Impact of Fabrication Process Tolerances on Characteristics of Sub-THz Silicon Micromachined Filters

    Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

    Abstract

    We demonstrate sub-THz waveguides, low-pass and band-pass micromachined filters at frequency range 225–325 GHz. Impact of fabrication processes and electrical interfaces with external waveguides on parameters of filters are studied and analyzed. Results obtained are applicable also for other types of devices based on micromachining waveguides.
    Original languageEnglish
    Title of host publicationProceedings of the 48th European Microwave Conference
    Place of PublicationMadrid, Spain
    PublisherIEEE Institute of Electrical and Electronic Engineers
    Pages284-287
    Number of pages4
    ISBN (Electronic)978-2-87487-051-4
    DOIs
    Publication statusPublished - 25 Sep 2018
    MoE publication typeNot Eligible
    Event48th European Microwave Conference, EuMC 2018 - Madrid, Spain
    Duration: 23 Sep 201827 Sep 2018

    Conference

    Conference48th European Microwave Conference, EuMC 2018
    Abbreviated titleEuMC
    CountrySpain
    CityMadrid
    Period23/09/1827/09/18

    Keywords

    • OtaNano

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  • Cite this

    Lamminen, A., Saarilahti, J., Pursula, P., Kantanen, M., & Ermolov, V. (2018). Impact of Fabrication Process Tolerances on Characteristics of Sub-THz Silicon Micromachined Filters. In Proceedings of the 48th European Microwave Conference (pp. 284-287). [8541742] IEEE Institute of Electrical and Electronic Engineers. https://doi.org/10.23919/EuMC.2018.8541742