Laite ja menetelmä laitteen valmistamiseksi;Anordning och förfarande för framställning av anordningen

Riikka Puurunen; Feng Gao

Laite ja menetelmä laitteen valmistamiseksi;Anordning och förfarande för framställning av anordningen

Translated title of the contribution: Apparatus associated with analysis of thin film layer and manufacturing method thereof

Riikka Puurunen (Inventor), Feng Gao (Inventor)

Research output: Patent › Patent

Abstract

An apparatus associated with an analysis of a thin film layer comprises two layer structures (100, 102) with a cavity (104) therebetween, and an opening (110) through one of the layer structures (102) to the cavity (104), the cavity (104) being configured to receive, through the opening (110), material used to form a thin film layer (900) inside the cavity (104). At least one of the two layer structures (100, 102) comprises at least one positional indicator (108) for an analysis associated with the thin film layer (900).

Patent family as of 17.12.2021
CN109416247 A 20190301 CN201780025310 20170425
CN109416247 B 20210713 CN201780025310 20170425
EP3449210 A1 20190306 EP20170725289 20170425
FI128447 B 20200515 FI20160005361 20160426
FI20165361 A 20171027 FI20160005361 20160426
JP2019518939 T2 20190704 JP20180555770T 20170425
JP6936813 B2 20210922 JP20180555770T 20170425
KR20180135001 A 20181219 KR20187033138 20170425
US2019120620 AA 20190425 US20170096083 20170425
WO17187016 A1 20171102 WO2017FI50312 20170425

Link to currentpatent family on right

Translated title of the contribution	Apparatus associated with analysis of thin film layer and manufacturing method thereof
Original language	Undefined
Patent number	FI20165361
IPC	B81C 1/ 00 A N
Priority date	26/04/16
Publication status	Published - 27 Oct 2017
MoE publication type	H1 Granted patent

Cite this

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title = "Laite ja menetelm{\"a} laitteen valmistamiseksi;Anordning och f{\"o}rfarande f{\"o}r framst{\"a}llning av anordningen",

abstract = "An apparatus associated with an analysis of a thin film layer comprises two layer structures (100, 102) with a cavity (104) therebetween, and an opening (110) through one of the layer structures (102) to the cavity (104), the cavity (104) being configured to receive, through the opening (110), material used to form a thin film layer (900) inside the cavity (104). At least one of the two layer structures (100, 102) comprises at least one positional indicator (108) for an analysis associated with the thin film layer (900).Patent family as of 17.12.2021CN109416247 A 20190301 CN201780025310 20170425 CN109416247 B 20210713 CN201780025310 20170425 EP3449210 A1 20190306 EP20170725289 20170425 FI128447 B 20200515 FI20160005361 20160426 FI20165361 A 20171027 FI20160005361 20160426 JP2019518939 T2 20190704 JP20180555770T 20170425 JP6936813 B2 20210922 JP20180555770T 20170425 KR20180135001 A 20181219 KR20187033138 20170425 US2019120620 AA 20190425 US20170096083 20170425 WO17187016 A1 20171102 WO2017FI50312 20170425Link to currentpatent family on right ",

author = "Riikka Puurunen and Feng Gao",

year = "2017",

month = oct,

day = "27",

language = "Undefined",

type = "Patent",

note = "FI20165361; B81C 1/ 00 A N",

}

TY - PAT

T1 - Laite ja menetelmä laitteen valmistamiseksi;Anordning och förfarande för framställning av anordningen

AU - Puurunen, Riikka

AU - Gao, Feng

PY - 2017/10/27

Y1 - 2017/10/27

N2 - An apparatus associated with an analysis of a thin film layer comprises two layer structures (100, 102) with a cavity (104) therebetween, and an opening (110) through one of the layer structures (102) to the cavity (104), the cavity (104) being configured to receive, through the opening (110), material used to form a thin film layer (900) inside the cavity (104). At least one of the two layer structures (100, 102) comprises at least one positional indicator (108) for an analysis associated with the thin film layer (900).Patent family as of 17.12.2021CN109416247 A 20190301 CN201780025310 20170425 CN109416247 B 20210713 CN201780025310 20170425 EP3449210 A1 20190306 EP20170725289 20170425 FI128447 B 20200515 FI20160005361 20160426 FI20165361 A 20171027 FI20160005361 20160426 JP2019518939 T2 20190704 JP20180555770T 20170425 JP6936813 B2 20210922 JP20180555770T 20170425 KR20180135001 A 20181219 KR20187033138 20170425 US2019120620 AA 20190425 US20170096083 20170425 WO17187016 A1 20171102 WO2017FI50312 20170425Link to currentpatent family on right

AB - An apparatus associated with an analysis of a thin film layer comprises two layer structures (100, 102) with a cavity (104) therebetween, and an opening (110) through one of the layer structures (102) to the cavity (104), the cavity (104) being configured to receive, through the opening (110), material used to form a thin film layer (900) inside the cavity (104). At least one of the two layer structures (100, 102) comprises at least one positional indicator (108) for an analysis associated with the thin film layer (900).Patent family as of 17.12.2021CN109416247 A 20190301 CN201780025310 20170425 CN109416247 B 20210713 CN201780025310 20170425 EP3449210 A1 20190306 EP20170725289 20170425 FI128447 B 20200515 FI20160005361 20160426 FI20165361 A 20171027 FI20160005361 20160426 JP2019518939 T2 20190704 JP20180555770T 20170425 JP6936813 B2 20210922 JP20180555770T 20170425 KR20180135001 A 20181219 KR20187033138 20170425 US2019120620 AA 20190425 US20170096083 20170425 WO17187016 A1 20171102 WO2017FI50312 20170425Link to currentpatent family on right

UR - https://worldwide.espacenet.com/patent/search/family/058765860/publication/FI128447B?q=FI128447

M3 - Patent

M1 - FI20165361

ER -

Laite ja menetelmä laitteen valmistamiseksi;Anordning och förfarande för framställning av anordningen

Abstract

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