Implications of stamp layout for large area NIL processing

Schulz, Wissen, H.C. Scheer, Jouni Ahopelto, Tomi Haatainen

    Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

    Original languageEnglish
    Title of host publicationProceedings of the First International Conference on Nanoimprint Nanoprint, NNT Conference,San Francisco,CA,11-13 Dec 2002
    Place of PublicationSan Francisco
    Pages64-65
    Publication statusPublished - 2002
    MoE publication typeNot Eligible
    Event1st International Conference on Nanoimprint and Nanoprint Technology, NNT'02 - San Francisco, United States
    Duration: 11 Dec 200213 Dec 2002

    Conference

    Conference1st International Conference on Nanoimprint and Nanoprint Technology, NNT'02
    Abbreviated titleNNT 2002
    CountryUnited States
    CitySan Francisco
    Period11/12/0213/12/02

    Keywords

    • Nanoimprint Lithography

    Cite this

    Schulz, Wissen, Scheer, H. C., Ahopelto, J., & Haatainen, T. (2002). Implications of stamp layout for large area NIL processing. In Proceedings of the First International Conference on Nanoimprint Nanoprint, NNT Conference,San Francisco,CA,11-13 Dec 2002 (pp. 64-65). San Francisco.
    Schulz ; Wissen ; Scheer, H.C. ; Ahopelto, Jouni ; Haatainen, Tomi. / Implications of stamp layout for large area NIL processing. Proceedings of the First International Conference on Nanoimprint Nanoprint, NNT Conference,San Francisco,CA,11-13 Dec 2002. San Francisco, 2002. pp. 64-65
    @inbook{b842602bf7094a91913e8857e94465bb,
    title = "Implications of stamp layout for large area NIL processing",
    keywords = "Nanoimprint Lithography",
    author = "Schulz and Wissen and H.C. Scheer and Jouni Ahopelto and Tomi Haatainen",
    year = "2002",
    language = "English",
    pages = "64--65",
    booktitle = "Proceedings of the First International Conference on Nanoimprint Nanoprint, NNT Conference,San Francisco,CA,11-13 Dec 2002",

    }

    Schulz, Wissen, Scheer, HC, Ahopelto, J & Haatainen, T 2002, Implications of stamp layout for large area NIL processing. in Proceedings of the First International Conference on Nanoimprint Nanoprint, NNT Conference,San Francisco,CA,11-13 Dec 2002. San Francisco, pp. 64-65, 1st International Conference on Nanoimprint and Nanoprint Technology, NNT'02 , San Francisco, United States, 11/12/02.

    Implications of stamp layout for large area NIL processing. / Schulz; Wissen; Scheer, H.C.; Ahopelto, Jouni; Haatainen, Tomi.

    Proceedings of the First International Conference on Nanoimprint Nanoprint, NNT Conference,San Francisco,CA,11-13 Dec 2002. San Francisco, 2002. p. 64-65.

    Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

    TY - CHAP

    T1 - Implications of stamp layout for large area NIL processing

    AU - Schulz, null

    AU - Wissen, null

    AU - Scheer, H.C.

    AU - Ahopelto, Jouni

    AU - Haatainen, Tomi

    PY - 2002

    Y1 - 2002

    KW - Nanoimprint Lithography

    M3 - Conference abstract in proceedings

    SP - 64

    EP - 65

    BT - Proceedings of the First International Conference on Nanoimprint Nanoprint, NNT Conference,San Francisco,CA,11-13 Dec 2002

    CY - San Francisco

    ER -

    Schulz, Wissen, Scheer HC, Ahopelto J, Haatainen T. Implications of stamp layout for large area NIL processing. In Proceedings of the First International Conference on Nanoimprint Nanoprint, NNT Conference,San Francisco,CA,11-13 Dec 2002. San Francisco. 2002. p. 64-65