Influence of substrate material, sputter cleaning and intermediate layer on the adhesion of RF-plasma a-C:H coatings

Jarmo Vihersalo, Simo Varjus, Ulla Ehrnsten, Riitta Zilliacus, Jaakko Saarilahti, Pertti Nenonen, Helena Ronkainen

Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

Original languageEnglish
Title of host publication2nd International Conference on the Applications of Diamond Films and Related Materials
Subtitle of host publicationOmiya, Saitama, Japan, August 25-27, 1993
EditorsM. Yoshikawa
Number of pages7
Publication statusPublished - 1993
MoE publication typeA4 Article in a conference publication
Event2nd International Conference on the Applications of Diamond Films and Related Materials, ADC '93 - Omiya, Japan
Duration: 25 Aug 199327 Aug 1993

Conference

Conference2nd International Conference on the Applications of Diamond Films and Related Materials, ADC '93
Abbreviated titleADC 1993
CountryJapan
CityOmiya
Period25/08/9327/08/93

Cite this

Vihersalo, J., Varjus, S., Ehrnsten, U., Zilliacus, R., Saarilahti, J., Nenonen, P., & Ronkainen, H. (1993). Influence of substrate material, sputter cleaning and intermediate layer on the adhesion of RF-plasma a-C:H coatings. In M. Yoshikawa (Ed.), 2nd International Conference on the Applications of Diamond Films and Related Materials: Omiya, Saitama, Japan, August 25-27, 1993
Vihersalo, Jarmo ; Varjus, Simo ; Ehrnsten, Ulla ; Zilliacus, Riitta ; Saarilahti, Jaakko ; Nenonen, Pertti ; Ronkainen, Helena. / Influence of substrate material, sputter cleaning and intermediate layer on the adhesion of RF-plasma a-C:H coatings. 2nd International Conference on the Applications of Diamond Films and Related Materials: Omiya, Saitama, Japan, August 25-27, 1993. editor / M. Yoshikawa. 1993.
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title = "Influence of substrate material, sputter cleaning and intermediate layer on the adhesion of RF-plasma a-C:H coatings",
author = "Jarmo Vihersalo and Simo Varjus and Ulla Ehrnsten and Riitta Zilliacus and Jaakko Saarilahti and Pertti Nenonen and Helena Ronkainen",
year = "1993",
language = "English",
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editor = "M. Yoshikawa",
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Vihersalo, J, Varjus, S, Ehrnsten, U, Zilliacus, R, Saarilahti, J, Nenonen, P & Ronkainen, H 1993, Influence of substrate material, sputter cleaning and intermediate layer on the adhesion of RF-plasma a-C:H coatings. in M Yoshikawa (ed.), 2nd International Conference on the Applications of Diamond Films and Related Materials: Omiya, Saitama, Japan, August 25-27, 1993. 2nd International Conference on the Applications of Diamond Films and Related Materials, ADC '93, Omiya, Japan, 25/08/93.

Influence of substrate material, sputter cleaning and intermediate layer on the adhesion of RF-plasma a-C:H coatings. / Vihersalo, Jarmo; Varjus, Simo; Ehrnsten, Ulla; Zilliacus, Riitta; Saarilahti, Jaakko; Nenonen, Pertti; Ronkainen, Helena.

2nd International Conference on the Applications of Diamond Films and Related Materials: Omiya, Saitama, Japan, August 25-27, 1993. ed. / M. Yoshikawa. 1993.

Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

TY - GEN

T1 - Influence of substrate material, sputter cleaning and intermediate layer on the adhesion of RF-plasma a-C:H coatings

AU - Vihersalo, Jarmo

AU - Varjus, Simo

AU - Ehrnsten, Ulla

AU - Zilliacus, Riitta

AU - Saarilahti, Jaakko

AU - Nenonen, Pertti

AU - Ronkainen, Helena

PY - 1993

Y1 - 1993

M3 - Conference article in proceedings

SN - 49-4399507-1

SN - 978-494399507-4

BT - 2nd International Conference on the Applications of Diamond Films and Related Materials

A2 - Yoshikawa, M.

ER -

Vihersalo J, Varjus S, Ehrnsten U, Zilliacus R, Saarilahti J, Nenonen P et al. Influence of substrate material, sputter cleaning and intermediate layer on the adhesion of RF-plasma a-C:H coatings. In Yoshikawa M, editor, 2nd International Conference on the Applications of Diamond Films and Related Materials: Omiya, Saitama, Japan, August 25-27, 1993. 1993