Keyphrases
Annealing
100%
Semiconductor Layer
100%
Polyethylene Naphthalate
100%
Indium Oxide
100%
Thin-film Transistors
100%
Flexible Substrate
100%
Inkjet Print
100%
Far-UV
100%
Low Temperature
50%
Impurities
50%
Fourier Transform Infrared Spectroscopy (FT-IR)
50%
Commercial Application
50%
High Performance
50%
Inkjet Printing Technique
50%
2-Methoxyethanol
50%
Semiconductors
50%
Oxide Conversion
50%
Thermal Treatment
50%
Ethylene Glycol
50%
Ultraviolet Exposure
50%
Metal Oxide
50%
In2O3 Films
50%
Flexible Plastics
50%
X-ray Reflectivity
50%
Grazing Incidence X-ray Diffraction (GIXRD)
50%
Droplet Formation
50%
Far Ultraviolet
50%
Annealing Process
50%
Precursor Film
50%
Si-SiO2
50%
High Density
50%
PEN Substrate
50%
Printing Process
50%
Enhancement-mode (E-mode)
50%
Nitrate
50%
TFT Array
50%
Yield Improvement
50%
Precursor Solution
50%
Metal Oxide TFT
50%
Saturation Mobility
50%
INIS
layers
100%
substrates
100%
transistors
100%
annealing
100%
thin films
100%
polyethylenes
100%
semiconductor materials
100%
precursor
75%
oxides
50%
metals
50%
films
50%
solutions
25%
performance
25%
density
25%
applications
25%
plastics
25%
droplets
25%
impurities
25%
conversion
25%
heat treatments
25%
saturation
25%
manufacturing
25%
yields
25%
stabilization
25%
mobility
25%
x-ray diffraction
25%
ethylene glycols
25%
diffraction (x-ray)
25%
reflectivity
25%
grazing
25%
fourier transform spectrometers
25%
nitrates
25%
far ultraviolet radiation
25%
Material Science
Polyethylene
100%
Thin-Film Transistor
100%
Metal Oxide
100%
Film
100%
Reflectivity
50%
Annealing
50%
Fourier Transform Infrared Spectroscopy
50%
Density
50%
X-Ray Diffraction
50%
Engineering
Prolonged Annealing
50%
Reflectance
50%
FTIR Spectroscopy
50%