Keyphrases
Microfluidics
100%
Silicon Devices
100%
Shadow Mask
100%
Bioanalytical Applications
100%
Glass Device
100%
Silicon Surface
50%
Microfluidic Device
50%
Wafer
50%
Capillary Action
50%
Mask Material
50%
Volume Manipulation
50%
Surface Manipulation
50%
Biocompatibility
25%
Rutile
25%
Aluminum Oxide
25%
Laser Beams
25%
High Density
25%
Aqueous Solution
25%
Aspect Ratio
25%
Polymerase Chain Reaction
25%
Surface Material
25%
Silicon Microfabrication
25%
Process Development
25%
Grating
25%
Microchip
25%
Hydrophobicity
25%
Microphotonics
25%
Processing Cost
25%
O2 Plasma
25%
Plasma Etching
25%
Biochemical Analysis
25%
Great Depth
25%
Glass Surface
25%
Anisotropic Etching
25%
Etch Selectivity
25%
Masking Scheme
25%
Evanescent Field
25%
Plasma Etching Process
25%
C4F8
25%
Microfabrication Technology
25%
Vertical Structuring
25%
Silicon Microchip
25%
Field Detection
25%
Mask Technology
25%
Coupled Lasers
25%
Microfluidic Applications
25%
Thermal Manipulation
25%
Local Tuning
25%
Etching Depth
25%
Glass Microchips
25%
INIS
applications
100%
devices
100%
silicon
100%
fabrication
100%
glass
100%
masks
80%
surfaces
50%
plasma
30%
depth
30%
etching
30%
polymers
20%
capillaries
20%
volume
20%
fluids
20%
masking
20%
density
10%
cost
10%
aspect ratio
10%
processing
10%
demand
10%
detection
10%
titanium oxides
10%
oxygen
10%
lasers
10%
beams
10%
holes
10%
tuning
10%
anisotropy
10%
aqueous solutions
10%
polymerase chain reaction
10%
gratings
10%
aluminium nitrides
10%
Engineering
Shadow Mask
100%
Capillary Action
50%
Silicon Surface
50%
Microfluidic Device
50%
Anisotropic
25%
Surface Material
25%
Process Development
25%
Biochemicals
25%
Etching Process
25%
Processability
25%
Processing Cost
25%
Microfabrication
25%
Etch Depth
25%
Glass Surface
25%
Evanescent
25%
Chain Reaction
25%
Laser Beams
25%
Aspect Ratio
25%
Aqueous Solution
25%
Material Science
Silicon
100%
Surface (Surface Science)
50%
Plasma Etching
20%
Aluminum Nitride
10%
Hydrophobicity
10%
Microfabrication
10%
Density
10%
Titanium Dioxide
10%
Aluminum Oxide
10%
Biocompatibility
10%
Polymerase Chain Reaction
10%
Anisotropic Etching
10%