Lithographic patterning of benzoylacetone modified SnO2 and SnO2:Sb thin films

Terho Kololuoma (Corresponding Author), Ari H. O. Kärkkäinen, Ari Tolonen, Juha T. Rantala

    Research output: Contribution to journalArticleScientificpeer-review

    12 Citations (Scopus)

    Abstract

    The synthesis of directly UV-photopatternable pure and antimony-doped organo-tin materials is presented. UV-photopatternability has been achieved by using the synthesized benzoylacetone modified tin and antimony 2-isopropoxyethoxides. Photopatterned pure and antimony-doped organo-tin films are crystallized by thermal annealing in order to obtain conductive SnO2 and Sb:SnO2 thin films. The molar ratio between benzoylacetone and metal alkoxides has to be 2 in order to obtain crack-free, good-quality structures. The effects of UV-irradiation, increasing antimony doping level and benzoylacetone concentration on the electrical properties of the single-layered films are analyzed. The highest obtained conductivity was 20 S/cm. Benzoylacetone concentration and UV-irradiation has only a negligible effect on the film electrical conductivities.
    Original languageEnglish
    Pages (from-to)184-189
    Number of pages6
    JournalThin Solid Films
    Volume440
    Issue number1-2
    DOIs
    Publication statusPublished - 2003
    MoE publication typeA1 Journal article-refereed

    Keywords

    • antimony-doped tin dioxide
    • direct UV-photopatterning
    • photopatterning
    • electrical properties
    • tin
    • thin films

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