Highly conformal TiN by atomic layer deposition: growth and characterization

Kestutis Grigoras (Corresponding author), Oili Ylivaara, Feng Gao, Mikko J. Heikkilä, Kenichiro Mizohata, Mika Prunnila, Jyrki Räisänen, Mikko Ritala, Markku Leskelä, Jouni Ahopelto, Riikka Puurunen

    Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

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