Integration of rotated 3-D structures into pre-patterned PMMA substrate using step & stamp nanoimprint lithography

Tomi Haatainen (Corresponding Author), Tapio Mäkelä, Arne Schleunitz, Gianluca Grenci, Massimo Tormen

Research output: Contribution to journalArticleScientificpeer-review

4 Citations (Scopus)

Abstract

In this work, we fabricated hybrid micron-scale blazed grating structures on top of linear nanoscale gratings by superimposing thermal nanoimprint process. A poly(methyl methacrylate) (PMMA) substrate was at first pre-patterned with a nanoscale binary line grating by thermal NIL. The second imprint was added into the linear surface-gratings by sequential thermal imprinting using a stamp with micron-scale blazed gratings. The rotation controlled patterning was realized by Step and Stamp Imprint Lithography (SSIL) using NPS300 nanoimprinting stepper with a rotation imprint head with ability to control X/Y positioning and angular orientation of the stamp. In this paper, we demonstrate the potential of the hybrid imprint process for fabrication of e.g. hybrid bio devices or optical elements with arbitrary orientation.
Original languageEnglish
Pages (from-to)180-183
Number of pages3
JournalMicroelectronic Engineering
Volume98
DOIs
Publication statusPublished - 2012
MoE publication typeA1 Journal article-refereed
Event37th International Conference on Micro- and Nano-Engineering, MNE 2011 - Berlin, Germany
Duration: 19 Sep 201123 Sep 2011
Conference number: 37

Fingerprint

Nanoimprint lithography
Polymethyl Methacrylate
Polymethyl methacrylates
polymethyl methacrylate
lithography
gratings
Substrates
Optical devices
Lithography
Fabrication
positioning
Hot Temperature
fabrication

Keywords

  • LIGA
  • nanoimprint
  • NIL
  • SSIL
  • step and repeat
  • three-dimensional nanofabrication

Cite this

@article{f1226c5883044cfd8943b3297a20ca8e,
title = "Integration of rotated 3-D structures into pre-patterned PMMA substrate using step & stamp nanoimprint lithography",
abstract = "In this work, we fabricated hybrid micron-scale blazed grating structures on top of linear nanoscale gratings by superimposing thermal nanoimprint process. A poly(methyl methacrylate) (PMMA) substrate was at first pre-patterned with a nanoscale binary line grating by thermal NIL. The second imprint was added into the linear surface-gratings by sequential thermal imprinting using a stamp with micron-scale blazed gratings. The rotation controlled patterning was realized by Step and Stamp Imprint Lithography (SSIL) using NPS300 nanoimprinting stepper with a rotation imprint head with ability to control X/Y positioning and angular orientation of the stamp. In this paper, we demonstrate the potential of the hybrid imprint process for fabrication of e.g. hybrid bio devices or optical elements with arbitrary orientation.",
keywords = "LIGA, nanoimprint, NIL, SSIL, step and repeat, three-dimensional nanofabrication",
author = "Tomi Haatainen and Tapio M{\"a}kel{\"a} and Arne Schleunitz and Gianluca Grenci and Massimo Tormen",
note = "Based on conf. paper P-LITH-026",
year = "2012",
doi = "10.1016/j.mee.2012.07.042",
language = "English",
volume = "98",
pages = "180--183",
journal = "Microelectronic Engineering",
issn = "0167-9317",
publisher = "Elsevier",

}

Integration of rotated 3-D structures into pre-patterned PMMA substrate using step & stamp nanoimprint lithography. / Haatainen, Tomi (Corresponding Author); Mäkelä, Tapio; Schleunitz, Arne; Grenci, Gianluca; Tormen, Massimo.

In: Microelectronic Engineering, Vol. 98, 2012, p. 180-183.

Research output: Contribution to journalArticleScientificpeer-review

TY - JOUR

T1 - Integration of rotated 3-D structures into pre-patterned PMMA substrate using step & stamp nanoimprint lithography

AU - Haatainen, Tomi

AU - Mäkelä, Tapio

AU - Schleunitz, Arne

AU - Grenci, Gianluca

AU - Tormen, Massimo

N1 - Based on conf. paper P-LITH-026

PY - 2012

Y1 - 2012

N2 - In this work, we fabricated hybrid micron-scale blazed grating structures on top of linear nanoscale gratings by superimposing thermal nanoimprint process. A poly(methyl methacrylate) (PMMA) substrate was at first pre-patterned with a nanoscale binary line grating by thermal NIL. The second imprint was added into the linear surface-gratings by sequential thermal imprinting using a stamp with micron-scale blazed gratings. The rotation controlled patterning was realized by Step and Stamp Imprint Lithography (SSIL) using NPS300 nanoimprinting stepper with a rotation imprint head with ability to control X/Y positioning and angular orientation of the stamp. In this paper, we demonstrate the potential of the hybrid imprint process for fabrication of e.g. hybrid bio devices or optical elements with arbitrary orientation.

AB - In this work, we fabricated hybrid micron-scale blazed grating structures on top of linear nanoscale gratings by superimposing thermal nanoimprint process. A poly(methyl methacrylate) (PMMA) substrate was at first pre-patterned with a nanoscale binary line grating by thermal NIL. The second imprint was added into the linear surface-gratings by sequential thermal imprinting using a stamp with micron-scale blazed gratings. The rotation controlled patterning was realized by Step and Stamp Imprint Lithography (SSIL) using NPS300 nanoimprinting stepper with a rotation imprint head with ability to control X/Y positioning and angular orientation of the stamp. In this paper, we demonstrate the potential of the hybrid imprint process for fabrication of e.g. hybrid bio devices or optical elements with arbitrary orientation.

KW - LIGA

KW - nanoimprint

KW - NIL

KW - SSIL

KW - step and repeat

KW - three-dimensional nanofabrication

U2 - 10.1016/j.mee.2012.07.042

DO - 10.1016/j.mee.2012.07.042

M3 - Article

VL - 98

SP - 180

EP - 183

JO - Microelectronic Engineering

JF - Microelectronic Engineering

SN - 0167-9317

ER -