Fluorecence microscopy as a new method for quality control in nanoimprint lithography

M. Beck; P. Carlberg; I. Maximov; E.L. Sarwe; L. Montelius; C. Mayer; C. Finder; J. Seekamp; S. Zankovych; C.M. Sotomayor Torres; K. Pfeiffer; F. Reuther; Jouni Ahopelto

Fluorecence microscopy as a new method for quality control in nanoimprint lithography

M. Beck
, P. Carlberg
, I. Maximov
, E.L. Sarwe
, L. Montelius
, C. Mayer
, C. Finder
, J. Seekamp
, S. Zankovych
, C.M. Sotomayor Torres
, K. Pfeiffer
, F. Reuther
, Jouni Ahopelto

VTT Technical Research Centre of Finland

Research output: Chapter in Book/Report/Conference proceeding › Conference abstract in proceedings › Scientific

Original language	English
Title of host publication	Proceedings of the First International Conference on Nanoimprint Nanoprint Technology, NNT Conference, San Francisco, CA, 11-13 Dec, 2002
Place of Publication	San Francisco
Publisher	Naval Research Laboratory
Pages	146-147
Publication status	Published - 2002
MoE publication type	Not Eligible
Event	1st International Conference on Nanoimprint and Nanoprint Technology, NNT'02 - San Francisco, United States Duration: 11 Dec 2002 → 13 Dec 2002 http://www.nntconf.org/pdf/2002ProgramSchedule.pdf (Conference Programme)

Conference

Conference	1st International Conference on Nanoimprint and Nanoprint Technology, NNT'02
Abbreviated title	NNT 2002
Country/Territory	United States
City	San Francisco
Period	11/12/02 → 13/12/02
Internet address	http://www.nntconf.org/pdf/2002ProgramSchedule.pdf (Conference Programme)

Keywords

Nanoimprint Lithography

Cite this

Beck, M., Carlberg, P., Maximov, I., Sarwe, E. L., Montelius, L., Mayer, C., Finder, C., Seekamp, J., Zankovych, S., Sotomayor Torres, C. M., Pfeiffer, K., Reuther, F., & Ahopelto, J. (2002). Fluorecence microscopy as a new method for quality control in nanoimprint lithography. In Proceedings of the First International Conference on Nanoimprint Nanoprint Technology, NNT Conference, San Francisco, CA, 11-13 Dec, 2002 (pp. 146-147). Naval Research Laboratory.

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title = "Fluorecence microscopy as a new method for quality control in nanoimprint lithography",

keywords = "Nanoimprint Lithography",

author = "M. Beck and P. Carlberg and I. Maximov and E.L. Sarwe and L. Montelius and C. Mayer and C. Finder and J. Seekamp and S. Zankovych and \{Sotomayor Torres\}, C.M. and K. Pfeiffer and F. Reuther and Jouni Ahopelto",

year = "2002",

language = "English",

pages = "146--147",

booktitle = "Proceedings of the First International Conference on Nanoimprint Nanoprint Technology, NNT Conference, San Francisco, CA, 11-13 Dec, 2002",

publisher = "Naval Research Laboratory",

address = "United States",

note = "1st International Conference on Nanoimprint and Nanoprint Technology, NNT'02 , NNT 2002 ; Conference date: 11-12-2002 Through 13-12-2002",

url = "http://www.nntconf.org/pdf/2002ProgramSchedule.pdf",

}

Beck, M, Carlberg, P, Maximov, I, Sarwe, EL, Montelius, L, Mayer, C, Finder, C, Seekamp, J, Zankovych, S, Sotomayor Torres, CM, Pfeiffer, K, Reuther, F & Ahopelto, J 2002, Fluorecence microscopy as a new method for quality control in nanoimprint lithography. in Proceedings of the First International Conference on Nanoimprint Nanoprint Technology, NNT Conference, San Francisco, CA, 11-13 Dec, 2002. Naval Research Laboratory, San Francisco, pp. 146-147, 1st International Conference on Nanoimprint and Nanoprint Technology, NNT'02 , San Francisco, United States, 11/12/02.

Fluorecence microscopy as a new method for quality control in nanoimprint lithography. / Beck, M.; Carlberg, P.; Maximov, I. et al.
Proceedings of the First International Conference on Nanoimprint Nanoprint Technology, NNT Conference, San Francisco, CA, 11-13 Dec, 2002. San Francisco: Naval Research Laboratory, 2002. p. 146-147.

Research output: Chapter in Book/Report/Conference proceeding › Conference abstract in proceedings › Scientific

TY - CHAP

T1 - Fluorecence microscopy as a new method for quality control in nanoimprint lithography

AU - Beck, M.

AU - Carlberg, P.

AU - Maximov, I.

AU - Sarwe, E.L.

AU - Montelius, L.

AU - Mayer, C.

AU - Finder, C.

AU - Seekamp, J.

AU - Zankovych, S.

AU - Sotomayor Torres, C.M.

AU - Pfeiffer, K.

AU - Reuther, F.

AU - Ahopelto, Jouni

PY - 2002

Y1 - 2002

KW - Nanoimprint Lithography

M3 - Conference abstract in proceedings

SP - 146

EP - 147

BT - Proceedings of the First International Conference on Nanoimprint Nanoprint Technology, NNT Conference, San Francisco, CA, 11-13 Dec, 2002

PB - Naval Research Laboratory

CY - San Francisco

T2 - 1st International Conference on Nanoimprint and Nanoprint Technology, NNT'02

Y2 - 11 December 2002 through 13 December 2002

ER -