Imprinted 50 nm features fabricated by step and stamp UV imprinting

Tomi Haatainen, Päivi Majander, Tapio Mäkelä, Jouni Ahopelto, Y. Kawaguchi

Research output: Contribution to journalArticleScientificpeer-review

7 Citations (Scopus)

Abstract

We fabricated features down to 50 nm by UV step and stamp imprint lithography (UV-SSIL). This method enables fast sequential imprinting for large areas operating at room temperature with a low-viscosity material. This allows the patterning of both large micron-scale and submicron-scale structures simultaneously. A low-viscosity polymer allows pattern transfer at moderate pressures, thereby reducing mechanical stress on the stamp and substrate. Processing at room temperature helps to maintain the alignment and to prevent the distortion of the features caused by the thermal expansion of the mold and substrate. A UV-SSIL experiment with a novel photosensitive polymer was performed using a prototype of currently commercially available machines used for both thermal and UV step and stamp imprintings. As a master, we used a transparent quartz stamp (with features down to 50 nm) patterned by electron-beam lithography. The polymer was dispensed on a 100 mm silicon substrate using a syringe-type dispensing system. The results were analyzed by atomic force microscopy and a scanning electron microscopy. The fabricated structures exhibited good lateral and vertical feature replication fidelities.
Original languageEnglish
Pages (from-to)5164-5166
Number of pages3
JournalJapanese Journal of Applied Physics
Volume47
DOIs
Publication statusPublished - 2008
MoE publication typeA1 Journal article-refereed

Fingerprint

lithography
Lithography
polymers
Polymers
Substrates
Viscosity
viscosity
syringes
Syringes
Electron beam lithography
room temperature
Thermal expansion
Quartz
thermal expansion
Atomic force microscopy
quartz
alignment
prototypes
atomic force microscopy
electron beams

Keywords

  • Imprinting
  • Nanoimprinting
  • SSIL
  • UV-NIL
  • UV-SSIL

Cite this

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title = "Imprinted 50 nm features fabricated by step and stamp UV imprinting",
abstract = "We fabricated features down to 50 nm by UV step and stamp imprint lithography (UV-SSIL). This method enables fast sequential imprinting for large areas operating at room temperature with a low-viscosity material. This allows the patterning of both large micron-scale and submicron-scale structures simultaneously. A low-viscosity polymer allows pattern transfer at moderate pressures, thereby reducing mechanical stress on the stamp and substrate. Processing at room temperature helps to maintain the alignment and to prevent the distortion of the features caused by the thermal expansion of the mold and substrate. A UV-SSIL experiment with a novel photosensitive polymer was performed using a prototype of currently commercially available machines used for both thermal and UV step and stamp imprintings. As a master, we used a transparent quartz stamp (with features down to 50 nm) patterned by electron-beam lithography. The polymer was dispensed on a 100 mm silicon substrate using a syringe-type dispensing system. The results were analyzed by atomic force microscopy and a scanning electron microscopy. The fabricated structures exhibited good lateral and vertical feature replication fidelities.",
keywords = "Imprinting, Nanoimprinting, SSIL, UV-NIL, UV-SSIL",
author = "Tomi Haatainen and P{\"a}ivi Majander and Tapio M{\"a}kel{\"a} and Jouni Ahopelto and Y. Kawaguchi",
year = "2008",
doi = "10.1143/JJAP.47.5164",
language = "English",
volume = "47",
pages = "5164--5166",
journal = "Japanese Journal of Applied Physics",
issn = "0021-4922",
publisher = "Japan Society of Applied Physics",

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Imprinted 50 nm features fabricated by step and stamp UV imprinting. / Haatainen, Tomi; Majander, Päivi; Mäkelä, Tapio; Ahopelto, Jouni; Kawaguchi, Y.

In: Japanese Journal of Applied Physics, Vol. 47, 2008, p. 5164-5166.

Research output: Contribution to journalArticleScientificpeer-review

TY - JOUR

T1 - Imprinted 50 nm features fabricated by step and stamp UV imprinting

AU - Haatainen, Tomi

AU - Majander, Päivi

AU - Mäkelä, Tapio

AU - Ahopelto, Jouni

AU - Kawaguchi, Y.

PY - 2008

Y1 - 2008

N2 - We fabricated features down to 50 nm by UV step and stamp imprint lithography (UV-SSIL). This method enables fast sequential imprinting for large areas operating at room temperature with a low-viscosity material. This allows the patterning of both large micron-scale and submicron-scale structures simultaneously. A low-viscosity polymer allows pattern transfer at moderate pressures, thereby reducing mechanical stress on the stamp and substrate. Processing at room temperature helps to maintain the alignment and to prevent the distortion of the features caused by the thermal expansion of the mold and substrate. A UV-SSIL experiment with a novel photosensitive polymer was performed using a prototype of currently commercially available machines used for both thermal and UV step and stamp imprintings. As a master, we used a transparent quartz stamp (with features down to 50 nm) patterned by electron-beam lithography. The polymer was dispensed on a 100 mm silicon substrate using a syringe-type dispensing system. The results were analyzed by atomic force microscopy and a scanning electron microscopy. The fabricated structures exhibited good lateral and vertical feature replication fidelities.

AB - We fabricated features down to 50 nm by UV step and stamp imprint lithography (UV-SSIL). This method enables fast sequential imprinting for large areas operating at room temperature with a low-viscosity material. This allows the patterning of both large micron-scale and submicron-scale structures simultaneously. A low-viscosity polymer allows pattern transfer at moderate pressures, thereby reducing mechanical stress on the stamp and substrate. Processing at room temperature helps to maintain the alignment and to prevent the distortion of the features caused by the thermal expansion of the mold and substrate. A UV-SSIL experiment with a novel photosensitive polymer was performed using a prototype of currently commercially available machines used for both thermal and UV step and stamp imprintings. As a master, we used a transparent quartz stamp (with features down to 50 nm) patterned by electron-beam lithography. The polymer was dispensed on a 100 mm silicon substrate using a syringe-type dispensing system. The results were analyzed by atomic force microscopy and a scanning electron microscopy. The fabricated structures exhibited good lateral and vertical feature replication fidelities.

KW - Imprinting

KW - Nanoimprinting

KW - SSIL

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KW - UV-SSIL

U2 - 10.1143/JJAP.47.5164

DO - 10.1143/JJAP.47.5164

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JO - Japanese Journal of Applied Physics

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