Integration of rotated 3-D structures into pre-patterned PMMA substrate using step & stamp nanoimprint lithography

Tomi Haatainen; Tapio Mäkelä; Arne Schleunitz; Gianluca Grenci; Massimo Tormen

doi:10.1016/j.mee.2012.07.042

Integration of rotated 3-D structures into pre-patterned PMMA substrate using step & stamp nanoimprint lithography

Tomi Haatainen (Corresponding Author), Tapio Mäkelä, Arne Schleunitz, Gianluca Grenci, Massimo Tormen

Research output: Contribution to journal › Article › Scientific › peer-review

5 Citations (Scopus)

Abstract

In this work, we fabricated hybrid micron-scale blazed grating structures on top of linear nanoscale gratings by superimposing thermal nanoimprint process. A poly(methyl methacrylate) (PMMA) substrate was at first pre-patterned with a nanoscale binary line grating by thermal NIL. The second imprint was added into the linear surface-gratings by sequential thermal imprinting using a stamp with micron-scale blazed gratings. The rotation controlled patterning was realized by Step and Stamp Imprint Lithography (SSIL) using NPS300 nanoimprinting stepper with a rotation imprint head with ability to control X/Y positioning and angular orientation of the stamp. In this paper, we demonstrate the potential of the hybrid imprint process for fabrication of e.g. hybrid bio devices or optical elements with arbitrary orientation.

Original language	English
Pages (from-to)	180-183
Journal	Microelectronic Engineering
Volume	98
DOIs	https://doi.org/10.1016/j.mee.2012.07.042
Publication status	Published - 2012
MoE publication type	A1 Journal article-refereed
Event	37th International Conference on Micro- and Nano-Engineering, MNE 2011 - Berlin, Germany Duration: 19 Sept 2011 → 23 Sept 2011 Conference number: 37

Keywords

LIGA
nanoimprint
NIL
SSIL
step and repeat
three-dimensional nanofabrication

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

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10.1016/j.mee.2012.07.042

Cite this

@article{f1226c5883044cfd8943b3297a20ca8e,

title = "Integration of rotated 3-D structures into pre-patterned PMMA substrate using step & stamp nanoimprint lithography",

abstract = "In this work, we fabricated hybrid micron-scale blazed grating structures on top of linear nanoscale gratings by superimposing thermal nanoimprint process. A poly(methyl methacrylate) (PMMA) substrate was at first pre-patterned with a nanoscale binary line grating by thermal NIL. The second imprint was added into the linear surface-gratings by sequential thermal imprinting using a stamp with micron-scale blazed gratings. The rotation controlled patterning was realized by Step and Stamp Imprint Lithography (SSIL) using NPS300 nanoimprinting stepper with a rotation imprint head with ability to control X/Y positioning and angular orientation of the stamp. In this paper, we demonstrate the potential of the hybrid imprint process for fabrication of e.g. hybrid bio devices or optical elements with arbitrary orientation.",

keywords = "LIGA, nanoimprint, NIL, SSIL, step and repeat, three-dimensional nanofabrication",

author = "Tomi Haatainen and Tapio M{\"a}kel{\"a} and Arne Schleunitz and Gianluca Grenci and Massimo Tormen",

note = "Based on conf. paper P-LITH-026; 37th International Conference on Micro- and Nano-Engineering, MNE 2011, MNE2011 ; Conference date: 19-09-2011 Through 23-09-2011",

year = "2012",

doi = "10.1016/j.mee.2012.07.042",

language = "English",

volume = "98",

pages = "180--183",

journal = "Microelectronic Engineering",

issn = "0167-9317",

publisher = "Elsevier B.V.",

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TY - JOUR

T1 - Integration of rotated 3-D structures into pre-patterned PMMA substrate using step & stamp nanoimprint lithography

AU - Haatainen, Tomi

AU - Mäkelä, Tapio

AU - Schleunitz, Arne

AU - Grenci, Gianluca

AU - Tormen, Massimo

N1 - Conference code: 37

PY - 2012

Y1 - 2012

N2 - In this work, we fabricated hybrid micron-scale blazed grating structures on top of linear nanoscale gratings by superimposing thermal nanoimprint process. A poly(methyl methacrylate) (PMMA) substrate was at first pre-patterned with a nanoscale binary line grating by thermal NIL. The second imprint was added into the linear surface-gratings by sequential thermal imprinting using a stamp with micron-scale blazed gratings. The rotation controlled patterning was realized by Step and Stamp Imprint Lithography (SSIL) using NPS300 nanoimprinting stepper with a rotation imprint head with ability to control X/Y positioning and angular orientation of the stamp. In this paper, we demonstrate the potential of the hybrid imprint process for fabrication of e.g. hybrid bio devices or optical elements with arbitrary orientation.

AB - In this work, we fabricated hybrid micron-scale blazed grating structures on top of linear nanoscale gratings by superimposing thermal nanoimprint process. A poly(methyl methacrylate) (PMMA) substrate was at first pre-patterned with a nanoscale binary line grating by thermal NIL. The second imprint was added into the linear surface-gratings by sequential thermal imprinting using a stamp with micron-scale blazed gratings. The rotation controlled patterning was realized by Step and Stamp Imprint Lithography (SSIL) using NPS300 nanoimprinting stepper with a rotation imprint head with ability to control X/Y positioning and angular orientation of the stamp. In this paper, we demonstrate the potential of the hybrid imprint process for fabrication of e.g. hybrid bio devices or optical elements with arbitrary orientation.

KW - LIGA

KW - nanoimprint

KW - NIL

KW - SSIL

KW - step and repeat

KW - three-dimensional nanofabrication

U2 - 10.1016/j.mee.2012.07.042

DO - 10.1016/j.mee.2012.07.042

M3 - Article

SN - 0167-9317

VL - 98

SP - 180

EP - 183

JO - Microelectronic Engineering

JF - Microelectronic Engineering

T2 - 37th International Conference on Micro- and Nano-Engineering, MNE 2011

Y2 - 19 September 2011 through 23 September 2011

ER -

Integration of rotated 3-D structures into pre-patterned PMMA substrate using step & stamp nanoimprint lithography

Abstract

Keywords

UN SDGs

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