Abstract
Scandium doped aluminium nitride (ScAlN) exhibits an overall greater piezoelectric response as compared to pure aluminium nitride (AlN). Films with a Sc/(Sc+Al)content above 30% or more are of high interest for MEMS sensing and actuation, ultrasound generation, and energy harvesting applications. In this work we present the uniformity of the material properties of (002)-axis oriented $\text{Sc}_{33}\text{A}1_{67}\text{N}$ films deposited on 200-mm wafers. For this purpose, the dielectric constant $\varepsilon_{\text{r}}$ and dielectric loss tanδ, as well as the transversal and the longitudinal piezoelectric coefficients, $e_{31,\text{f}}$ and $d_{33,\text{f}}$ , were measured. Wafers exhibiting a great in-wafer uniformity of the piezoelectric coefficients up to $d_{33,\text{f}}=11.8\text{pm}/\text{V}$ and $e_{31,\text{f}}=-2.3 \text{C}/\text{m}^{2}$ were obtained ( $1\sigma$ uniformity $\approx$ 1-2%). The results are very promising for the fabrication and designing of devices, as well as for volume manufacturing.
Original language | English |
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Title of host publication | 2018 IEEE International Ultrasonics Symposium, IUS 2018 |
Publisher | IEEE Institute of Electrical and Electronic Engineers |
ISBN (Electronic) | 978-1-5386-3425-7 |
ISBN (Print) | 978-1-5386-3426-4 |
DOIs | |
Publication status | Published - 2018 |
MoE publication type | Not Eligible |
Event | IEEE International Ultrasonics Symposium, IUS 2018 - Kobe, Japan Duration: 22 Oct 2018 → 25 Oct 2018 |
Conference
Conference | IEEE International Ultrasonics Symposium, IUS 2018 |
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Abbreviated title | IUS 2018 |
Country/Territory | Japan |
City | Kobe |
Period | 22/10/18 → 25/10/18 |
Keywords
- OtaNano