Integrated bragg gratings in silicon-on-insulator waveguides

Timo Aalto, Sanna Yliniemi, Päivi Heimala, Panu Pekko, Janne Simonen, Markku Kuittinen

Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

9 Citations (Scopus)

Abstract

In our work we have fabricated Bragg grating structures in silicon-on-insulator (SOI) waveguides. SOI waveguides enable integration of both passive and active functions, e.g. thermal, electrical or micromechanical tuning and optical receiving with the gratings. As silicon is a high refractive index material the first order grating period at 1550 nm wavelength is short, only 225 nm, and this period must be precisely controlled. Moreover, the grating must be spatially coherent over its entire length. All this introduces a great challenge for the fabrication techniques used to pattern the grating. Our approach to process gratings in SOI waveguides is based on direct e-beam writing and silicon etching with inductively coupled plasma (ICP). We show results on high aspect ratio Bragg gratings integrated with SOI waveguides with large core size.
Original languageEnglish
Title of host publicationIntegrated Optics
Subtitle of host publicationDevices, Materials, and Technologies VI
PublisherInternational Society for Optics and Photonics SPIE
Pages117-124
ISBN (Print)0-8194-4379-4
DOIs
Publication statusPublished - 2002
MoE publication typeA4 Article in a conference publication
EventPhotonics West 2002 (PW2002): Symposium on Integrated Optoelectronic Devices - San Jose, United States
Duration: 21 Jan 200223 Jan 2002

Publication series

SeriesProceedings of SPIE
Volume4640
ISSN0277-786X

Conference

ConferencePhotonics West 2002 (PW2002)
CountryUnited States
CitySan Jose
Period21/01/0223/01/02

Fingerprint

Bragg gratings
insulators
waveguides
gratings
silicon
high aspect ratio
tuning
etching
refractivity
fabrication
wavelengths

Keywords

  • integrated optics
  • silicon-on-insulator
  • SOI
  • ridge waveguide
  • grating
  • ICP
  • inductively coupled plasma etching

Cite this

Aalto, T., Yliniemi, S., Heimala, P., Pekko, P., Simonen, J., & Kuittinen, M. (2002). Integrated bragg gratings in silicon-on-insulator waveguides. In Integrated Optics: Devices, Materials, and Technologies VI (pp. 117-124). International Society for Optics and Photonics SPIE. Proceedings of SPIE, Vol.. 4640 https://doi.org/10.1117/12.433242
Aalto, Timo ; Yliniemi, Sanna ; Heimala, Päivi ; Pekko, Panu ; Simonen, Janne ; Kuittinen, Markku. / Integrated bragg gratings in silicon-on-insulator waveguides. Integrated Optics: Devices, Materials, and Technologies VI. International Society for Optics and Photonics SPIE, 2002. pp. 117-124 (Proceedings of SPIE, Vol. 4640).
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abstract = "In our work we have fabricated Bragg grating structures in silicon-on-insulator (SOI) waveguides. SOI waveguides enable integration of both passive and active functions, e.g. thermal, electrical or micromechanical tuning and optical receiving with the gratings. As silicon is a high refractive index material the first order grating period at 1550 nm wavelength is short, only 225 nm, and this period must be precisely controlled. Moreover, the grating must be spatially coherent over its entire length. All this introduces a great challenge for the fabrication techniques used to pattern the grating. Our approach to process gratings in SOI waveguides is based on direct e-beam writing and silicon etching with inductively coupled plasma (ICP). We show results on high aspect ratio Bragg gratings integrated with SOI waveguides with large core size.",
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Aalto, T, Yliniemi, S, Heimala, P, Pekko, P, Simonen, J & Kuittinen, M 2002, Integrated bragg gratings in silicon-on-insulator waveguides. in Integrated Optics: Devices, Materials, and Technologies VI. International Society for Optics and Photonics SPIE, Proceedings of SPIE, vol. 4640, pp. 117-124, Photonics West 2002 (PW2002), San Jose, United States, 21/01/02. https://doi.org/10.1117/12.433242

Integrated bragg gratings in silicon-on-insulator waveguides. / Aalto, Timo; Yliniemi, Sanna; Heimala, Päivi; Pekko, Panu; Simonen, Janne; Kuittinen, Markku.

Integrated Optics: Devices, Materials, and Technologies VI. International Society for Optics and Photonics SPIE, 2002. p. 117-124 (Proceedings of SPIE, Vol. 4640).

Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

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AU - Kuittinen, Markku

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AB - In our work we have fabricated Bragg grating structures in silicon-on-insulator (SOI) waveguides. SOI waveguides enable integration of both passive and active functions, e.g. thermal, electrical or micromechanical tuning and optical receiving with the gratings. As silicon is a high refractive index material the first order grating period at 1550 nm wavelength is short, only 225 nm, and this period must be precisely controlled. Moreover, the grating must be spatially coherent over its entire length. All this introduces a great challenge for the fabrication techniques used to pattern the grating. Our approach to process gratings in SOI waveguides is based on direct e-beam writing and silicon etching with inductively coupled plasma (ICP). We show results on high aspect ratio Bragg gratings integrated with SOI waveguides with large core size.

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Aalto T, Yliniemi S, Heimala P, Pekko P, Simonen J, Kuittinen M. Integrated bragg gratings in silicon-on-insulator waveguides. In Integrated Optics: Devices, Materials, and Technologies VI. International Society for Optics and Photonics SPIE. 2002. p. 117-124. (Proceedings of SPIE, Vol. 4640). https://doi.org/10.1117/12.433242