Fracture properties of atomic layer deposited aluminum oxide free-standing membranes

Maria Berdova; Oili M.E. Ylivaara; Ville Rontu; Pekka T. Törmä; Riikka L. Puurunen; Sami Franssila

doi:10.1116/1.4893769

Fracture properties of atomic layer deposited aluminum oxide free-standing membranes

Maria Berdova^*, Oili M.E. Ylivaara, Ville Rontu, Pekka T. Törmä, Riikka L. Puurunen, Sami Franssila

^*Corresponding author for this work

Aalto University

Research output: Contribution to journal › Article › Scientific › peer-review

16 Citations (Scopus)

Abstract

The fracture strength of Al2O3 membranes deposited by atomic layer deposition at 110, 150, 200, and 300°C was investigated. The fracture strength was found to be in the range of 2.25-3.00GPa using Weibull statistics and nearly constant as a function of deposition temperature. This strength is superior to common microelectromechanical systems materials such as diamondlike carbon, SiO2, or SiC. As-deposited membranes sustained high cycling pressure loads >10 bar/s without fracture. Films featured, however, significant reduction in the resistance to failure after annealing (800°C) or high humidity (95%, 60°C) treatments

Original language	English
Article number	01A106
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	33
Issue number	1
Early online date	25 Aug 2014
DOIs	https://doi.org/10.1116/1.4893769
Publication status	Published - 2015
MoE publication type	A1 Journal article-refereed

Keywords

atomic layer deposition
ALD
A12O3
aluminum oxide
fracture strength

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title = "Fracture properties of atomic layer deposited aluminum oxide free-standing membranes",

abstract = "The fracture strength of Al2O3 membranes deposited by atomic layer deposition at 110, 150, 200, and 300°C was investigated. The fracture strength was found to be in the range of 2.25-3.00GPa using Weibull statistics and nearly constant as a function of deposition temperature. This strength is superior to common microelectromechanical systems materials such as diamondlike carbon, SiO2, or SiC. As-deposited membranes sustained high cycling pressure loads >10 bar/s without fracture. Films featured, however, significant reduction in the resistance to failure after annealing (800°C) or high humidity (95%, 60°C) treatments",

keywords = "atomic layer deposition, ALD, A12O3, aluminum oxide, fracture strength",

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AU - Berdova, Maria

AU - Ylivaara, Oili M.E.

AU - Rontu, Ville

AU - Törmä, Pekka T.

AU - Puurunen, Riikka L.

AU - Franssila, Sami

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PY - 2015

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N2 - The fracture strength of Al2O3 membranes deposited by atomic layer deposition at 110, 150, 200, and 300°C was investigated. The fracture strength was found to be in the range of 2.25-3.00GPa using Weibull statistics and nearly constant as a function of deposition temperature. This strength is superior to common microelectromechanical systems materials such as diamondlike carbon, SiO2, or SiC. As-deposited membranes sustained high cycling pressure loads >10 bar/s without fracture. Films featured, however, significant reduction in the resistance to failure after annealing (800°C) or high humidity (95%, 60°C) treatments

AB - The fracture strength of Al2O3 membranes deposited by atomic layer deposition at 110, 150, 200, and 300°C was investigated. The fracture strength was found to be in the range of 2.25-3.00GPa using Weibull statistics and nearly constant as a function of deposition temperature. This strength is superior to common microelectromechanical systems materials such as diamondlike carbon, SiO2, or SiC. As-deposited membranes sustained high cycling pressure loads >10 bar/s without fracture. Films featured, however, significant reduction in the resistance to failure after annealing (800°C) or high humidity (95%, 60°C) treatments

KW - atomic layer deposition

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Fracture properties of atomic layer deposited aluminum oxide free-standing membranes

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