Fabrication of photonic crystal waveguide elements on SOI

Sanna Yliniemi, Timo Aalto, Päivi Heimala, Panu Pekko, Konstantins Jefimovs, Tero Uusitupa

    Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

    7 Citations (Scopus)


    Photonic crystal angle elements fabricated in silicon-on-insulator (SOI) are reported. These elements are modelled using three-dimensional finite difference time domain (FDTD) method. Photonic crystals have a two-dimensional trigonal lattice structure with cylindrical air columns. The period of the crystal is approximately 420 nm and the cylinder diameter is about 330 nm. Defect creation is performed by removing air columns from certain lattice sites. The SOI-layer is one micron thick and it also defines the column height. The FDTD modelling results imply that photonic crystal angle elements with lower height do not exhibit proper light transmission at the telecommunications wavelength window, 1550 nm. FDTD modelling results give higher transmission for TE-polarised light than for TM-polarisation. For better light coupling a taper element with widened waveguide end is designed.
    Original languageEnglish
    Title of host publicationIntegrated Optical Devices
    Subtitle of host publicationFabrication and Testing
    EditorsGiancarlo C. Righini
    PublisherInternational Society for Optics and Photonics SPIE
    ISBN (Print)978-0-8194-4739-5
    Publication statusPublished - 2003
    MoE publication typeA4 Article in a conference publication
    EventPhotonics Fabrication Europe 2002 (PFE'02) - Bruges, Belgium
    Duration: 30 Oct 20021 Nov 2002

    Publication series

    SeriesProceedings of SPIE


    ConferencePhotonics Fabrication Europe 2002 (PFE'02)


    • photonic crystals
    • silicon-on-insulator
    • SOI
    • e-beam
    • inductively coupled plasma etching
    • ICP


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