Influence of substrate material, sputter cleaning and intermediate layer on the adhesion of RF-plasma a-C:H coatings

Jarmo Vihersalo; Simo Varjus; Ulla Ehrnsten; Riitta Zilliacus; Jaakko Saarilahti; Pertti Nenonen; Helena Ronkainen

Influence of substrate material, sputter cleaning and intermediate layer on the adhesion of RF-plasma a-C:H coatings

Jarmo Vihersalo, Simo Varjus, Ulla Ehrnsten, Riitta Zilliacus, Jaakko Saarilahti, Pertti Nenonen, Helena Ronkainen

Research output: Chapter in Book/Report/Conference proceeding › Conference article in proceedings › Scientific › peer-review

Original language	English
Title of host publication	2nd International Conference on the Applications of Diamond Films and Related Materials
Subtitle of host publication	Omiya, Saitama, Japan, August 25-27, 1993
Editors	M. Yoshikawa
Number of pages	7
Publication status	Published - 1993
MoE publication type	A4 Article in a conference publication
Event	2nd International Conference on the Applications of Diamond Films and Related Materials, ADC '93 - Omiya, Japan Duration: 25 Aug 1993 → 27 Aug 1993

Conference

Conference	2nd International Conference on the Applications of Diamond Films and Related Materials, ADC '93
Abbreviated title	ADC 1993
Country/Territory	Japan
City	Omiya
Period	25/08/93 → 27/08/93

Cite this

Vihersalo, J., Varjus, S., Ehrnsten, U., Zilliacus, R., Saarilahti, J., Nenonen, P., & Ronkainen, H. (1993). Influence of substrate material, sputter cleaning and intermediate layer on the adhesion of RF-plasma a-C:H coatings. In M. Yoshikawa (Ed.), 2nd International Conference on the Applications of Diamond Films and Related Materials: Omiya, Saitama, Japan, August 25-27, 1993

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title = "Influence of substrate material, sputter cleaning and intermediate layer on the adhesion of RF-plasma a-C:H coatings",

author = "Jarmo Vihersalo and Simo Varjus and Ulla Ehrnsten and Riitta Zilliacus and Jaakko Saarilahti and Pertti Nenonen and Helena Ronkainen",

year = "1993",

language = "English",

isbn = "49-4399507-1",

editor = "M. Yoshikawa",

booktitle = "2nd International Conference on the Applications of Diamond Films and Related Materials",

note = "2nd International Conference on the Applications of Diamond Films and Related Materials, ADC '93, ADC 1993 ; Conference date: 25-08-1993 Through 27-08-1993",

}

Vihersalo, J, Varjus, S, Ehrnsten, U, Zilliacus, R, Saarilahti, J, Nenonen, P & Ronkainen, H 1993, Influence of substrate material, sputter cleaning and intermediate layer on the adhesion of RF-plasma a-C:H coatings. in M Yoshikawa (ed.), 2nd International Conference on the Applications of Diamond Films and Related Materials: Omiya, Saitama, Japan, August 25-27, 1993. 2nd International Conference on the Applications of Diamond Films and Related Materials, ADC '93, Omiya, Japan, 25/08/93.

Influence of substrate material, sputter cleaning and intermediate layer on the adhesion of RF-plasma a-C:H coatings. / Vihersalo, Jarmo; Varjus, Simo; Ehrnsten, Ulla et al.
2nd International Conference on the Applications of Diamond Films and Related Materials: Omiya, Saitama, Japan, August 25-27, 1993. ed. / M. Yoshikawa. 1993.

Research output: Chapter in Book/Report/Conference proceeding › Conference article in proceedings › Scientific › peer-review

TY - GEN

T1 - Influence of substrate material, sputter cleaning and intermediate layer on the adhesion of RF-plasma a-C:H coatings

AU - Vihersalo, Jarmo

AU - Varjus, Simo

AU - Ehrnsten, Ulla

AU - Zilliacus, Riitta

AU - Saarilahti, Jaakko

AU - Nenonen, Pertti

AU - Ronkainen, Helena

PY - 1993

Y1 - 1993

M3 - Conference article in proceedings

SN - 49-4399507-1

SN - 978-494399507-4

BT - 2nd International Conference on the Applications of Diamond Films and Related Materials

A2 - Yoshikawa, M.

T2 - 2nd International Conference on the Applications of Diamond Films and Related Materials, ADC '93

Y2 - 25 August 1993 through 27 August 1993

ER -