Influence of substrate material, sputter cleaning and intermediate layer on the adhesion of RF-plasma a-C:H coatings

Jarmo Vihersalo, Simo Varjus, Ulla Ehrnsten, Riitta Zilliacus, Jaakko Saarilahti, Pertti Nenonen, Helena Ronkainen

    Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

    Original languageEnglish
    Title of host publication2nd International Conference on the Applications of Diamond Films and Related Materials
    Subtitle of host publicationOmiya, Saitama, Japan, August 25-27, 1993
    EditorsM. Yoshikawa
    Number of pages7
    Publication statusPublished - 1993
    MoE publication typeA4 Article in a conference publication
    Event2nd International Conference on the Applications of Diamond Films and Related Materials, ADC '93 - Omiya, Japan
    Duration: 25 Aug 199327 Aug 1993

    Conference

    Conference2nd International Conference on the Applications of Diamond Films and Related Materials, ADC '93
    Abbreviated titleADC 1993
    CountryJapan
    CityOmiya
    Period25/08/9327/08/93

    Cite this

    Vihersalo, J., Varjus, S., Ehrnsten, U., Zilliacus, R., Saarilahti, J., Nenonen, P., & Ronkainen, H. (1993). Influence of substrate material, sputter cleaning and intermediate layer on the adhesion of RF-plasma a-C:H coatings. In M. Yoshikawa (Ed.), 2nd International Conference on the Applications of Diamond Films and Related Materials: Omiya, Saitama, Japan, August 25-27, 1993