High energy implantation masking with polyimide

Risto Mutikainen (Corresponding Author), Hing Wong, Nathan Cheung

Research output: Contribution to journalArticleScientificpeer-review

3 Citations (Scopus)

Abstract

A negative working polyimide resist has been studied as high energy implantation masking material (Ciba-Geigy RD86-710). To determine the blocking characteristics in the MeV ion energy range, a new method based on polyimide beveling was developed. Nonlinear blocking phenomena due to polyimide shrinkage were observed. Experimental blocking characteristics for the polyimide photoresist is presented for phosphorus ion energies in the MeV range.
Original languageEnglish
Pages (from-to)716-719
JournalNuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms
Volume37-38
DOIs
Publication statusPublished - 1989
MoE publication typeNot Eligible

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