Fabrication of photonic crystal waveguide elements on SOI

Sanna Yliniemi, Timo Aalto, Päivi Heimala, Panu Pekko, Konstantins Jefimovs, Tero Uusitupa

Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

6 Citations (Scopus)

Abstract

Photonic crystal angle elements fabricated in silicon-on-insulator (SOI) are reported. These elements are modelled using three-dimensional finite difference time domain (FDTD) method. Photonic crystals have a two-dimensional trigonal lattice structure with cylindrical air columns. The period of the crystal is approximately 420 nm and the cylinder diameter is about 330 nm. Defect creation is performed by removing air columns from certain lattice sites. The SOI-layer is one micron thick and it also defines the column height. The FDTD modelling results imply that photonic crystal angle elements with lower height do not exhibit proper light transmission at the telecommunications wavelength window, 1550 nm. FDTD modelling results give higher transmission for TE-polarised light than for TM-polarisation. For better light coupling a taper element with widened waveguide end is designed.
Original languageEnglish
Title of host publicationIntegrated Optical Devices
Subtitle of host publicationFabrication and Testing
EditorsGiancarlo C. Righini
PublisherInternational Society for Optics and Photonics SPIE
Pages23-31
ISBN (Print)0-8194-4739-0
DOIs
Publication statusPublished - 2003
MoE publication typeA4 Article in a conference publication
EventPhotonics Fabrication Europe 2002 (PFE'02) - Bruges, Belgium
Duration: 30 Oct 20021 Nov 2002

Publication series

SeriesProceedings of SPIE
Volume4944
ISSN0277-786X

Conference

ConferencePhotonics Fabrication Europe 2002 (PFE'02)
CountryBelgium
CityBruges
Period30/10/021/11/02

Fingerprint

insulators
photonics
waveguides
fabrication
silicon
crystals
light transmission
air
tapering
finite difference time domain method
polarized light
telecommunication
defects
polarization
wavelengths

Keywords

  • photonic crystals
  • silicon-on-insulator
  • SOI
  • e-beam
  • inductively coupled plasma etching
  • ICP

Cite this

Yliniemi, S., Aalto, T., Heimala, P., Pekko, P., Jefimovs, K., & Uusitupa, T. (2003). Fabrication of photonic crystal waveguide elements on SOI. In G. C. Righini (Ed.), Integrated Optical Devices: Fabrication and Testing (pp. 23-31). International Society for Optics and Photonics SPIE. Proceedings of SPIE, Vol.. 4944 https://doi.org/10.1117/12.468303
Yliniemi, Sanna ; Aalto, Timo ; Heimala, Päivi ; Pekko, Panu ; Jefimovs, Konstantins ; Uusitupa, Tero. / Fabrication of photonic crystal waveguide elements on SOI. Integrated Optical Devices: Fabrication and Testing. editor / Giancarlo C. Righini. International Society for Optics and Photonics SPIE, 2003. pp. 23-31 (Proceedings of SPIE, Vol. 4944).
@inproceedings{d8f21b5ff48b4e1b9c8e918ac51753a5,
title = "Fabrication of photonic crystal waveguide elements on SOI",
abstract = "Photonic crystal angle elements fabricated in silicon-on-insulator (SOI) are reported. These elements are modelled using three-dimensional finite difference time domain (FDTD) method. Photonic crystals have a two-dimensional trigonal lattice structure with cylindrical air columns. The period of the crystal is approximately 420 nm and the cylinder diameter is about 330 nm. Defect creation is performed by removing air columns from certain lattice sites. The SOI-layer is one micron thick and it also defines the column height. The FDTD modelling results imply that photonic crystal angle elements with lower height do not exhibit proper light transmission at the telecommunications wavelength window, 1550 nm. FDTD modelling results give higher transmission for TE-polarised light than for TM-polarisation. For better light coupling a taper element with widened waveguide end is designed.",
keywords = "photonic crystals, silicon-on-insulator, SOI, e-beam, inductively coupled plasma etching, ICP",
author = "Sanna Yliniemi and Timo Aalto and P{\"a}ivi Heimala and Panu Pekko and Konstantins Jefimovs and Tero Uusitupa",
note = "CA2: TTE6 CA: TTE Project code: T3SU00062",
year = "2003",
doi = "10.1117/12.468303",
language = "English",
isbn = "0-8194-4739-0",
series = "Proceedings of SPIE",
publisher = "International Society for Optics and Photonics SPIE",
pages = "23--31",
editor = "Righini, {Giancarlo C.}",
booktitle = "Integrated Optical Devices",
address = "United States",

}

Yliniemi, S, Aalto, T, Heimala, P, Pekko, P, Jefimovs, K & Uusitupa, T 2003, Fabrication of photonic crystal waveguide elements on SOI. in GC Righini (ed.), Integrated Optical Devices: Fabrication and Testing. International Society for Optics and Photonics SPIE, Proceedings of SPIE, vol. 4944, pp. 23-31, Photonics Fabrication Europe 2002 (PFE'02), Bruges, Belgium, 30/10/02. https://doi.org/10.1117/12.468303

Fabrication of photonic crystal waveguide elements on SOI. / Yliniemi, Sanna; Aalto, Timo; Heimala, Päivi; Pekko, Panu; Jefimovs, Konstantins; Uusitupa, Tero.

Integrated Optical Devices: Fabrication and Testing. ed. / Giancarlo C. Righini. International Society for Optics and Photonics SPIE, 2003. p. 23-31 (Proceedings of SPIE, Vol. 4944).

Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

TY - GEN

T1 - Fabrication of photonic crystal waveguide elements on SOI

AU - Yliniemi, Sanna

AU - Aalto, Timo

AU - Heimala, Päivi

AU - Pekko, Panu

AU - Jefimovs, Konstantins

AU - Uusitupa, Tero

N1 - CA2: TTE6 CA: TTE Project code: T3SU00062

PY - 2003

Y1 - 2003

N2 - Photonic crystal angle elements fabricated in silicon-on-insulator (SOI) are reported. These elements are modelled using three-dimensional finite difference time domain (FDTD) method. Photonic crystals have a two-dimensional trigonal lattice structure with cylindrical air columns. The period of the crystal is approximately 420 nm and the cylinder diameter is about 330 nm. Defect creation is performed by removing air columns from certain lattice sites. The SOI-layer is one micron thick and it also defines the column height. The FDTD modelling results imply that photonic crystal angle elements with lower height do not exhibit proper light transmission at the telecommunications wavelength window, 1550 nm. FDTD modelling results give higher transmission for TE-polarised light than for TM-polarisation. For better light coupling a taper element with widened waveguide end is designed.

AB - Photonic crystal angle elements fabricated in silicon-on-insulator (SOI) are reported. These elements are modelled using three-dimensional finite difference time domain (FDTD) method. Photonic crystals have a two-dimensional trigonal lattice structure with cylindrical air columns. The period of the crystal is approximately 420 nm and the cylinder diameter is about 330 nm. Defect creation is performed by removing air columns from certain lattice sites. The SOI-layer is one micron thick and it also defines the column height. The FDTD modelling results imply that photonic crystal angle elements with lower height do not exhibit proper light transmission at the telecommunications wavelength window, 1550 nm. FDTD modelling results give higher transmission for TE-polarised light than for TM-polarisation. For better light coupling a taper element with widened waveguide end is designed.

KW - photonic crystals

KW - silicon-on-insulator

KW - SOI

KW - e-beam

KW - inductively coupled plasma etching

KW - ICP

U2 - 10.1117/12.468303

DO - 10.1117/12.468303

M3 - Conference article in proceedings

SN - 0-8194-4739-0

T3 - Proceedings of SPIE

SP - 23

EP - 31

BT - Integrated Optical Devices

A2 - Righini, Giancarlo C.

PB - International Society for Optics and Photonics SPIE

ER -

Yliniemi S, Aalto T, Heimala P, Pekko P, Jefimovs K, Uusitupa T. Fabrication of photonic crystal waveguide elements on SOI. In Righini GC, editor, Integrated Optical Devices: Fabrication and Testing. International Society for Optics and Photonics SPIE. 2003. p. 23-31. (Proceedings of SPIE, Vol. 4944). https://doi.org/10.1117/12.468303