Ferroelectric parallel-plate capacitors with copper electrodes for high-frequency applications

Tommi Riekkinen, Tomi Mattila, Sebastiaan Van Dijken, Arne Lüker, Qi Zhang, Paul Kirby, Ana Sánchez

Research output: Contribution to journalArticleScientificpeer-review

10 Citations (Scopus)
Original languageEnglish
Article number252902
Number of pages3
JournalApplied Physics Letters
Volume91
Issue number25
DOIs
Publication statusPublished - 2007
MoE publication typeA1 Journal article-refereed

Keywords

  • copper
  • electric breakdown
  • electrodes
  • ferroelectric capacitors
  • ferroelectric thin films
  • lead compounds
  • permittivity
  • Q-factor
  • strontium compounds

Cite this

Riekkinen, T., Mattila, T., Van Dijken, S., Lüker, A., Zhang, Q., Kirby, P., & Sánchez, A. (2007). Ferroelectric parallel-plate capacitors with copper electrodes for high-frequency applications. Applied Physics Letters, 91(25), [252902]. https://doi.org/10.1063/1.2825274
Riekkinen, Tommi ; Mattila, Tomi ; Van Dijken, Sebastiaan ; Lüker, Arne ; Zhang, Qi ; Kirby, Paul ; Sánchez, Ana. / Ferroelectric parallel-plate capacitors with copper electrodes for high-frequency applications. In: Applied Physics Letters. 2007 ; Vol. 91, No. 25.
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title = "Ferroelectric parallel-plate capacitors with copper electrodes for high-frequency applications",
keywords = "copper, electric breakdown, electrodes, ferroelectric capacitors, ferroelectric thin films, lead compounds, permittivity, Q-factor, strontium compounds",
author = "Tommi Riekkinen and Tomi Mattila and {Van Dijken}, Sebastiaan and Arne L{\"u}ker and Qi Zhang and Paul Kirby and Ana S{\'a}nchez",
year = "2007",
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journal = "Applied Physics Letters",
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Riekkinen, T, Mattila, T, Van Dijken, S, Lüker, A, Zhang, Q, Kirby, P & Sánchez, A 2007, 'Ferroelectric parallel-plate capacitors with copper electrodes for high-frequency applications', Applied Physics Letters, vol. 91, no. 25, 252902. https://doi.org/10.1063/1.2825274

Ferroelectric parallel-plate capacitors with copper electrodes for high-frequency applications. / Riekkinen, Tommi; Mattila, Tomi; Van Dijken, Sebastiaan; Lüker, Arne; Zhang, Qi; Kirby, Paul; Sánchez, Ana.

In: Applied Physics Letters, Vol. 91, No. 25, 252902, 2007.

Research output: Contribution to journalArticleScientificpeer-review

TY - JOUR

T1 - Ferroelectric parallel-plate capacitors with copper electrodes for high-frequency applications

AU - Riekkinen, Tommi

AU - Mattila, Tomi

AU - Van Dijken, Sebastiaan

AU - Lüker, Arne

AU - Zhang, Qi

AU - Kirby, Paul

AU - Sánchez, Ana

PY - 2007

Y1 - 2007

KW - copper

KW - electric breakdown

KW - electrodes

KW - ferroelectric capacitors

KW - ferroelectric thin films

KW - lead compounds

KW - permittivity

KW - Q-factor

KW - strontium compounds

U2 - 10.1063/1.2825274

DO - 10.1063/1.2825274

M3 - Article

VL - 91

JO - Applied Physics Letters

JF - Applied Physics Letters

SN - 0003-6951

IS - 25

M1 - 252902

ER -