Josephson Parametric Amplifiers Fabricated in Wafer-scale with Side-wall Passivated Spacer Junction Technology

Visa Vesterinen; Slawomir Simbierowicz; Leif Grönberg; Janne Lehtinen; Robab (Leila) Najafi Jabdaraghi; Mika Prunnila; Joonas Govenius

Josephson Parametric Amplifiers Fabricated in Wafer-scale with Side-wall Passivated Spacer Junction Technology

Visa Vesterinen, Slawomir Simbierowicz, Leif Grönberg, Janne Lehtinen, Robab (Leila) Najafi Jabdaraghi, Mika Prunnila, Joonas Govenius

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Abstract

We present our latest experimental results on Josephson parametric amplifiers (JPAs) fabricated with our Nb/Al-AlOx/Nb junction process. The fabrication relies on UV photolithography and semi-automated 150-mm wafer processing steps, while minimizing the amount of deposited lossy dielectric materials [1]. The first JPA category is a flux-driven reflection amplifier for sub-GHz frequencies. It has found applications in the rf reflectometry of quantum dots, as well as in the rf readout of microwave nanobolometers [2] and charge detectors. Secondly, we report on the development of a 4-8 GHz traveling wave parametric amplifier tailored for the readout of superconducting quantum bits.

Original language	English
Number of pages	1
Journal	Bulletin of the American Physical Society
Volume	65
Issue number	1
Publication status	Published - 6 Mar 2020
MoE publication type	Not Eligible
Event	APS March Meeting 2020: Online - Canceled, Denver, United States Duration: 2 Mar 2020 → 6 Mar 2020 http://meetings.aps.org/Meeting/MAR20/Content/3845 (Conference abstracts) https://meetings.aps.org/Meeting/MAR20/Content/3845

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https://meetings.aps.org/Meeting/MAR20/Session/W07.12

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@article{502cd68532a447e38bd8701603ac252d,

title = "Josephson Parametric Amplifiers Fabricated in Wafer-scale with Side-wall Passivated Spacer Junction Technology",

abstract = "We present our latest experimental results on Josephson parametric amplifiers (JPAs) fabricated with our Nb/Al-AlOx/Nb junction process. The fabrication relies on UV photolithography and semi-automated 150-mm wafer processing steps, while minimizing the amount of deposited lossy dielectric materials [1]. The first JPA category is a flux-driven reflection amplifier for sub-GHz frequencies. It has found applications in the rf reflectometry of quantum dots, as well as in the rf readout of microwave nanobolometers [2] and charge detectors. Secondly, we report on the development of a 4-8 GHz traveling wave parametric amplifier tailored for the readout of superconducting quantum bits.",

author = "Visa Vesterinen and Slawomir Simbierowicz and Leif Gr{\"o}nberg and Janne Lehtinen and {Najafi Jabdaraghi}, {Robab (Leila)} and Mika Prunnila and Joonas Govenius",

note = "Abstract only; APS March Meeting 2020 : Online ; Conference date: 02-03-2020 Through 06-03-2020",

year = "2020",

month = mar,

day = "6",

language = "English",

volume = "65",

journal = "Bulletin of the American Physical Society",

issn = "0003-0503",

publisher = "American Physical Society (APS)",

number = "1",

url = "http://meetings.aps.org/Meeting/MAR20/Content/3845, https://meetings.aps.org/Meeting/MAR20/Content/3845",

}

TY - JOUR

T1 - Josephson Parametric Amplifiers Fabricated in Wafer-scale with Side-wall Passivated Spacer Junction Technology

AU - Vesterinen, Visa

AU - Simbierowicz, Slawomir

AU - Grönberg, Leif

AU - Lehtinen, Janne

AU - Najafi Jabdaraghi, Robab (Leila)

AU - Prunnila, Mika

AU - Govenius, Joonas

N1 - Abstract only

PY - 2020/3/6

Y1 - 2020/3/6

N2 - We present our latest experimental results on Josephson parametric amplifiers (JPAs) fabricated with our Nb/Al-AlOx/Nb junction process. The fabrication relies on UV photolithography and semi-automated 150-mm wafer processing steps, while minimizing the amount of deposited lossy dielectric materials [1]. The first JPA category is a flux-driven reflection amplifier for sub-GHz frequencies. It has found applications in the rf reflectometry of quantum dots, as well as in the rf readout of microwave nanobolometers [2] and charge detectors. Secondly, we report on the development of a 4-8 GHz traveling wave parametric amplifier tailored for the readout of superconducting quantum bits.

AB - We present our latest experimental results on Josephson parametric amplifiers (JPAs) fabricated with our Nb/Al-AlOx/Nb junction process. The fabrication relies on UV photolithography and semi-automated 150-mm wafer processing steps, while minimizing the amount of deposited lossy dielectric materials [1]. The first JPA category is a flux-driven reflection amplifier for sub-GHz frequencies. It has found applications in the rf reflectometry of quantum dots, as well as in the rf readout of microwave nanobolometers [2] and charge detectors. Secondly, we report on the development of a 4-8 GHz traveling wave parametric amplifier tailored for the readout of superconducting quantum bits.

M3 - Article in a proceedings journal

SN - 0003-0503

VL - 65

JO - Bulletin of the American Physical Society

JF - Bulletin of the American Physical Society

IS - 1

T2 - APS March Meeting 2020

Y2 - 2 March 2020 through 6 March 2020

ER -

Josephson Parametric Amplifiers Fabricated in Wafer-scale with Side-wall Passivated Spacer Junction Technology

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