Josephson Parametric Amplifiers Fabricated in Wafer-scale with Side-wall Passivated Spacer Junction Technology

Visa Vesterinen; Slawomir Simbierowicz; Leif Grönberg; Janne Lehtinen; Leila (Robab) Najafi Jabdaraghi; Mika Prunnila; Joonas Govenius

Josephson Parametric Amplifiers Fabricated in Wafer-scale with Side-wall Passivated Spacer Junction Technology

Visa Vesterinen
, Slawomir Simbierowicz
, Leif Grönberg
, Janne Lehtinen
, Leila (Robab) Najafi Jabdaraghi
, Mika Prunnila
, Joonas Govenius

Research output: Contribution to conference › Conference Abstract › Scientific › peer-review

Abstract

We present our latest experimental results on Josephson parametric amplifiers (JPAs) fabricated with our Nb/Al-AlOx/Nb junction process. The fabrication relies on UV photolithography and semi-automated 150-mm wafer processing steps, while minimizing the amount of deposited lossy dielectric materials [1]. The first JPA category is a flux-driven reflection amplifier for sub-GHz frequencies. It has found applications in the rf reflectometry of quantum dots, as well as in the rf readout of microwave nanobolometers [2] and charge detectors. Secondly, we report on the development of a 4-8 GHz traveling wave parametric amplifier tailored for the readout of superconducting quantum bits.

Original language	English
Publication status	Published - 6 Mar 2020
MoE publication type	Not Eligible
Event	APS March Meeting 2020: Online - Canceled, Denver, United States Duration: 2 Mar 2020 → 6 Mar 2020 http://meetings.aps.org/Meeting/MAR20/Content/3845 (Conference abstracts) https://meetings.aps.org/Meeting/MAR20/Content/3845

Conference

Conference	APS March Meeting 2020
Country/Territory	United States
City	Denver
Period	2/03/20 → 6/03/20
Internet address	http://meetings.aps.org/Meeting/MAR20/Content/3845 (Conference abstracts) https://meetings.aps.org/Meeting/MAR20/Content/3845

Cite this

@conference{145850ac8ff640ae86c837cf4f9c6450,

title = "Josephson Parametric Amplifiers Fabricated in Wafer-scale with Side-wall Passivated Spacer Junction Technology",

abstract = "We present our latest experimental results on Josephson parametric amplifiers (JPAs) fabricated with our Nb/Al-AlOx/Nb junction process. The fabrication relies on UV photolithography and semi-automated 150-mm wafer processing steps, while minimizing the amount of deposited lossy dielectric materials [1]. The first JPA category is a flux-driven reflection amplifier for sub-GHz frequencies. It has found applications in the rf reflectometry of quantum dots, as well as in the rf readout of microwave nanobolometers [2] and charge detectors. Secondly, we report on the development of a 4-8 GHz traveling wave parametric amplifier tailored for the readout of superconducting quantum bits.",

author = "Visa Vesterinen and Slawomir Simbierowicz and Leif Gr{\"o}nberg and Janne Lehtinen and \{Najafi Jabdaraghi\}, \{Leila (Robab)\} and Mika Prunnila and Joonas Govenius",

year = "2020",

month = mar,

day = "6",

language = "English",

note = "APS March Meeting 2020 : Online ; Conference date: 02-03-2020 Through 06-03-2020",

url = "http://meetings.aps.org/Meeting/MAR20/Content/3845, https://meetings.aps.org/Meeting/MAR20/Content/3845",

}

TY - CONF

T1 - Josephson Parametric Amplifiers Fabricated in Wafer-scale with Side-wall Passivated Spacer Junction Technology

AU - Vesterinen, Visa

AU - Simbierowicz, Slawomir

AU - Grönberg, Leif

AU - Lehtinen, Janne

AU - Najafi Jabdaraghi, Leila (Robab)

AU - Prunnila, Mika

AU - Govenius, Joonas

PY - 2020/3/6

Y1 - 2020/3/6

N2 - We present our latest experimental results on Josephson parametric amplifiers (JPAs) fabricated with our Nb/Al-AlOx/Nb junction process. The fabrication relies on UV photolithography and semi-automated 150-mm wafer processing steps, while minimizing the amount of deposited lossy dielectric materials [1]. The first JPA category is a flux-driven reflection amplifier for sub-GHz frequencies. It has found applications in the rf reflectometry of quantum dots, as well as in the rf readout of microwave nanobolometers [2] and charge detectors. Secondly, we report on the development of a 4-8 GHz traveling wave parametric amplifier tailored for the readout of superconducting quantum bits.

AB - We present our latest experimental results on Josephson parametric amplifiers (JPAs) fabricated with our Nb/Al-AlOx/Nb junction process. The fabrication relies on UV photolithography and semi-automated 150-mm wafer processing steps, while minimizing the amount of deposited lossy dielectric materials [1]. The first JPA category is a flux-driven reflection amplifier for sub-GHz frequencies. It has found applications in the rf reflectometry of quantum dots, as well as in the rf readout of microwave nanobolometers [2] and charge detectors. Secondly, we report on the development of a 4-8 GHz traveling wave parametric amplifier tailored for the readout of superconducting quantum bits.

M3 - Conference Abstract

T2 - APS March Meeting 2020

Y2 - 2 March 2020 through 6 March 2020

ER -

Josephson Parametric Amplifiers Fabricated in Wafer-scale with Side-wall Passivated Spacer Junction Technology

Abstract

Conference

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