Ion-implanted capacitively coupled silicon strip detectors with integrated polysilicon bias resistors processed on a 100 mm wafer

Keyphrases

• Capacitively Coupled 100%
• Ion Implantation 100%
• Wafer 100%
• Bias Resistor 100%
• Silicon Strip Detector 100%
• Polysilicon 100%
• Signal-to-noise 50%
• Active Area 50%
• Double-sided Silicon Strip Detector 50%
• Readout Electronics 50%
• Polysilicon Resistor 50%
• Coupling Capacitor 50%
• 90Sr 50%

INIS

• silicon 100%
• ion implantation 100%
• readout systems 100%
• resistors 100%
• pitches 66%
• coupling 33%
• noise 33%
• signals 33%
• lasers 33%
• capacitors 33%
• strontium 90 33%

Engineering

• Polysilicon 100%
• Active Area 50%
• Coupling Capacitor 50%