Fluorescence microscopy for quality control in nanoimprint lithography

Ch. Finder (Corresponding Author), S. Zankovych, I Maximov, F. Reuther, E.L. Sarwe, J. Seekamp, K. Pfeiffer, P. Carlberg, M. Beck, Jouni Ahopelto, C.M. Sotomayor Torres, L. Montelius, C. Mayer

Research output: Contribution to journalArticleScientificpeer-review

11 Citations (Scopus)

Abstract

Fluorescence microscopy is introduced as a low cost quality control process for nanoimprint lithography. To depict imprinted structures down to 1 μm lateral size and to detect residues down to 100 nm lateral size, the standard printable polymer mr-I8000 is labelled with less than 0.1 wt.% fluorescent dye. Three different types of stamps are used to determine the dependence of the shape and size of stamp features in a series of imprints. The quality of a stamp is given by the sticking polymer residues per unit area. Fluorescence light images as well as visible light images are analysed. Changes in the area of the stamp covered with polymer as a function of the number of imprints is summarised in a statistical process chart. Adhesion was artificially induced in order to observe self cleaning of virgin stamps. They were detected and monitored, suggesting that this method is a suitable technique for quality control and that it could be easily adapted to the nanoimprint process.
Original languageEnglish
Pages (from-to)623-628
Number of pages6
JournalMicroelectronic Engineering
Volume67-68
DOIs
Publication statusPublished - 2003
MoE publication typeA1 Journal article-refereed
Event28th International Conference on Micro- and Nano-Engineering - Lugano, Switzerland
Duration: 16 Sep 200219 Sep 2002

Fingerprint

Nanoimprint lithography
Fluorescence microscopy
quality control
Quality control
Polymers
lithography
microscopy
fluorescence
polymers
charts
Fluorescent Dyes
cleaning
Cleaning
adhesion
Adhesion
Dyes
dyes
Fluorescence
Costs

Keywords

  • nanoimprint lithography
  • fluorescence microscopy
  • quality control
  • stamp
  • polymer
  • optoelectronics

Cite this

Finder, C., Zankovych, S., Maximov, I., Reuther, F., Sarwe, E. L., Seekamp, J., ... Mayer, C. (2003). Fluorescence microscopy for quality control in nanoimprint lithography. Microelectronic Engineering, 67-68, 623-628. https://doi.org/10.1016/S0167-9317(03)00123-0
Finder, Ch. ; Zankovych, S. ; Maximov, I ; Reuther, F. ; Sarwe, E.L. ; Seekamp, J. ; Pfeiffer, K. ; Carlberg, P. ; Beck, M. ; Ahopelto, Jouni ; Sotomayor Torres, C.M. ; Montelius, L. ; Mayer, C. / Fluorescence microscopy for quality control in nanoimprint lithography. In: Microelectronic Engineering. 2003 ; Vol. 67-68. pp. 623-628.
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title = "Fluorescence microscopy for quality control in nanoimprint lithography",
abstract = "Fluorescence microscopy is introduced as a low cost quality control process for nanoimprint lithography. To depict imprinted structures down to 1 μm lateral size and to detect residues down to 100 nm lateral size, the standard printable polymer mr-I8000 is labelled with less than 0.1 wt.{\%} fluorescent dye. Three different types of stamps are used to determine the dependence of the shape and size of stamp features in a series of imprints. The quality of a stamp is given by the sticking polymer residues per unit area. Fluorescence light images as well as visible light images are analysed. Changes in the area of the stamp covered with polymer as a function of the number of imprints is summarised in a statistical process chart. Adhesion was artificially induced in order to observe self cleaning of virgin stamps. They were detected and monitored, suggesting that this method is a suitable technique for quality control and that it could be easily adapted to the nanoimprint process.",
keywords = "nanoimprint lithography, fluorescence microscopy, quality control, stamp, polymer, optoelectronics",
author = "Ch. Finder and S. Zankovych and I Maximov and F. Reuther and E.L. Sarwe and J. Seekamp and K. Pfeiffer and P. Carlberg and M. Beck and Jouni Ahopelto and {Sotomayor Torres}, C.M. and L. Montelius and C. Mayer",
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Finder, C, Zankovych, S, Maximov, I, Reuther, F, Sarwe, EL, Seekamp, J, Pfeiffer, K, Carlberg, P, Beck, M, Ahopelto, J, Sotomayor Torres, CM, Montelius, L & Mayer, C 2003, 'Fluorescence microscopy for quality control in nanoimprint lithography', Microelectronic Engineering, vol. 67-68, pp. 623-628. https://doi.org/10.1016/S0167-9317(03)00123-0

Fluorescence microscopy for quality control in nanoimprint lithography. / Finder, Ch. (Corresponding Author); Zankovych, S.; Maximov, I; Reuther, F.; Sarwe, E.L.; Seekamp, J.; Pfeiffer, K.; Carlberg, P.; Beck, M.; Ahopelto, Jouni; Sotomayor Torres, C.M.; Montelius, L.; Mayer, C.

In: Microelectronic Engineering, Vol. 67-68, 2003, p. 623-628.

Research output: Contribution to journalArticleScientificpeer-review

TY - JOUR

T1 - Fluorescence microscopy for quality control in nanoimprint lithography

AU - Finder, Ch.

AU - Zankovych, S.

AU - Maximov, I

AU - Reuther, F.

AU - Sarwe, E.L.

AU - Seekamp, J.

AU - Pfeiffer, K.

AU - Carlberg, P.

AU - Beck, M.

AU - Ahopelto, Jouni

AU - Sotomayor Torres, C.M.

AU - Montelius, L.

AU - Mayer, C.

PY - 2003

Y1 - 2003

N2 - Fluorescence microscopy is introduced as a low cost quality control process for nanoimprint lithography. To depict imprinted structures down to 1 μm lateral size and to detect residues down to 100 nm lateral size, the standard printable polymer mr-I8000 is labelled with less than 0.1 wt.% fluorescent dye. Three different types of stamps are used to determine the dependence of the shape and size of stamp features in a series of imprints. The quality of a stamp is given by the sticking polymer residues per unit area. Fluorescence light images as well as visible light images are analysed. Changes in the area of the stamp covered with polymer as a function of the number of imprints is summarised in a statistical process chart. Adhesion was artificially induced in order to observe self cleaning of virgin stamps. They were detected and monitored, suggesting that this method is a suitable technique for quality control and that it could be easily adapted to the nanoimprint process.

AB - Fluorescence microscopy is introduced as a low cost quality control process for nanoimprint lithography. To depict imprinted structures down to 1 μm lateral size and to detect residues down to 100 nm lateral size, the standard printable polymer mr-I8000 is labelled with less than 0.1 wt.% fluorescent dye. Three different types of stamps are used to determine the dependence of the shape and size of stamp features in a series of imprints. The quality of a stamp is given by the sticking polymer residues per unit area. Fluorescence light images as well as visible light images are analysed. Changes in the area of the stamp covered with polymer as a function of the number of imprints is summarised in a statistical process chart. Adhesion was artificially induced in order to observe self cleaning of virgin stamps. They were detected and monitored, suggesting that this method is a suitable technique for quality control and that it could be easily adapted to the nanoimprint process.

KW - nanoimprint lithography

KW - fluorescence microscopy

KW - quality control

KW - stamp

KW - polymer

KW - optoelectronics

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DO - 10.1016/S0167-9317(03)00123-0

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JF - Microelectronic Engineering

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ER -

Finder C, Zankovych S, Maximov I, Reuther F, Sarwe EL, Seekamp J et al. Fluorescence microscopy for quality control in nanoimprint lithography. Microelectronic Engineering. 2003;67-68:623-628. https://doi.org/10.1016/S0167-9317(03)00123-0