The synthesis of directly UV-photopatternable pure and antimony-doped organo-tin materials is presented. UV-photopatternability has been achieved by using the synthesized benzoylacetone modified tin and antimony 2-isopropoxyethoxides. Photopatterned pure and antimony-doped organo-tin films are crystallized by thermal annealing in order to obtain conductive SnO2 and Sb:SnO2 thin films. The molar ratio between benzoylacetone and metal alkoxides has to be 2 in order to obtain crack-free, good-quality structures. The effects of UV-irradiation, increasing antimony doping level and benzoylacetone concentration on the electrical properties of the single-layered films are analyzed. The highest obtained conductivity was 20 S/cm. Benzoylacetone concentration and UV-irradiation has only a negligible effect on the film electrical conductivities.
- antimony-doped tin dioxide
- direct UV-photopatterning
- electrical properties
- thin films
Kololuoma, T., Kärkkäinen, A. H. O., Tolonen, A., & Rantala, J. T. (2003). Lithographic patterning of benzoylacetone modified SnO2 and SnO2:Sb thin films. Thin Solid Films, 440(1-2), 184-189. https://doi.org/10.1016/S0040-6090(03)00826-5