Imprinted 50 nm features by UV step and stamp imprint lithography method

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Abstract

In this paper, we report on fabrication of 50 nm features by using a UV step and stamp imprint lithography method (UV SSIL), which is based on thermal SSIL using a flip chip bonder. The idea is to fabricate nanoscale patterns by pressing a small stamp, also called mould or template, into a low viscosity monomer which is then polymerized and thereby hardened (cured) by UV exposure. The mirror replicaof the pattern of the stamp is copied in the polymer. The method is developed onto a stage where a dedicated tool (NPS300) is commercially available and easily configured for both techniques.
Original languageEnglish
Title of host publication 2007 Digest of papers Microprocesses and Nanotechnology
PublisherIEEE Institute of Electrical and Electronic Engineers
Pages280-281
ISBN (Print)978-4-9902472-4-9
DOIs
Publication statusPublished - 2007
MoE publication typeNot Eligible
Event20th International Microprocesses and Nanotechnology Conference, MNC 2007 - Kyoto, Japan
Duration: 5 Nov 20078 Nov 2007

Conference

Conference20th International Microprocesses and Nanotechnology Conference, MNC 2007
CountryJapan
CityKyoto
Period5/11/078/11/07

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Keywords

  • nanoimprinting

Cite this

Tomi, H., Päivi, M., Tapio, M., & Jouni, A. (2007). Imprinted 50 nm features by UV step and stamp imprint lithography method. In 2007 Digest of papers Microprocesses and Nanotechnology (pp. 280-281). IEEE Institute of Electrical and Electronic Engineers . https://doi.org/10.1109/IMNC.2007.4456213