Fabrication of silicon nanostructures for photonic crystal applications

Sanna Yliniemi, Janne Simonen, Timo Aalto, Päivi Heimala

    Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

    Original languageEnglish
    Title of host publicationConference Papers 2002. 4th International Conference on Materials for Microelectronics and Nanoengineering, MFMN 2002
    Subtitle of host publicationEspoo, FI , 10 - 12 June 2002
    Place of PublicationLondon,UK
    PublisherIOM Communications Ltd.
    Pages105-108
    ISBN (Print)1-86125-155-6
    Publication statusPublished - 2002
    MoE publication typeA4 Article in a conference publication
    Event4th International Conference on Materials for Microelectronics and Nanoengineering, MFMN 2002 - Espoo, Finland
    Duration: 10 Jun 200212 Jun 2002

    Conference

    Conference4th International Conference on Materials for Microelectronics and Nanoengineering, MFMN 2002
    CountryFinland
    CityEspoo
    Period10/06/0212/06/02

    Keywords

    • photonic crystals
    • inductively coupled plasma etching
    • ICP
    • silicon
    • fabrication

    Cite this

    Yliniemi, S., Simonen, J., Aalto, T., & Heimala, P. (2002). Fabrication of silicon nanostructures for photonic crystal applications. In Conference Papers 2002. 4th International Conference on Materials for Microelectronics and Nanoengineering, MFMN 2002: Espoo, FI , 10 - 12 June 2002 (pp. 105-108). IOM Communications Ltd..