Fabrication-tolerant optical filters for dense integration on a micron-scale SOI platform

Matteo Cherchi, Sami Ylinen, Mikko Harjanne, Markku Kapulainen, Tapani Vehmas, Timo Aalto, George T. Kanellos, Dimitris Fitsios, Nikos Pleros

Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

5 Citations (Scopus)

Abstract

We present the first characterization results of some cascaded interleavers that we have recently fabricated on 4 µm thick Silicon on Insulator (SOI) wafers. The filters are based on strip waveguides, micron-scale bends and compact MMIs, all components with low loss and high tolerance to fabrication errors, due to the high mode confinement in the silicon region. A thorough comparison of the found results with the theoretical model will be presented, taking into account fabrication limitations. The fabricated filters will be used in the optical RAM circuits of the RAMPLAS project funded by the European Commission.
Original languageEnglish
Title of host publicationSPIE Photonics West 2014-OPTO: Optoelectronic Devices and Materials
PublisherInternational Society for Optics and Photonics SPIE
ISBN (Print)978-081949903-5
DOIs
Publication statusPublished - 2014
MoE publication typeA4 Article in a conference publication
EventSilicon Photonics IX - San Francisco, United States
Duration: 3 Feb 20145 Feb 2014

Publication series

NameProceedings of SPIE
PublisherSPIE
Volume8990
ISSN (Print)0277-786X

Conference

ConferenceSilicon Photonics IX
CountryUnited States
CitySan Francisco
Period3/02/145/02/14

Fingerprint

optical filters
platforms
insulators
filters
fabrication
silicon
strip
wafers
waveguides

Keywords

  • waveguides
  • integrated silicon photonics
  • optical filters
  • fabrication
  • MMI couplers
  • MZI filters
  • optical RAM cells
  • cascaded interleavers

Cite this

Cherchi, M., Ylinen, S., Harjanne, M., Kapulainen, M., Vehmas, T., Aalto, T., ... Pleros, N. (2014). Fabrication-tolerant optical filters for dense integration on a micron-scale SOI platform. In SPIE Photonics West 2014-OPTO: Optoelectronic Devices and Materials [89900F] International Society for Optics and Photonics SPIE. Proceedings of SPIE, Vol.. 8990 https://doi.org/10.1117/12.2039954
Cherchi, Matteo ; Ylinen, Sami ; Harjanne, Mikko ; Kapulainen, Markku ; Vehmas, Tapani ; Aalto, Timo ; Kanellos, George T. ; Fitsios, Dimitris ; Pleros, Nikos. / Fabrication-tolerant optical filters for dense integration on a micron-scale SOI platform. SPIE Photonics West 2014-OPTO: Optoelectronic Devices and Materials. International Society for Optics and Photonics SPIE, 2014. (Proceedings of SPIE, Vol. 8990).
@inproceedings{bf1ebecdb5ef462692d46e50d87c06d3,
title = "Fabrication-tolerant optical filters for dense integration on a micron-scale SOI platform",
abstract = "We present the first characterization results of some cascaded interleavers that we have recently fabricated on 4 µm thick Silicon on Insulator (SOI) wafers. The filters are based on strip waveguides, micron-scale bends and compact MMIs, all components with low loss and high tolerance to fabrication errors, due to the high mode confinement in the silicon region. A thorough comparison of the found results with the theoretical model will be presented, taking into account fabrication limitations. The fabricated filters will be used in the optical RAM circuits of the RAMPLAS project funded by the European Commission.",
keywords = "waveguides, integrated silicon photonics, optical filters, fabrication, MMI couplers, MZI filters, optical RAM cells, cascaded interleavers",
author = "Matteo Cherchi and Sami Ylinen and Mikko Harjanne and Markku Kapulainen and Tapani Vehmas and Timo Aalto and Kanellos, {George T.} and Dimitris Fitsios and Nikos Pleros",
year = "2014",
doi = "10.1117/12.2039954",
language = "English",
isbn = "978-081949903-5",
series = "Proceedings of SPIE",
publisher = "International Society for Optics and Photonics SPIE",
booktitle = "SPIE Photonics West 2014-OPTO: Optoelectronic Devices and Materials",
address = "United States",

}

Cherchi, M, Ylinen, S, Harjanne, M, Kapulainen, M, Vehmas, T, Aalto, T, Kanellos, GT, Fitsios, D & Pleros, N 2014, Fabrication-tolerant optical filters for dense integration on a micron-scale SOI platform. in SPIE Photonics West 2014-OPTO: Optoelectronic Devices and Materials., 89900F, International Society for Optics and Photonics SPIE, Proceedings of SPIE, vol. 8990, Silicon Photonics IX, San Francisco, United States, 3/02/14. https://doi.org/10.1117/12.2039954

Fabrication-tolerant optical filters for dense integration on a micron-scale SOI platform. / Cherchi, Matteo; Ylinen, Sami; Harjanne, Mikko; Kapulainen, Markku; Vehmas, Tapani; Aalto, Timo; Kanellos, George T.; Fitsios, Dimitris; Pleros, Nikos.

SPIE Photonics West 2014-OPTO: Optoelectronic Devices and Materials. International Society for Optics and Photonics SPIE, 2014. 89900F (Proceedings of SPIE, Vol. 8990).

Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

TY - GEN

T1 - Fabrication-tolerant optical filters for dense integration on a micron-scale SOI platform

AU - Cherchi, Matteo

AU - Ylinen, Sami

AU - Harjanne, Mikko

AU - Kapulainen, Markku

AU - Vehmas, Tapani

AU - Aalto, Timo

AU - Kanellos, George T.

AU - Fitsios, Dimitris

AU - Pleros, Nikos

PY - 2014

Y1 - 2014

N2 - We present the first characterization results of some cascaded interleavers that we have recently fabricated on 4 µm thick Silicon on Insulator (SOI) wafers. The filters are based on strip waveguides, micron-scale bends and compact MMIs, all components with low loss and high tolerance to fabrication errors, due to the high mode confinement in the silicon region. A thorough comparison of the found results with the theoretical model will be presented, taking into account fabrication limitations. The fabricated filters will be used in the optical RAM circuits of the RAMPLAS project funded by the European Commission.

AB - We present the first characterization results of some cascaded interleavers that we have recently fabricated on 4 µm thick Silicon on Insulator (SOI) wafers. The filters are based on strip waveguides, micron-scale bends and compact MMIs, all components with low loss and high tolerance to fabrication errors, due to the high mode confinement in the silicon region. A thorough comparison of the found results with the theoretical model will be presented, taking into account fabrication limitations. The fabricated filters will be used in the optical RAM circuits of the RAMPLAS project funded by the European Commission.

KW - waveguides

KW - integrated silicon photonics

KW - optical filters

KW - fabrication

KW - MMI couplers

KW - MZI filters

KW - optical RAM cells

KW - cascaded interleavers

U2 - 10.1117/12.2039954

DO - 10.1117/12.2039954

M3 - Conference article in proceedings

SN - 978-081949903-5

T3 - Proceedings of SPIE

BT - SPIE Photonics West 2014-OPTO: Optoelectronic Devices and Materials

PB - International Society for Optics and Photonics SPIE

ER -

Cherchi M, Ylinen S, Harjanne M, Kapulainen M, Vehmas T, Aalto T et al. Fabrication-tolerant optical filters for dense integration on a micron-scale SOI platform. In SPIE Photonics West 2014-OPTO: Optoelectronic Devices and Materials. International Society for Optics and Photonics SPIE. 2014. 89900F. (Proceedings of SPIE, Vol. 8990). https://doi.org/10.1117/12.2039954