Fabrication-tolerant optical filters for dense integration on a micron-scale SOI platform

Matteo Cherchi; Sami Ylinen; Mikko Harjanne; Markku Kapulainen; Tapani Vehmas; Timo Aalto; George T. Kanellos; Dimitris Fitsios; Nikos Pleros

doi:10.1117/12.2039954

Fabrication-tolerant optical filters for dense integration on a micron-scale SOI platform

Matteo Cherchi, Sami Ylinen, Mikko Harjanne, Markku Kapulainen, Tapani Vehmas, Timo Aalto, George T. Kanellos, Dimitris Fitsios, Nikos Pleros

Centre for Research and Technology Hellas (CERTH)

Research output: Chapter in Book/Report/Conference proceeding › Conference article in proceedings › Scientific › peer-review

6 Citations (Scopus)

Abstract

We present the first characterization results of some cascaded interleavers that we have recently fabricated on 4 µm thick Silicon on Insulator (SOI) wafers. The filters are based on strip waveguides, micron-scale bends and compact MMIs, all components with low loss and high tolerance to fabrication errors, due to the high mode confinement in the silicon region. A thorough comparison of the found results with the theoretical model will be presented, taking into account fabrication limitations. The fabricated filters will be used in the optical RAM circuits of the RAMPLAS project funded by the European Commission.

Original language	English
Title of host publication	Silicon Photonics IX
Editors	Joel Kubby, Graham T. Reed
Publisher	International Society for Optics and Photonics SPIE
ISBN (Print)	978-0-8194-9903-5
DOIs	https://doi.org/10.1117/12.2039954
Publication status	Published - 2014
MoE publication type	A4 Article in a conference publication
Event	Silicon Photonics IX - San Francisco, United States Duration: 3 Feb 2014 → 5 Feb 2014

Publication series

Series	Proceedings of SPIE
Volume	8990
ISSN	0277-786X

Conference

Conference	Silicon Photonics IX
Country/Territory	United States
City	San Francisco
Period	3/02/14 → 5/02/14

Keywords

waveguides
integrated silicon photonics
optical filters
fabrication
MMI couplers
MZI filters
optical RAM cells
cascaded interleavers

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10.1117/12.2039954

Cite this

Cherchi, M., Ylinen, S., Harjanne, M., Kapulainen, M., Vehmas, T., Aalto, T., Kanellos, G. T., Fitsios, D., & Pleros, N. (2014). Fabrication-tolerant optical filters for dense integration on a micron-scale SOI platform. In J. Kubby, & G. T. Reed (Eds.), Silicon Photonics IX [89900F] International Society for Optics and Photonics SPIE. Proceedings of SPIE Vol. 8990 https://doi.org/10.1117/12.2039954

@inproceedings{bf1ebecdb5ef462692d46e50d87c06d3,

title = "Fabrication-tolerant optical filters for dense integration on a micron-scale SOI platform",

abstract = "We present the first characterization results of some cascaded interleavers that we have recently fabricated on 4 µm thick Silicon on Insulator (SOI) wafers. The filters are based on strip waveguides, micron-scale bends and compact MMIs, all components with low loss and high tolerance to fabrication errors, due to the high mode confinement in the silicon region. A thorough comparison of the found results with the theoretical model will be presented, taking into account fabrication limitations. The fabricated filters will be used in the optical RAM circuits of the RAMPLAS project funded by the European Commission.",

keywords = "waveguides, integrated silicon photonics, optical filters, fabrication, MMI couplers, MZI filters, optical RAM cells, cascaded interleavers",

author = "Matteo Cherchi and Sami Ylinen and Mikko Harjanne and Markku Kapulainen and Tapani Vehmas and Timo Aalto and Kanellos, {George T.} and Dimitris Fitsios and Nikos Pleros",

year = "2014",

doi = "10.1117/12.2039954",

language = "English",

isbn = "978-0-8194-9903-5",

series = "Proceedings of SPIE",

publisher = "International Society for Optics and Photonics SPIE",

editor = "Joel Kubby and Reed, {Graham T.}",

booktitle = "Silicon Photonics IX",

address = "United States",

note = "Silicon Photonics IX ; Conference date: 03-02-2014 Through 05-02-2014",

}

Cherchi, M, Ylinen, S , Harjanne, M , Kapulainen, M , Vehmas, T , Aalto, T, Kanellos, GT, Fitsios, D & Pleros, N 2014, Fabrication-tolerant optical filters for dense integration on a micron-scale SOI platform. in J Kubby & GT Reed (eds), Silicon Photonics IX., 89900F, International Society for Optics and Photonics SPIE, Proceedings of SPIE, vol. 8990, Silicon Photonics IX, San Francisco, California, United States, 3/02/14. https://doi.org/10.1117/12.2039954

Fabrication-tolerant optical filters for dense integration on a micron-scale SOI platform. / Cherchi, Matteo; Ylinen, Sami ; Harjanne, Mikko et al.

Silicon Photonics IX. ed. / Joel Kubby; Graham T. Reed. International Society for Optics and Photonics SPIE, 2014. 89900F (Proceedings of SPIE, Vol. 8990).

Research output: Chapter in Book/Report/Conference proceeding › Conference article in proceedings › Scientific › peer-review

TY - GEN

T1 - Fabrication-tolerant optical filters for dense integration on a micron-scale SOI platform

AU - Cherchi, Matteo

AU - Ylinen, Sami

AU - Harjanne, Mikko

AU - Kapulainen, Markku

AU - Vehmas, Tapani

AU - Aalto, Timo

AU - Kanellos, George T.

AU - Fitsios, Dimitris

AU - Pleros, Nikos

PY - 2014

Y1 - 2014

N2 - We present the first characterization results of some cascaded interleavers that we have recently fabricated on 4 µm thick Silicon on Insulator (SOI) wafers. The filters are based on strip waveguides, micron-scale bends and compact MMIs, all components with low loss and high tolerance to fabrication errors, due to the high mode confinement in the silicon region. A thorough comparison of the found results with the theoretical model will be presented, taking into account fabrication limitations. The fabricated filters will be used in the optical RAM circuits of the RAMPLAS project funded by the European Commission.

AB - We present the first characterization results of some cascaded interleavers that we have recently fabricated on 4 µm thick Silicon on Insulator (SOI) wafers. The filters are based on strip waveguides, micron-scale bends and compact MMIs, all components with low loss and high tolerance to fabrication errors, due to the high mode confinement in the silicon region. A thorough comparison of the found results with the theoretical model will be presented, taking into account fabrication limitations. The fabricated filters will be used in the optical RAM circuits of the RAMPLAS project funded by the European Commission.

KW - waveguides

KW - integrated silicon photonics

KW - optical filters

KW - fabrication

KW - MMI couplers

KW - MZI filters

KW - optical RAM cells

KW - cascaded interleavers

U2 - 10.1117/12.2039954

DO - 10.1117/12.2039954

M3 - Conference article in proceedings

SN - 978-0-8194-9903-5

T3 - Proceedings of SPIE

BT - Silicon Photonics IX

A2 - Kubby, Joel

A2 - Reed, Graham T.

PB - International Society for Optics and Photonics SPIE

T2 - Silicon Photonics IX

Y2 - 3 February 2014 through 5 February 2014

ER -

Fabrication-tolerant optical filters for dense integration on a micron-scale SOI platform

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