Imprinted 50 nm features fabricated by step and stamp UV imprinting

Tomi Haatainen, Päivi Majander, Tapio Mäkelä, Jouni Ahopelto, Y. Kawaguchi

    Research output: Contribution to journalArticleScientificpeer-review

    8 Citations (Scopus)


    We fabricated features down to 50 nm by UV step and stamp imprint lithography (UV-SSIL). This method enables fast sequential imprinting for large areas operating at room temperature with a low-viscosity material. This allows the patterning of both large micron-scale and submicron-scale structures simultaneously. A low-viscosity polymer allows pattern transfer at moderate pressures, thereby reducing mechanical stress on the stamp and substrate. Processing at room temperature helps to maintain the alignment and to prevent the distortion of the features caused by the thermal expansion of the mold and substrate. A UV-SSIL experiment with a novel photosensitive polymer was performed using a prototype of currently commercially available machines used for both thermal and UV step and stamp imprintings. As a master, we used a transparent quartz stamp (with features down to 50 nm) patterned by electron-beam lithography. The polymer was dispensed on a 100 mm silicon substrate using a syringe-type dispensing system. The results were analyzed by atomic force microscopy and a scanning electron microscopy. The fabricated structures exhibited good lateral and vertical feature replication fidelities.
    Original languageEnglish
    Pages (from-to)5164-5166
    Number of pages3
    JournalJapanese Journal of Applied Physics
    Publication statusPublished - 2008
    MoE publication typeA1 Journal article-refereed


    • Imprinting
    • Nanoimprinting
    • SSIL
    • UV-NIL
    • UV-SSIL


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