Fabrication-tolerant optical filters for dense integration on a micron-scale SOI platform

Matteo Cherchi, Sami Ylinen, Mikko Harjanne, Markku Kapulainen, Tapani Vehmas, Timo Aalto, George T. Kanellos, Dimitris Fitsios, Nikos Pleros

    Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

    7 Citations (Scopus)


    We present the first characterization results of some cascaded interleavers that we have recently fabricated on 4 µm thick Silicon on Insulator (SOI) wafers. The filters are based on strip waveguides, micron-scale bends and compact MMIs, all components with low loss and high tolerance to fabrication errors, due to the high mode confinement in the silicon region. A thorough comparison of the found results with the theoretical model will be presented, taking into account fabrication limitations. The fabricated filters will be used in the optical RAM circuits of the RAMPLAS project funded by the European Commission.
    Original languageEnglish
    Title of host publicationSilicon Photonics IX
    EditorsJoel Kubby, Graham T. Reed
    PublisherInternational Society for Optics and Photonics SPIE
    ISBN (Print)978-0-8194-9903-5
    Publication statusPublished - 2014
    MoE publication typeA4 Article in a conference publication
    EventSilicon Photonics IX - San Francisco, United States
    Duration: 3 Feb 20145 Feb 2014

    Publication series

    SeriesProceedings of SPIE


    ConferenceSilicon Photonics IX
    Country/TerritoryUnited States
    CitySan Francisco


    • waveguides
    • integrated silicon photonics
    • optical filters
    • fabrication
    • MMI couplers
    • MZI filters
    • optical RAM cells
    • cascaded interleavers


    Dive into the research topics of 'Fabrication-tolerant optical filters for dense integration on a micron-scale SOI platform'. Together they form a unique fingerprint.

    Cite this