Abstract
We present our latest experimental results on Josephson parametric amplifiers (JPAs) fabricated with our Nb/Al-AlOx/Nb junction process. The fabrication relies on UV photolithography and semi-automated 150-mm wafer processing steps, while minimizing the amount of deposited lossy dielectric materials [1]. The first JPA category is a flux-driven reflection amplifier for sub-GHz frequencies. It has found applications in the rf reflectometry of quantum dots, as well as in the rf readout of microwave nanobolometers [2] and charge detectors. Secondly, we report on the development of a 4-8 GHz traveling wave parametric amplifier tailored for the readout of superconducting quantum bits.
Original language | English |
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Publication status | Published - 6 Mar 2020 |
MoE publication type | Not Eligible |
Event | APS March Meeting 2020: Online - Canceled, Denver, United States Duration: 2 Mar 2020 → 6 Mar 2020 http://meetings.aps.org/Meeting/MAR20/Content/3845 (Conference abstracts) https://meetings.aps.org/Meeting/MAR20/Content/3845 |
Conference
Conference | APS March Meeting 2020 |
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Country/Territory | United States |
City | Denver |
Period | 2/03/20 → 6/03/20 |
Internet address |