Integrated bragg gratings in silicon-on-insulator waveguides

Timo Aalto, Sanna Yliniemi, Päivi Heimala, Panu Pekko, Janne Simonen, Markku Kuittinen

    Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

    9 Citations (Scopus)


    In our work we have fabricated Bragg grating structures in silicon-on-insulator (SOI) waveguides. SOI waveguides enable integration of both passive and active functions, e.g. thermal, electrical or micromechanical tuning and optical receiving with the gratings. As silicon is a high refractive index material the first order grating period at 1550 nm wavelength is short, only 225 nm, and this period must be precisely controlled. Moreover, the grating must be spatially coherent over its entire length. All this introduces a great challenge for the fabrication techniques used to pattern the grating. Our approach to process gratings in SOI waveguides is based on direct e-beam writing and silicon etching with inductively coupled plasma (ICP). We show results on high aspect ratio Bragg gratings integrated with SOI waveguides with large core size.
    Original languageEnglish
    Title of host publicationIntegrated Optics
    Subtitle of host publicationDevices, Materials, and Technologies VI
    PublisherInternational Society for Optics and Photonics SPIE
    ISBN (Print)0-8194-4379-4
    Publication statusPublished - 2002
    MoE publication typeA4 Article in a conference publication
    EventPhotonics West 2002 (PW2002): Symposium on Integrated Optoelectronic Devices - San Jose, United States
    Duration: 21 Jan 200223 Jan 2002

    Publication series

    SeriesProceedings of SPIE


    ConferencePhotonics West 2002 (PW2002)
    Country/TerritoryUnited States
    CitySan Jose


    • integrated optics
    • silicon-on-insulator
    • SOI
    • ridge waveguide
    • grating
    • ICP
    • inductively coupled plasma etching


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