Influence of substrate material, sputter cleaning and intermediate layer on the adhesion of RF-plasma a-C:H coatings

Jarmo Vihersalo, Simo Varjus, Ulla Ehrnsten, Riitta Zilliacus, Jaakko Saarilahti, Pertti Nenonen, Helena Ronkainen

    Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

    Original languageEnglish
    Title of host publication2nd International Conference on the Applications of Diamond Films and Related Materials
    Subtitle of host publicationOmiya, Saitama, Japan, August 25-27, 1993
    EditorsM. Yoshikawa
    Number of pages7
    Publication statusPublished - 1993
    MoE publication typeA4 Article in a conference publication
    Event2nd International Conference on the Applications of Diamond Films and Related Materials, ADC '93 - Omiya, Japan
    Duration: 25 Aug 199327 Aug 1993

    Conference

    Conference2nd International Conference on the Applications of Diamond Films and Related Materials, ADC '93
    Abbreviated titleADC 1993
    CountryJapan
    CityOmiya
    Period25/08/9327/08/93

    Cite this

    Vihersalo, J., Varjus, S., Ehrnsten, U., Zilliacus, R., Saarilahti, J., Nenonen, P., & Ronkainen, H. (1993). Influence of substrate material, sputter cleaning and intermediate layer on the adhesion of RF-plasma a-C:H coatings. In M. Yoshikawa (Ed.), 2nd International Conference on the Applications of Diamond Films and Related Materials: Omiya, Saitama, Japan, August 25-27, 1993
    Vihersalo, Jarmo ; Varjus, Simo ; Ehrnsten, Ulla ; Zilliacus, Riitta ; Saarilahti, Jaakko ; Nenonen, Pertti ; Ronkainen, Helena. / Influence of substrate material, sputter cleaning and intermediate layer on the adhesion of RF-plasma a-C:H coatings. 2nd International Conference on the Applications of Diamond Films and Related Materials: Omiya, Saitama, Japan, August 25-27, 1993. editor / M. Yoshikawa. 1993.
    @inproceedings{649580be3baf40bea39e96b80450ed69,
    title = "Influence of substrate material, sputter cleaning and intermediate layer on the adhesion of RF-plasma a-C:H coatings",
    author = "Jarmo Vihersalo and Simo Varjus and Ulla Ehrnsten and Riitta Zilliacus and Jaakko Saarilahti and Pertti Nenonen and Helena Ronkainen",
    year = "1993",
    language = "English",
    isbn = "49-4399507-1",
    editor = "M. Yoshikawa",
    booktitle = "2nd International Conference on the Applications of Diamond Films and Related Materials",

    }

    Vihersalo, J, Varjus, S, Ehrnsten, U, Zilliacus, R, Saarilahti, J, Nenonen, P & Ronkainen, H 1993, Influence of substrate material, sputter cleaning and intermediate layer on the adhesion of RF-plasma a-C:H coatings. in M Yoshikawa (ed.), 2nd International Conference on the Applications of Diamond Films and Related Materials: Omiya, Saitama, Japan, August 25-27, 1993. 2nd International Conference on the Applications of Diamond Films and Related Materials, ADC '93, Omiya, Japan, 25/08/93.

    Influence of substrate material, sputter cleaning and intermediate layer on the adhesion of RF-plasma a-C:H coatings. / Vihersalo, Jarmo; Varjus, Simo; Ehrnsten, Ulla; Zilliacus, Riitta; Saarilahti, Jaakko; Nenonen, Pertti; Ronkainen, Helena.

    2nd International Conference on the Applications of Diamond Films and Related Materials: Omiya, Saitama, Japan, August 25-27, 1993. ed. / M. Yoshikawa. 1993.

    Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

    TY - GEN

    T1 - Influence of substrate material, sputter cleaning and intermediate layer on the adhesion of RF-plasma a-C:H coatings

    AU - Vihersalo, Jarmo

    AU - Varjus, Simo

    AU - Ehrnsten, Ulla

    AU - Zilliacus, Riitta

    AU - Saarilahti, Jaakko

    AU - Nenonen, Pertti

    AU - Ronkainen, Helena

    PY - 1993

    Y1 - 1993

    M3 - Conference article in proceedings

    SN - 49-4399507-1

    SN - 978-494399507-4

    BT - 2nd International Conference on the Applications of Diamond Films and Related Materials

    A2 - Yoshikawa, M.

    ER -

    Vihersalo J, Varjus S, Ehrnsten U, Zilliacus R, Saarilahti J, Nenonen P et al. Influence of substrate material, sputter cleaning and intermediate layer on the adhesion of RF-plasma a-C:H coatings. In Yoshikawa M, editor, 2nd International Conference on the Applications of Diamond Films and Related Materials: Omiya, Saitama, Japan, August 25-27, 1993. 1993