Lithographic patterning of benzoylacetone modified SnO2 and SnO2:Sb thin films

Terho Kololuoma (Corresponding Author), Ari H. O. Kärkkäinen, Ari Tolonen, Juha T. Rantala

Research output: Contribution to journalArticleScientificpeer-review

12 Citations (Scopus)

Abstract

The synthesis of directly UV-photopatternable pure and antimony-doped organo-tin materials is presented. UV-photopatternability has been achieved by using the synthesized benzoylacetone modified tin and antimony 2-isopropoxyethoxides. Photopatterned pure and antimony-doped organo-tin films are crystallized by thermal annealing in order to obtain conductive SnO2 and Sb:SnO2 thin films. The molar ratio between benzoylacetone and metal alkoxides has to be 2 in order to obtain crack-free, good-quality structures. The effects of UV-irradiation, increasing antimony doping level and benzoylacetone concentration on the electrical properties of the single-layered films are analyzed. The highest obtained conductivity was 20 S/cm. Benzoylacetone concentration and UV-irradiation has only a negligible effect on the film electrical conductivities.
Original languageEnglish
Pages (from-to)184-189
Number of pages6
JournalThin Solid Films
Volume440
Issue number1-2
DOIs
Publication statusPublished - 2003
MoE publication typeA1 Journal article-refereed

Keywords

  • antimony-doped tin dioxide
  • direct UV-photopatterning
  • photopatterning
  • electrical properties
  • tin
  • thin films

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