High energy implantation masking with polyimide

Risto Mutikainen (Corresponding Author), Hing Wong, Nathan Cheung

Research output: Contribution to journalArticleScientificpeer-review

3 Citations (Scopus)

Abstract

A negative working polyimide resist has been studied as high energy implantation masking material (Ciba-Geigy RD86-710). To determine the blocking characteristics in the MeV ion energy range, a new method based on polyimide beveling was developed. Nonlinear blocking phenomena due to polyimide shrinkage were observed. Experimental blocking characteristics for the polyimide photoresist is presented for phosphorus ion energies in the MeV range.
Original languageEnglish
Pages (from-to)716-719
JournalNuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms
Volume37-38
DOIs
Publication statusPublished - 1989
MoE publication typeNot Eligible

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masking
polyimides
Polyimides
implantation
energy
Ions
Photoresists
shrinkage
photoresists
phosphorus
Phosphorus
ions

Cite this

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title = "High energy implantation masking with polyimide",
abstract = "A negative working polyimide resist has been studied as high energy implantation masking material (Ciba-Geigy RD86-710). To determine the blocking characteristics in the MeV ion energy range, a new method based on polyimide beveling was developed. Nonlinear blocking phenomena due to polyimide shrinkage were observed. Experimental blocking characteristics for the polyimide photoresist is presented for phosphorus ion energies in the MeV range.",
author = "Risto Mutikainen and Hing Wong and Nathan Cheung",
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High energy implantation masking with polyimide. / Mutikainen, Risto (Corresponding Author); Wong, Hing; Cheung, Nathan.

In: Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms, Vol. 37-38, 1989, p. 716-719.

Research output: Contribution to journalArticleScientificpeer-review

TY - JOUR

T1 - High energy implantation masking with polyimide

AU - Mutikainen, Risto

AU - Wong, Hing

AU - Cheung, Nathan

PY - 1989

Y1 - 1989

N2 - A negative working polyimide resist has been studied as high energy implantation masking material (Ciba-Geigy RD86-710). To determine the blocking characteristics in the MeV ion energy range, a new method based on polyimide beveling was developed. Nonlinear blocking phenomena due to polyimide shrinkage were observed. Experimental blocking characteristics for the polyimide photoresist is presented for phosphorus ion energies in the MeV range.

AB - A negative working polyimide resist has been studied as high energy implantation masking material (Ciba-Geigy RD86-710). To determine the blocking characteristics in the MeV ion energy range, a new method based on polyimide beveling was developed. Nonlinear blocking phenomena due to polyimide shrinkage were observed. Experimental blocking characteristics for the polyimide photoresist is presented for phosphorus ion energies in the MeV range.

U2 - 10.1016/0168-583X(89)90282-6

DO - 10.1016/0168-583X(89)90282-6

M3 - Article

VL - 37-38

SP - 716

EP - 719

JO - Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms

JF - Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms

SN - 0168-583X

ER -