We present our latest experimental results on Josephson parametric amplifiers (JPAs) fabricated with our Nb/Al-AlOx/Nb junction process. The fabrication relies on UV photolithography and semi-automated 150-mm wafer processing steps, while minimizing the amount of deposited lossy dielectric materials . The first JPA category is a flux-driven reflection amplifier for sub-GHz frequencies. It has found applications in the rf reflectometry of quantum dots, as well as in the rf readout of microwave nanobolometers  and charge detectors. Secondly, we report on the development of a 4-8 GHz traveling wave parametric amplifier tailored for the readout of superconducting quantum bits.
|Number of pages||1|
|Journal||Bulletin of the American Physical Society|
|Publication status||Published - 6 Mar 2020|
|MoE publication type||Not Eligible|
|Event||APS March Meeting 2020: Online - Canceled, Denver, United States|
Duration: 2 Mar 2020 → 6 Mar 2020
http://meetings.aps.org/Meeting/MAR20/Content/3845 (Conference abstracts)