Lithographic patterning of benzoylacetone modified SnO2 and SnO2:Sb thin films

Terho Kololuoma (Corresponding Author), Ari H. O. Kärkkäinen, Ari Tolonen, Juha T. Rantala

Research output: Contribution to journalArticleScientificpeer-review

12 Citations (Scopus)

Abstract

The synthesis of directly UV-photopatternable pure and antimony-doped organo-tin materials is presented. UV-photopatternability has been achieved by using the synthesized benzoylacetone modified tin and antimony 2-isopropoxyethoxides. Photopatterned pure and antimony-doped organo-tin films are crystallized by thermal annealing in order to obtain conductive SnO2 and Sb:SnO2 thin films. The molar ratio between benzoylacetone and metal alkoxides has to be 2 in order to obtain crack-free, good-quality structures. The effects of UV-irradiation, increasing antimony doping level and benzoylacetone concentration on the electrical properties of the single-layered films are analyzed. The highest obtained conductivity was 20 S/cm. Benzoylacetone concentration and UV-irradiation has only a negligible effect on the film electrical conductivities.
Original languageEnglish
Pages (from-to)184-189
Number of pages6
JournalThin Solid Films
Volume440
Issue number1-2
DOIs
Publication statusPublished - 2003
MoE publication typeA1 Journal article-refereed

Fingerprint

Antimony
antimony
Tin
Thin films
tin
thin films
Irradiation
irradiation
alkoxides
Electric properties
cracks
Metals
electrical properties
Doping (additives)
Annealing
Cracks
conductivity
electrical resistivity
annealing
benzoylacetone

Keywords

  • antimony-doped tin dioxide
  • direct UV-photopatterning
  • photopatterning
  • electrical properties
  • tin
  • thin films

Cite this

Kololuoma, Terho ; Kärkkäinen, Ari H. O. ; Tolonen, Ari ; Rantala, Juha T. / Lithographic patterning of benzoylacetone modified SnO2 and SnO2:Sb thin films. In: Thin Solid Films. 2003 ; Vol. 440, No. 1-2. pp. 184-189.
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abstract = "The synthesis of directly UV-photopatternable pure and antimony-doped organo-tin materials is presented. UV-photopatternability has been achieved by using the synthesized benzoylacetone modified tin and antimony 2-isopropoxyethoxides. Photopatterned pure and antimony-doped organo-tin films are crystallized by thermal annealing in order to obtain conductive SnO2 and Sb:SnO2 thin films. The molar ratio between benzoylacetone and metal alkoxides has to be 2 in order to obtain crack-free, good-quality structures. The effects of UV-irradiation, increasing antimony doping level and benzoylacetone concentration on the electrical properties of the single-layered films are analyzed. The highest obtained conductivity was 20 S/cm. Benzoylacetone concentration and UV-irradiation has only a negligible effect on the film electrical conductivities.",
keywords = "antimony-doped tin dioxide, direct UV-photopatterning, photopatterning, electrical properties, tin, thin films",
author = "Terho Kololuoma and K{\"a}rkk{\"a}inen, {Ari H. O.} and Ari Tolonen and Rantala, {Juha T.}",
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Lithographic patterning of benzoylacetone modified SnO2 and SnO2:Sb thin films. / Kololuoma, Terho (Corresponding Author); Kärkkäinen, Ari H. O.; Tolonen, Ari; Rantala, Juha T.

In: Thin Solid Films, Vol. 440, No. 1-2, 2003, p. 184-189.

Research output: Contribution to journalArticleScientificpeer-review

TY - JOUR

T1 - Lithographic patterning of benzoylacetone modified SnO2 and SnO2:Sb thin films

AU - Kololuoma, Terho

AU - Kärkkäinen, Ari H. O.

AU - Tolonen, Ari

AU - Rantala, Juha T.

PY - 2003

Y1 - 2003

N2 - The synthesis of directly UV-photopatternable pure and antimony-doped organo-tin materials is presented. UV-photopatternability has been achieved by using the synthesized benzoylacetone modified tin and antimony 2-isopropoxyethoxides. Photopatterned pure and antimony-doped organo-tin films are crystallized by thermal annealing in order to obtain conductive SnO2 and Sb:SnO2 thin films. The molar ratio between benzoylacetone and metal alkoxides has to be 2 in order to obtain crack-free, good-quality structures. The effects of UV-irradiation, increasing antimony doping level and benzoylacetone concentration on the electrical properties of the single-layered films are analyzed. The highest obtained conductivity was 20 S/cm. Benzoylacetone concentration and UV-irradiation has only a negligible effect on the film electrical conductivities.

AB - The synthesis of directly UV-photopatternable pure and antimony-doped organo-tin materials is presented. UV-photopatternability has been achieved by using the synthesized benzoylacetone modified tin and antimony 2-isopropoxyethoxides. Photopatterned pure and antimony-doped organo-tin films are crystallized by thermal annealing in order to obtain conductive SnO2 and Sb:SnO2 thin films. The molar ratio between benzoylacetone and metal alkoxides has to be 2 in order to obtain crack-free, good-quality structures. The effects of UV-irradiation, increasing antimony doping level and benzoylacetone concentration on the electrical properties of the single-layered films are analyzed. The highest obtained conductivity was 20 S/cm. Benzoylacetone concentration and UV-irradiation has only a negligible effect on the film electrical conductivities.

KW - antimony-doped tin dioxide

KW - direct UV-photopatterning

KW - photopatterning

KW - electrical properties

KW - tin

KW - thin films

U2 - 10.1016/S0040-6090(03)00826-5

DO - 10.1016/S0040-6090(03)00826-5

M3 - Article

VL - 440

SP - 184

EP - 189

JO - Thin Solid Films

JF - Thin Solid Films

SN - 0040-6090

IS - 1-2

ER -