Implications of stamp layout for large area NIL processing

H. Schulz, M. Wissen, H.C. Scheer, Jouni Ahopelto, Tomi Haatainen

    Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

    Original languageEnglish
    Title of host publicationProceedings of the First International Conference on Nanoimprint Nanoprint, NNT Conference,San Francisco,CA,11-13 Dec 2002
    Place of PublicationSan Francisco
    PublisherNaval Research Laboratory
    Pages64-65
    Publication statusPublished - 2002
    MoE publication typeNot Eligible
    Event1st International Conference on Nanoimprint and Nanoprint Technology, NNT'02 - San Francisco, United States
    Duration: 11 Dec 200213 Dec 2002
    http://www.nntconf.org/pdf/2002ProgramSchedule.pdf (Conference Programme)

    Conference

    Conference1st International Conference on Nanoimprint and Nanoprint Technology, NNT'02
    Abbreviated titleNNT 2002
    CountryUnited States
    CitySan Francisco
    Period11/12/0213/12/02
    Internet address

    Keywords

    • Nanoimprint Lithography

    Cite this

    Schulz, H., Wissen, M., Scheer, H. C., Ahopelto, J., & Haatainen, T. (2002). Implications of stamp layout for large area NIL processing. In Proceedings of the First International Conference on Nanoimprint Nanoprint, NNT Conference,San Francisco,CA,11-13 Dec 2002 (pp. 64-65). Naval Research Laboratory.