Implementing ALD layers in MEMS processing

R. L. Puurunen, J. Saarilahti, H. Kattelus

Research output: Contribution to journalArticleScientificpeer-review

64 Citations (Scopus)

Abstract

Layers manufactured by the ALD technique have many interesting applications in microelectromechanical systems (MEMS), for example as protective layers for biocompatible coating, high-dielectric-constant layers, or low-temperature conformal insulating layers. Before an ALD process can be successfully implemented in MEMS processing, several practical issues have to be solved, starting from patterning the layers and characterizing their behaviour in various chemical and thermal environments. Stress issues may not be forgotten We have recently implemented two ALD processes, namely the trimethy laluminium/water process to deposit Al2O3 and the titanium tetrachloride/water process to deposit TiO2 in our MEMS processing line and carried out the necessary characterization, details of which are reported here. For us, ALD has been a truly enabling technology in the processing of a three-dimensional micromechanical compass based on the Lorentz force, where Al2O3 acted as a pinhole-free electrical insulation grown at low temperature

Original languageEnglish
Pages (from-to)3-14
Number of pages12
JournalECS Transactions
Volume11
Issue number7
DOIs
Publication statusPublished - 1 Dec 2007
MoE publication typeNot Eligible
Event3rd Symposium on Atomic Layer Deposition Applications - 212th ECS Meeting - Washington, DC, United States
Duration: 8 Oct 20079 Oct 2007

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MEMS
Deposits
Processing
Lorentz force
Insulation
Water
Permittivity
Titanium
Coatings
Temperature
Hot Temperature

Cite this

Puurunen, R. L. ; Saarilahti, J. ; Kattelus, H. / Implementing ALD layers in MEMS processing. In: ECS Transactions. 2007 ; Vol. 11, No. 7. pp. 3-14.
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Implementing ALD layers in MEMS processing. / Puurunen, R. L.; Saarilahti, J.; Kattelus, H.

In: ECS Transactions, Vol. 11, No. 7, 01.12.2007, p. 3-14.

Research output: Contribution to journalArticleScientificpeer-review

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