10.1049/el:20020032

M3 - Article

VL - 38

SP - 23

EP - 24

JO - Electronics Letters

JF - Electronics Letters

SN - 0013-5194

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