Fluorescence microscopy for quality control in nanoimprint lithography
- Ch. Finder*
- , M. Beck
- , J. Seekamp
- , K. Pfeiffer
- , P. Carlberg
- , I. Maximov
- , F. Reuther
- , S. Zankovych
- , E.L. Sarwe
- , Jouni Ahopelto
- , L. Montelius
- , C. Mayer
- , C.M. Sotomayor Torres
*Corresponding author for this work
Research output: Contribution to journal › Article › Scientific › peer-review
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