Fabrication of micro-optical structures by applying negative tone hybrid glass materials and greyscale lithography

Ari Kärkkäinen, J.T. Rantala, M.R. Descour

Research output: Contribution to journalArticleScientificpeer-review

9 Citations (Scopus)

Abstract

Direct lithographic patterning of lenslet arrays with lens sags up to 75 /spl mu/m and opto-mechanical structures with thickness up to 118 /spl mu/m is demonstrated. using negative tone hybrid glass materials and greyscale and binary photomasks.
The hybrid glass material features a maximum extinction coefficient of 2.0 /spl times/ 10/sup -4/ /spl mu/m/sup -1/ between 450 and 1600 nm, a refractive index of 1.531 at 632.8 nm and an estimated Abbe number of 45.
The patterned structures exhibit rms surface roughness between 10 to 45 nm.
Original languageEnglish
Pages (from-to)23-24
JournalElectronics Letters
Volume38
Issue number1
DOIs
Publication statusPublished - 2002
MoE publication typeA1 Journal article-refereed

Keywords

  • nanoimprint lithography

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