Fracture properties of atomic layer deposited aluminum oxide free-standing membranes

Maria Berdova (Corresponding Author), Oili M.E. Ylivaara, Ville Rontu, Pekka T. Törmä, Riikka L. Puurunen, Sami Franssila

    Research output: Contribution to journalArticleScientificpeer-review

    7 Citations (Scopus)

    Abstract

    The fracture strength of Al2O3 membranes deposited by atomic layer deposition at 110, 150, 200, and 300°C was investigated. The fracture strength was found to be in the range of 2.25-3.00GPa using Weibull statistics and nearly constant as a function of deposition temperature. This strength is superior to common microelectromechanical systems materials such as diamondlike carbon, SiO2, or SiC. As-deposited membranes sustained high cycling pressure loads >10 bar/s without fracture. Films featured, however, significant reduction in the resistance to failure after annealing (800°C) or high humidity (95%, 60°C) treatments
    Original languageEnglish
    Article number01A106
    JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
    Volume33
    Issue number1
    Early online date25 Aug 2014
    DOIs
    Publication statusPublished - 2015
    MoE publication typeA1 Journal article-refereed

    Fingerprint

    Aluminum Oxide
    fracture strength
    Fracture toughness
    aluminum oxides
    membranes
    Membranes
    Aluminum
    Oxides
    Atomic layer deposition
    atomic layer epitaxy
    microelectromechanical systems
    MEMS
    humidity
    Atmospheric humidity
    Carbon
    Statistics
    statistics
    Annealing
    cycles
    annealing

    Keywords

    • atomic layer deposition
    • ALD
    • A12O3
    • aluminum oxide
    • fracture strength

    Cite this

    Berdova, Maria ; Ylivaara, Oili M.E. ; Rontu, Ville ; Törmä, Pekka T. ; Puurunen, Riikka L. ; Franssila, Sami. / Fracture properties of atomic layer deposited aluminum oxide free-standing membranes. In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 2015 ; Vol. 33, No. 1.
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    abstract = "The fracture strength of Al2O3 membranes deposited by atomic layer deposition at 110, 150, 200, and 300°C was investigated. The fracture strength was found to be in the range of 2.25-3.00GPa using Weibull statistics and nearly constant as a function of deposition temperature. This strength is superior to common microelectromechanical systems materials such as diamondlike carbon, SiO2, or SiC. As-deposited membranes sustained high cycling pressure loads >10 bar/s without fracture. Films featured, however, significant reduction in the resistance to failure after annealing (800°C) or high humidity (95{\%}, 60°C) treatments",
    keywords = "atomic layer deposition, ALD, A12O3, aluminum oxide, fracture strength",
    author = "Maria Berdova and Ylivaara, {Oili M.E.} and Ville Rontu and T{\"o}rm{\"a}, {Pekka T.} and Puurunen, {Riikka L.} and Sami Franssila",
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    Fracture properties of atomic layer deposited aluminum oxide free-standing membranes. / Berdova, Maria (Corresponding Author); Ylivaara, Oili M.E.; Rontu, Ville; Törmä, Pekka T.; Puurunen, Riikka L.; Franssila, Sami.

    In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 33, No. 1, 01A106, 2015.

    Research output: Contribution to journalArticleScientificpeer-review

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    T1 - Fracture properties of atomic layer deposited aluminum oxide free-standing membranes

    AU - Berdova, Maria

    AU - Ylivaara, Oili M.E.

    AU - Rontu, Ville

    AU - Törmä, Pekka T.

    AU - Puurunen, Riikka L.

    AU - Franssila, Sami

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