Fracture properties of atomic layer deposited aluminum oxide free-standing membranes

Maria Berdova (Corresponding Author), Oili M.E. Ylivaara, Ville Rontu, Pekka T. Törmä, Riikka L. Puurunen, Sami Franssila

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    Abstract

    The fracture strength of Al2O3 membranes deposited by atomic layer deposition at 110, 150, 200, and 300°C was investigated. The fracture strength was found to be in the range of 2.25-3.00GPa using Weibull statistics and nearly constant as a function of deposition temperature. This strength is superior to common microelectromechanical systems materials such as diamondlike carbon, SiO2, or SiC. As-deposited membranes sustained high cycling pressure loads >10 bar/s without fracture. Films featured, however, significant reduction in the resistance to failure after annealing (800°C) or high humidity (95%, 60°C) treatments
    Original languageEnglish
    Article number01A106
    JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
    Volume33
    Issue number1
    Early online date25 Aug 2014
    DOIs
    Publication statusPublished - 2015
    MoE publication typeA1 Journal article-refereed

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    Keywords

    • atomic layer deposition
    • ALD
    • A12O3
    • aluminum oxide
    • fracture strength

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