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Ga-vacancy activation under low energy electron irradiation in GaN-based materials

  • Henri Nykänen
  • , Sami Suihkonen
  • , Lukaz Kilanski
  • , Markku Sopanen
  • , Filip Tuomisto
  • Aalto University

Research output: Chapter in Book/Report/Conference proceedingChapter or book articleScientificpeer-review

Abstract

We present results on optical degradation of gallium nitride based materials under low energy electron beam irradiation (LEEBI). GaN thin film and GaN/InGaN quantum well samples, grown by metal-organic vapor phase epitaxy (MOVPE), were exposed to a tightly focused (ø = 2 nm, J = 0-130 kA/cm2), rapidly scanning electron beam (e-beam) with energy of 5-20 keV and dose of 0-500 μC/cm2. The irradiation severely reduced the band-to-band photoluminescence of the exposed sample areas. Performing positron annihilation spectroscopy measurements on the irradiated films revealed an important increase of Ga-vacancy concentration as a function of the irradiation dose. Based on the measurements we propose that in-grown passive VGa-Hn complexes are present in MOVPE grown GaN (and its alloys), and are activated by LEEBI.
Original languageEnglish
Title of host publicationMRS Proceedings
PublisherUniversity of Cambridge
Pagesg05-05-ii06-05
Volume1432
DOIs
Publication statusPublished - 2012
MoE publication typeA3 Part of a book or another research book

Publication series

SeriesMRS Online Proceedings
Volume1432
ISSN1946-4274

Keywords

  • electron irradiation;
  • III-V;
  • scanning electron microscopy (SEM)

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