Fabrication of narrow aluminium patterns by i-line optical lithography

Jyrki Kiihamäki, Kari Leinonen

    Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

    Original languageEnglish
    Title of host publication16th Nordic Semiconductor Meeting
    Subtitle of host publicationAbstracts
    EditorsHaflidi P. Gislason, Vidar Gudmundsson, Gerlinde Xander
    Place of PublicationReykjavík
    PublisherUniversity of Iceland
    Pages76
    Publication statusPublished - 1994
    MoE publication typeNot Eligible
    Event16th Nordic Semiconductor Meeting - Laugarvatn, Iceland
    Duration: 12 Jun 199415 Jun 1994

    Conference

    Conference16th Nordic Semiconductor Meeting
    CountryIceland
    CityLaugarvatn
    Period12/06/9415/06/94

    Cite this

    Kiihamäki, J., & Leinonen, K. (1994). Fabrication of narrow aluminium patterns by i-line optical lithography. In H. P. Gislason, V. Gudmundsson, & G. Xander (Eds.), 16th Nordic Semiconductor Meeting: Abstracts (pp. 76). University of Iceland.