Josephson Parametric Amplifiers Fabricated in Wafer-scale with Side-wall Passivated Spacer Junction Technology

Research output: Contribution to journalArticle in a proceedings journalScientific

Abstract

We present our latest experimental results on Josephson parametric amplifiers (JPAs) fabricated with our Nb/Al-AlOx/Nb junction process. The fabrication relies on UV photolithography and semi-automated 150-mm wafer processing steps, while minimizing the amount of deposited lossy dielectric materials [1]. The first JPA category is a flux-driven reflection amplifier for sub-GHz frequencies. It has found applications in the rf reflectometry of quantum dots, as well as in the rf readout of microwave nanobolometers [2] and charge detectors. Secondly, we report on the development of a 4-8 GHz traveling wave parametric amplifier tailored for the readout of superconducting quantum bits.
Original languageEnglish
Number of pages1
JournalBulletin of the American Physical Society
Volume65
Issue number1
Publication statusPublished - 6 Mar 2020
MoE publication typeNot Eligible
EventAPS March Meeting 2020: Online - Canceled, Denver, United States
Duration: 2 Mar 20206 Mar 2020
http://meetings.aps.org/Meeting/MAR20/Content/3845 (Conference abstracts)
https://meetings.aps.org/Meeting/MAR20/Content/3845

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