Abstract
Properties of physical vapor deposited diamondlike carbon (DLC) films and the migration of hydrogen in H+ and 4He+ ion implanted and hydrogen co-deposited DLC films have been studied. Measurements utilizing Rutherford backscattering spectrometry showed that the films studied have an average mass density of 2.6±0.1 g/cm3. The bonding ratio sp3/sp2 is typically 70% measured with the electron spectroscopy for chemical analysis technique. Impurities and their depth distributions were deduced from the particle induced x-ray emission and secondary ion mass spectrometry (SIMS) measurements. Distributions of implanted and co-deposited hydrogen were measured by the nuclear resonance reaction 1H(15N,αγ)12C and SIMS. It was found that annealing behavior of implanted H in DLC has a diffusion like character. The obtained diffusion coefficients resulted in the activation energy of 2.0±0.1 eV. It was observed that in H co-deposited DLC films the temperature of H release varied between 950 and 1070 °C depending on the H concentration.
Original language | English |
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Pages (from-to) | 3791-3796 |
Number of pages | 6 |
Journal | Journal of Applied Physics |
Volume | 82 |
Issue number | 8 |
DOIs | |
Publication status | Published - 1997 |
MoE publication type | A1 Journal article-refereed |