Impact of Fabrication Process Tolerances on Characteristics of Sub-THz Silicon Micromachined Filters

Antti Lamminen; Jaakko Saarilahti; Pekka Pursula; Mikko Kantanen; Vladimir Ermolov

doi:10.23919/EuMC.2018.8541742

Impact of Fabrication Process Tolerances on Characteristics of Sub-THz Silicon Micromachined Filters

Antti Lamminen
, Jaakko Saarilahti
, Pekka Pursula
, Mikko Kantanen
, Vladimir Ermolov

Research output: Chapter in Book/Report/Conference proceeding › Conference article in proceedings › Scientific › peer-review

2 Citations (Scopus)

Abstract

We demonstrate sub-THz waveguides, low-pass and band-pass micromachined filters at frequency range 225–325 GHz. Impact of fabrication processes and electrical interfaces with external waveguides on parameters of filters are studied and analyzed. Results obtained are applicable also for other types of devices based on micromachining waveguides.

Original language	English
Title of host publication	Proceedings of the 48th European Microwave Conference
Place of Publication	Madrid, Spain
Publisher	IEEE Institute of Electrical and Electronic Engineers
Pages	284-287
Number of pages	4
ISBN (Electronic)	978-2-87487-051-4
DOIs	https://doi.org/10.23919/EuMC.2018.8541742
Publication status	Published - 25 Sept 2018
MoE publication type	Not Eligible
Event	48th European Microwave Conference, EuMC 2018 - Madrid, Spain Duration: 23 Sept 2018 → 27 Sept 2018

Conference

Conference	48th European Microwave Conference, EuMC 2018
Abbreviated title	EuMC
Country/Territory	Spain
City	Madrid
Period	23/09/18 → 27/09/18

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

SDG 9 Industry, Innovation, and Infrastructure

Keywords

OtaNano

Access to Document

10.23919/EuMC.2018.8541742

Cite this

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title = "Impact of Fabrication Process Tolerances on Characteristics of Sub-THz Silicon Micromachined Filters",

abstract = "We demonstrate sub-THz waveguides, low-pass and band-pass micromachined filters at frequency range 225–325 GHz. Impact of fabrication processes and electrical interfaces with external waveguides on parameters of filters are studied and analyzed. Results obtained are applicable also for other types of devices based on micromachining waveguides.",

keywords = "OtaNano",

author = "Antti Lamminen and Jaakko Saarilahti and Pekka Pursula and Mikko Kantanen and Vladimir Ermolov",

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doi = "10.23919/EuMC.2018.8541742",

language = "English",

pages = "284--287",

booktitle = "Proceedings of the 48th European Microwave Conference",

publisher = "IEEE Institute of Electrical and Electronic Engineers",

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note = "48th European Microwave Conference, EuMC 2018, EuMC ; Conference date: 23-09-2018 Through 27-09-2018",

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Lamminen, A, Saarilahti, J, Pursula, P, Kantanen, M & Ermolov, V 2018, Impact of Fabrication Process Tolerances on Characteristics of Sub-THz Silicon Micromachined Filters. in Proceedings of the 48th European Microwave Conference., 8541742, IEEE Institute of Electrical and Electronic Engineers, Madrid, Spain, pp. 284-287, 48th European Microwave Conference, EuMC 2018, Madrid, Spain, 23/09/18. https://doi.org/10.23919/EuMC.2018.8541742

Impact of Fabrication Process Tolerances on Characteristics of Sub-THz Silicon Micromachined Filters. / Lamminen, Antti; Saarilahti, Jaakko; Pursula, Pekka et al.
Proceedings of the 48th European Microwave Conference. Madrid, Spain: IEEE Institute of Electrical and Electronic Engineers, 2018. p. 284-287 8541742.

Research output: Chapter in Book/Report/Conference proceeding › Conference article in proceedings › Scientific › peer-review

TY - GEN

T1 - Impact of Fabrication Process Tolerances on Characteristics of Sub-THz Silicon Micromachined Filters

AU - Lamminen, Antti

AU - Saarilahti, Jaakko

AU - Pursula, Pekka

AU - Kantanen, Mikko

AU - Ermolov, Vladimir

PY - 2018/9/25

Y1 - 2018/9/25

N2 - We demonstrate sub-THz waveguides, low-pass and band-pass micromachined filters at frequency range 225–325 GHz. Impact of fabrication processes and electrical interfaces with external waveguides on parameters of filters are studied and analyzed. Results obtained are applicable also for other types of devices based on micromachining waveguides.

AB - We demonstrate sub-THz waveguides, low-pass and band-pass micromachined filters at frequency range 225–325 GHz. Impact of fabrication processes and electrical interfaces with external waveguides on parameters of filters are studied and analyzed. Results obtained are applicable also for other types of devices based on micromachining waveguides.

KW - OtaNano

UR - https://www.scopus.com/pages/publications/85059819598

U2 - 10.23919/EuMC.2018.8541742

DO - 10.23919/EuMC.2018.8541742

M3 - Conference article in proceedings

SP - 284

EP - 287

BT - Proceedings of the 48th European Microwave Conference

PB - IEEE Institute of Electrical and Electronic Engineers

CY - Madrid, Spain

T2 - 48th European Microwave Conference, EuMC 2018

Y2 - 23 September 2018 through 27 September 2018

ER -

Impact of Fabrication Process Tolerances on Characteristics of Sub-THz Silicon Micromachined Filters

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Impact of Fabrication Process Tolerances on Characteristics of Sub-THz Silicon Micromachined Filters

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