Abstract
Feature-scale conformality of atomic layer deposition from continuum to free molecular flow: how Knudsen number influences thickness profile characteristics - Aalto University's research portal Skip to main navigation Skip to search Skip to main content Aalto University's research portal Home Aalto University's research portal Logo ACRIS instructions English Suomi Home Profiles Publications and artistic outputs Research data and software Projects Prizes Activities Press/Media Infrastructure Research units Impacts Search by expertise, name or affiliation Feature-scale conformality of atomic layer deposition from continuum to free molecular flow: how Knudsen number influences thickness profile characteristics
| Original language | English |
|---|---|
| Publication status | Published - 2022 |
| MoE publication type | Not Eligible |
| Event | AVS 22th International Conference on Atomic Layer Deposition (ALD 2022) featuring the 9th International Atomic Layer Etching Workshop (ALE 2022) - International Convention Center (ICC) Ghent, Ghent, Belgium Duration: 26 Jun 2022 → 29 Oct 2025 https://ald2022.avs.org/#:~:text=The%20AVS%2022nd%20International%20Conference%20on%20Atomic%20Layer,and%20now%20topics%20related%20to%20atomic%20layer%20etching. |
Conference
| Conference | AVS 22th International Conference on Atomic Layer Deposition (ALD 2022) featuring the 9th International Atomic Layer Etching Workshop (ALE 2022) |
|---|---|
| Country/Territory | Belgium |
| City | Ghent |
| Period | 26/06/22 → 29/10/25 |
| Internet address |