High energy implantation masking with polyimide

Risto Mutikainen; Hing Wong; Nathan Cheung

doi:10.1016/0168-583X(89)90282-6

High energy implantation masking with polyimide

Risto Mutikainen (Corresponding Author), Hing Wong, Nathan Cheung

VTT Technical Research Centre of Finland

University of California, Berkeley

Research output: Contribution to journal › Article › Scientific › peer-review

3 Citations (Scopus)

Abstract

A negative working polyimide resist has been studied as high energy implantation masking material (Ciba-Geigy RD86-710). To determine the blocking characteristics in the MeV ion energy range, a new method based on polyimide beveling was developed. Nonlinear blocking phenomena due to polyimide shrinkage were observed. Experimental blocking characteristics for the polyimide photoresist is presented for phosphorus ion energies in the MeV range.

Original language	English
Pages (from-to)	716-719
Journal	Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms
Volume	37-38
DOIs	https://doi.org/10.1016/0168-583X(89)90282-6
Publication status	Published - 1989
MoE publication type	A1 Journal article-refereed

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10.1016/0168-583X(89)90282-6

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@article{c1bbb9b00d4e45728ded194800dcc1b5,

title = "High energy implantation masking with polyimide",

abstract = "A negative working polyimide resist has been studied as high energy implantation masking material (Ciba-Geigy RD86-710). To determine the blocking characteristics in the MeV ion energy range, a new method based on polyimide beveling was developed. Nonlinear blocking phenomena due to polyimide shrinkage were observed. Experimental blocking characteristics for the polyimide photoresist is presented for phosphorus ion energies in the MeV range.",

author = "Risto Mutikainen and Hing Wong and Nathan Cheung",

year = "1989",

doi = "10.1016/0168-583X(89)90282-6",

language = "English",

volume = "37-38",

pages = "716--719",

journal = "Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms",

issn = "0168-583X",

publisher = "Elsevier",

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TY - JOUR

T1 - High energy implantation masking with polyimide

AU - Mutikainen, Risto

AU - Wong, Hing

AU - Cheung, Nathan

PY - 1989

Y1 - 1989

N2 - A negative working polyimide resist has been studied as high energy implantation masking material (Ciba-Geigy RD86-710). To determine the blocking characteristics in the MeV ion energy range, a new method based on polyimide beveling was developed. Nonlinear blocking phenomena due to polyimide shrinkage were observed. Experimental blocking characteristics for the polyimide photoresist is presented for phosphorus ion energies in the MeV range.

AB - A negative working polyimide resist has been studied as high energy implantation masking material (Ciba-Geigy RD86-710). To determine the blocking characteristics in the MeV ion energy range, a new method based on polyimide beveling was developed. Nonlinear blocking phenomena due to polyimide shrinkage were observed. Experimental blocking characteristics for the polyimide photoresist is presented for phosphorus ion energies in the MeV range.

U2 - 10.1016/0168-583X(89)90282-6

DO - 10.1016/0168-583X(89)90282-6

M3 - Article

SN - 0168-583X

VL - 37-38

SP - 716

EP - 719

JO - Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms

JF - Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms

ER -

High energy implantation masking with polyimide

Abstract

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