Growth of thin Al2O3 films on biaxially oriented polymer films by atomic layer deposition

Mika Vähä-Nissi, E. Kauppi, K. Sahagian, L.-S. Johansson, Soledad Peresin, Jenni Sievänen, Ali Harlin

Research output: Contribution to journalArticleScientificpeer-review

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Abstract

The effects of thin film nucleation and initial growth on roughness, chemistry and thermomechanical properties of polymer film surfaces were studied. Al2O3 was deposited onto commercial biaxially oriented polypropylene and polylactic acid films at 80 °C by using atomic layer deposition technique. Both substrates, especially the more hydrophobic polypropylene, showed initial growth through Al2O3 clusters. There was a faster deposition of Al2O3 on polylactic acid film than on polypropylene at the early stages of the Al2O3 deposition. There were also indications of chemical interactions between polylactic acid and trimethyl aluminum used as a precursor for Al2O3. Changes in the thermo-mechanical properties of the polymer surfaces with Al2O3also evidenced the differences between the substrate polymer films. The near surface interphase formed in polylactic acid probably contributed to the strong increase and scattering in the softening temperature during the early thin film growth
Original languageEnglish
Pages (from-to)50 - 57
JournalThin Solid Films
Volume522
Issue numberNovember
DOIs
Publication statusPublished - 2012
MoE publication typeA1 Journal article-refereed

Fingerprint

Atomic layer deposition
atomic layer epitaxy
Polymer films
Polypropylenes
polypropylene
Thin films
acids
Acids
polymers
thin films
Film growth
Substrates
Aluminum
softening
Polymers
indication
Nucleation
roughness
Surface roughness
nucleation

Keywords

  • Aluminum oxide
  • atomic force microscopy
  • atomic layer deposition
  • characterization
  • growth
  • thin film
  • transition temperature microscopy
  • x-ray photoelectron spectroscopy

Cite this

Vähä-Nissi, Mika ; Kauppi, E. ; Sahagian, K. ; Johansson, L.-S. ; Peresin, Soledad ; Sievänen, Jenni ; Harlin, Ali. / Growth of thin Al2O3 films on biaxially oriented polymer films by atomic layer deposition. In: Thin Solid Films. 2012 ; Vol. 522, No. November. pp. 50 - 57.
@article{5d98057df2a94d7d97a649c32794c9a7,
title = "Growth of thin Al2O3 films on biaxially oriented polymer films by atomic layer deposition",
abstract = "The effects of thin film nucleation and initial growth on roughness, chemistry and thermomechanical properties of polymer film surfaces were studied. Al2O3 was deposited onto commercial biaxially oriented polypropylene and polylactic acid films at 80 °C by using atomic layer deposition technique. Both substrates, especially the more hydrophobic polypropylene, showed initial growth through Al2O3 clusters. There was a faster deposition of Al2O3 on polylactic acid film than on polypropylene at the early stages of the Al2O3 deposition. There were also indications of chemical interactions between polylactic acid and trimethyl aluminum used as a precursor for Al2O3. Changes in the thermo-mechanical properties of the polymer surfaces with Al2O3also evidenced the differences between the substrate polymer films. The near surface interphase formed in polylactic acid probably contributed to the strong increase and scattering in the softening temperature during the early thin film growth",
keywords = "Aluminum oxide, atomic force microscopy, atomic layer deposition, characterization, growth, thin film, transition temperature microscopy, x-ray photoelectron spectroscopy",
author = "Mika V{\"a}h{\"a}-Nissi and E. Kauppi and K. Sahagian and L.-S. Johansson and Soledad Peresin and Jenni Siev{\"a}nen and Ali Harlin",
note = "Project code: 70962",
year = "2012",
doi = "10.1016/j.tsf.2012.09.043",
language = "English",
volume = "522",
pages = "50 -- 57",
journal = "Thin Solid Films",
issn = "0040-6090",
publisher = "Elsevier",
number = "November",

}

Vähä-Nissi, M, Kauppi, E, Sahagian, K, Johansson, L-S, Peresin, S, Sievänen, J & Harlin, A 2012, 'Growth of thin Al2O3 films on biaxially oriented polymer films by atomic layer deposition', Thin Solid Films, vol. 522, no. November, pp. 50 - 57. https://doi.org/10.1016/j.tsf.2012.09.043

Growth of thin Al2O3 films on biaxially oriented polymer films by atomic layer deposition. / Vähä-Nissi, Mika; Kauppi, E.; Sahagian, K.; Johansson, L.-S.; Peresin, Soledad; Sievänen, Jenni; Harlin, Ali.

In: Thin Solid Films, Vol. 522, No. November, 2012, p. 50 - 57.

Research output: Contribution to journalArticleScientificpeer-review

TY - JOUR

T1 - Growth of thin Al2O3 films on biaxially oriented polymer films by atomic layer deposition

AU - Vähä-Nissi, Mika

AU - Kauppi, E.

AU - Sahagian, K.

AU - Johansson, L.-S.

AU - Peresin, Soledad

AU - Sievänen, Jenni

AU - Harlin, Ali

N1 - Project code: 70962

PY - 2012

Y1 - 2012

N2 - The effects of thin film nucleation and initial growth on roughness, chemistry and thermomechanical properties of polymer film surfaces were studied. Al2O3 was deposited onto commercial biaxially oriented polypropylene and polylactic acid films at 80 °C by using atomic layer deposition technique. Both substrates, especially the more hydrophobic polypropylene, showed initial growth through Al2O3 clusters. There was a faster deposition of Al2O3 on polylactic acid film than on polypropylene at the early stages of the Al2O3 deposition. There were also indications of chemical interactions between polylactic acid and trimethyl aluminum used as a precursor for Al2O3. Changes in the thermo-mechanical properties of the polymer surfaces with Al2O3also evidenced the differences between the substrate polymer films. The near surface interphase formed in polylactic acid probably contributed to the strong increase and scattering in the softening temperature during the early thin film growth

AB - The effects of thin film nucleation and initial growth on roughness, chemistry and thermomechanical properties of polymer film surfaces were studied. Al2O3 was deposited onto commercial biaxially oriented polypropylene and polylactic acid films at 80 °C by using atomic layer deposition technique. Both substrates, especially the more hydrophobic polypropylene, showed initial growth through Al2O3 clusters. There was a faster deposition of Al2O3 on polylactic acid film than on polypropylene at the early stages of the Al2O3 deposition. There were also indications of chemical interactions between polylactic acid and trimethyl aluminum used as a precursor for Al2O3. Changes in the thermo-mechanical properties of the polymer surfaces with Al2O3also evidenced the differences between the substrate polymer films. The near surface interphase formed in polylactic acid probably contributed to the strong increase and scattering in the softening temperature during the early thin film growth

KW - Aluminum oxide

KW - atomic force microscopy

KW - atomic layer deposition

KW - characterization

KW - growth

KW - thin film

KW - transition temperature microscopy

KW - x-ray photoelectron spectroscopy

U2 - 10.1016/j.tsf.2012.09.043

DO - 10.1016/j.tsf.2012.09.043

M3 - Article

VL - 522

SP - 50

EP - 57

JO - Thin Solid Films

JF - Thin Solid Films

SN - 0040-6090

IS - November

ER -