Imprinted polymer stamps for UV-NIL

Tomi Haatainen (Corresponding Author), Tapio Mäkelä, Jouni Ahopelto, Y. Kawaguchi

Research output: Contribution to journalArticleScientificpeer-review

10 Citations (Scopus)

Abstract

Thermal step and stamp nanoimprint lithography (SSIL) offers an alternative to fabricate transparent polymer stamps for UV-imprinting. The fabrication process does not require any other subsequent steps, e.g. dry etching or anti adhesive coating. In this work, we have manufactured UV-stamp by combining patterns of two different silicon masters. The patterns of the silicon masters were transferred into resin coated quartz plate by sequential imprinting. The first master consisted gratings with 50 nm features and the second master consisted dot arrays of 350 nm diameter features. The novel idea is the ability to create a large UV-stamp using a combination of small masters. Thus fabricated UV-stamps were used for demonstrating step and repeat UV-imprinting. The quality of the UV-stamps and imprints were analyzed by AFM. High fidelity patterns were achieved in respect to patterns in the original silicon master.

Original languageEnglish
Pages (from-to)2293-2296
Number of pages4
JournalMicroelectronic Engineering
Volume86
Issue number11
DOIs
Publication statusPublished - 2009
MoE publication typeA1 Journal article-refereed

Fingerprint

Silicon
Polymers
polymers
Nanoimprint lithography
Quartz
silicon
Dry etching
Adhesives
Resins
resins
adhesives
Fabrication
Coatings
lithography
quartz
etching
atomic force microscopy
gratings
coatings
fabrication

Keywords

  • Nanoimprinting
  • Step and stamp
  • UV-NIL

Cite this

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title = "Imprinted polymer stamps for UV-NIL",
abstract = "Thermal step and stamp nanoimprint lithography (SSIL) offers an alternative to fabricate transparent polymer stamps for UV-imprinting. The fabrication process does not require any other subsequent steps, e.g. dry etching or anti adhesive coating. In this work, we have manufactured UV-stamp by combining patterns of two different silicon masters. The patterns of the silicon masters were transferred into resin coated quartz plate by sequential imprinting. The first master consisted gratings with 50 nm features and the second master consisted dot arrays of 350 nm diameter features. The novel idea is the ability to create a large UV-stamp using a combination of small masters. Thus fabricated UV-stamps were used for demonstrating step and repeat UV-imprinting. The quality of the UV-stamps and imprints were analyzed by AFM. High fidelity patterns were achieved in respect to patterns in the original silicon master.",
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author = "Tomi Haatainen and Tapio M{\"a}kel{\"a} and Jouni Ahopelto and Y. Kawaguchi",
year = "2009",
doi = "10.1016/j.mee.2009.04.020",
language = "English",
volume = "86",
pages = "2293--2296",
journal = "Microelectronic Engineering",
issn = "0167-9317",
publisher = "Elsevier",
number = "11",

}

Imprinted polymer stamps for UV-NIL. / Haatainen, Tomi (Corresponding Author); Mäkelä, Tapio; Ahopelto, Jouni; Kawaguchi, Y.

In: Microelectronic Engineering, Vol. 86, No. 11, 2009, p. 2293-2296.

Research output: Contribution to journalArticleScientificpeer-review

TY - JOUR

T1 - Imprinted polymer stamps for UV-NIL

AU - Haatainen, Tomi

AU - Mäkelä, Tapio

AU - Ahopelto, Jouni

AU - Kawaguchi, Y.

PY - 2009

Y1 - 2009

N2 - Thermal step and stamp nanoimprint lithography (SSIL) offers an alternative to fabricate transparent polymer stamps for UV-imprinting. The fabrication process does not require any other subsequent steps, e.g. dry etching or anti adhesive coating. In this work, we have manufactured UV-stamp by combining patterns of two different silicon masters. The patterns of the silicon masters were transferred into resin coated quartz plate by sequential imprinting. The first master consisted gratings with 50 nm features and the second master consisted dot arrays of 350 nm diameter features. The novel idea is the ability to create a large UV-stamp using a combination of small masters. Thus fabricated UV-stamps were used for demonstrating step and repeat UV-imprinting. The quality of the UV-stamps and imprints were analyzed by AFM. High fidelity patterns were achieved in respect to patterns in the original silicon master.

AB - Thermal step and stamp nanoimprint lithography (SSIL) offers an alternative to fabricate transparent polymer stamps for UV-imprinting. The fabrication process does not require any other subsequent steps, e.g. dry etching or anti adhesive coating. In this work, we have manufactured UV-stamp by combining patterns of two different silicon masters. The patterns of the silicon masters were transferred into resin coated quartz plate by sequential imprinting. The first master consisted gratings with 50 nm features and the second master consisted dot arrays of 350 nm diameter features. The novel idea is the ability to create a large UV-stamp using a combination of small masters. Thus fabricated UV-stamps were used for demonstrating step and repeat UV-imprinting. The quality of the UV-stamps and imprints were analyzed by AFM. High fidelity patterns were achieved in respect to patterns in the original silicon master.

KW - Nanoimprinting

KW - Step and stamp

KW - UV-NIL

U2 - 10.1016/j.mee.2009.04.020

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