Fabrication-tolerant optical filters for dense integration on a micron-scale SOI platform

Matteo Cherchi, Sami Ylinen, Mikko Harjanne, Markku Kapulainen, Tapani Vehmas, Timo Aalto, George T. Kanellos, Dimitris Fitsios, Nikos Pleros

    Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

    5 Citations (Scopus)

    Abstract

    We present the first characterization results of some cascaded interleavers that we have recently fabricated on 4 µm thick Silicon on Insulator (SOI) wafers. The filters are based on strip waveguides, micron-scale bends and compact MMIs, all components with low loss and high tolerance to fabrication errors, due to the high mode confinement in the silicon region. A thorough comparison of the found results with the theoretical model will be presented, taking into account fabrication limitations. The fabricated filters will be used in the optical RAM circuits of the RAMPLAS project funded by the European Commission.
    Original languageEnglish
    Title of host publicationSPIE Photonics West 2014-OPTO: Optoelectronic Devices and Materials
    PublisherInternational Society for Optics and Photonics SPIE
    ISBN (Print)978-081949903-5
    DOIs
    Publication statusPublished - 2014
    MoE publication typeA4 Article in a conference publication
    EventSilicon Photonics IX - San Francisco, United States
    Duration: 3 Feb 20145 Feb 2014

    Publication series

    SeriesProceedings of SPIE
    Volume8990
    ISSN0277-786X

    Conference

    ConferenceSilicon Photonics IX
    CountryUnited States
    CitySan Francisco
    Period3/02/145/02/14

    Fingerprint

    optical filters
    platforms
    insulators
    filters
    fabrication
    silicon
    strip
    wafers
    waveguides

    Keywords

    • waveguides
    • integrated silicon photonics
    • optical filters
    • fabrication
    • MMI couplers
    • MZI filters
    • optical RAM cells
    • cascaded interleavers

    Cite this

    Cherchi, M., Ylinen, S., Harjanne, M., Kapulainen, M., Vehmas, T., Aalto, T., ... Pleros, N. (2014). Fabrication-tolerant optical filters for dense integration on a micron-scale SOI platform. In SPIE Photonics West 2014-OPTO: Optoelectronic Devices and Materials [89900F] International Society for Optics and Photonics SPIE. Proceedings of SPIE, Vol.. 8990 https://doi.org/10.1117/12.2039954
    Cherchi, Matteo ; Ylinen, Sami ; Harjanne, Mikko ; Kapulainen, Markku ; Vehmas, Tapani ; Aalto, Timo ; Kanellos, George T. ; Fitsios, Dimitris ; Pleros, Nikos. / Fabrication-tolerant optical filters for dense integration on a micron-scale SOI platform. SPIE Photonics West 2014-OPTO: Optoelectronic Devices and Materials. International Society for Optics and Photonics SPIE, 2014. (Proceedings of SPIE, Vol. 8990).
    @inproceedings{bf1ebecdb5ef462692d46e50d87c06d3,
    title = "Fabrication-tolerant optical filters for dense integration on a micron-scale SOI platform",
    abstract = "We present the first characterization results of some cascaded interleavers that we have recently fabricated on 4 µm thick Silicon on Insulator (SOI) wafers. The filters are based on strip waveguides, micron-scale bends and compact MMIs, all components with low loss and high tolerance to fabrication errors, due to the high mode confinement in the silicon region. A thorough comparison of the found results with the theoretical model will be presented, taking into account fabrication limitations. The fabricated filters will be used in the optical RAM circuits of the RAMPLAS project funded by the European Commission.",
    keywords = "waveguides, integrated silicon photonics, optical filters, fabrication, MMI couplers, MZI filters, optical RAM cells, cascaded interleavers",
    author = "Matteo Cherchi and Sami Ylinen and Mikko Harjanne and Markku Kapulainen and Tapani Vehmas and Timo Aalto and Kanellos, {George T.} and Dimitris Fitsios and Nikos Pleros",
    year = "2014",
    doi = "10.1117/12.2039954",
    language = "English",
    isbn = "978-081949903-5",
    series = "Proceedings of SPIE",
    publisher = "International Society for Optics and Photonics SPIE",
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    Cherchi, M, Ylinen, S, Harjanne, M, Kapulainen, M, Vehmas, T, Aalto, T, Kanellos, GT, Fitsios, D & Pleros, N 2014, Fabrication-tolerant optical filters for dense integration on a micron-scale SOI platform. in SPIE Photonics West 2014-OPTO: Optoelectronic Devices and Materials., 89900F, International Society for Optics and Photonics SPIE, Proceedings of SPIE, vol. 8990, Silicon Photonics IX, San Francisco, United States, 3/02/14. https://doi.org/10.1117/12.2039954

    Fabrication-tolerant optical filters for dense integration on a micron-scale SOI platform. / Cherchi, Matteo; Ylinen, Sami; Harjanne, Mikko; Kapulainen, Markku; Vehmas, Tapani; Aalto, Timo; Kanellos, George T.; Fitsios, Dimitris; Pleros, Nikos.

    SPIE Photonics West 2014-OPTO: Optoelectronic Devices and Materials. International Society for Optics and Photonics SPIE, 2014. 89900F (Proceedings of SPIE, Vol. 8990).

    Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

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    AU - Cherchi, Matteo

    AU - Ylinen, Sami

    AU - Harjanne, Mikko

    AU - Kapulainen, Markku

    AU - Vehmas, Tapani

    AU - Aalto, Timo

    AU - Kanellos, George T.

    AU - Fitsios, Dimitris

    AU - Pleros, Nikos

    PY - 2014

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    N2 - We present the first characterization results of some cascaded interleavers that we have recently fabricated on 4 µm thick Silicon on Insulator (SOI) wafers. The filters are based on strip waveguides, micron-scale bends and compact MMIs, all components with low loss and high tolerance to fabrication errors, due to the high mode confinement in the silicon region. A thorough comparison of the found results with the theoretical model will be presented, taking into account fabrication limitations. The fabricated filters will be used in the optical RAM circuits of the RAMPLAS project funded by the European Commission.

    AB - We present the first characterization results of some cascaded interleavers that we have recently fabricated on 4 µm thick Silicon on Insulator (SOI) wafers. The filters are based on strip waveguides, micron-scale bends and compact MMIs, all components with low loss and high tolerance to fabrication errors, due to the high mode confinement in the silicon region. A thorough comparison of the found results with the theoretical model will be presented, taking into account fabrication limitations. The fabricated filters will be used in the optical RAM circuits of the RAMPLAS project funded by the European Commission.

    KW - waveguides

    KW - integrated silicon photonics

    KW - optical filters

    KW - fabrication

    KW - MMI couplers

    KW - MZI filters

    KW - optical RAM cells

    KW - cascaded interleavers

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    M3 - Conference article in proceedings

    SN - 978-081949903-5

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    Cherchi M, Ylinen S, Harjanne M, Kapulainen M, Vehmas T, Aalto T et al. Fabrication-tolerant optical filters for dense integration on a micron-scale SOI platform. In SPIE Photonics West 2014-OPTO: Optoelectronic Devices and Materials. International Society for Optics and Photonics SPIE. 2014. 89900F. (Proceedings of SPIE, Vol. 8990). https://doi.org/10.1117/12.2039954