Fluorescence microscopy for quality control in nanoimprint lithography

Ch. Finder (Corresponding Author), S. Zankovych, I Maximov, F. Reuther, E.L. Sarwe, J. Seekamp, K. Pfeiffer, P. Carlberg, M. Beck, Jouni Ahopelto, C.M. Sotomayor Torres, L. Montelius, C. Mayer

    Research output: Contribution to journalArticleScientificpeer-review

    11 Citations (Scopus)

    Abstract

    Fluorescence microscopy is introduced as a low cost quality control process for nanoimprint lithography. To depict imprinted structures down to 1 μm lateral size and to detect residues down to 100 nm lateral size, the standard printable polymer mr-I8000 is labelled with less than 0.1 wt.% fluorescent dye. Three different types of stamps are used to determine the dependence of the shape and size of stamp features in a series of imprints. The quality of a stamp is given by the sticking polymer residues per unit area. Fluorescence light images as well as visible light images are analysed. Changes in the area of the stamp covered with polymer as a function of the number of imprints is summarised in a statistical process chart. Adhesion was artificially induced in order to observe self cleaning of virgin stamps. They were detected and monitored, suggesting that this method is a suitable technique for quality control and that it could be easily adapted to the nanoimprint process.
    Original languageEnglish
    Pages (from-to)623-628
    Number of pages6
    JournalMicroelectronic Engineering
    Volume67-68
    DOIs
    Publication statusPublished - 2003
    MoE publication typeA1 Journal article-refereed
    Event28th International Conference on Micro- and Nano-Engineering - Lugano, Switzerland
    Duration: 16 Sep 200219 Sep 2002

    Keywords

    • nanoimprint lithography
    • fluorescence microscopy
    • quality control
    • stamp
    • polymer
    • optoelectronics

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  • Cite this

    Finder, C., Zankovych, S., Maximov, I., Reuther, F., Sarwe, E. L., Seekamp, J., Pfeiffer, K., Carlberg, P., Beck, M., Ahopelto, J., Sotomayor Torres, C. M., Montelius, L., & Mayer, C. (2003). Fluorescence microscopy for quality control in nanoimprint lithography. Microelectronic Engineering, 67-68, 623-628. https://doi.org/10.1016/S0167-9317(03)00123-0