Lithographic patterning of benzoylacetone modified SnO2 and SnO2:Sb thin films

Terho Kololuoma; Ari H.O. Kärkkäinen; Ari Tolonen; Juha T. Rantala

doi:10.1016/S0040-6090(03)00826-5

Lithographic patterning of benzoylacetone modified SnO₂ and SnO₂:Sb thin films

Terho Kololuoma^*
, Ari H.O. Kärkkäinen
, Ari Tolonen
, Juha T. Rantala

^*Corresponding author for this work

BA6303 Printed electronics processing

University of Oulu

Research output: Contribution to journal › Article › Scientific › peer-review

12 Citations (Scopus)

Abstract

The synthesis of directly UV-photopatternable pure and antimony-doped organo-tin materials is presented. UV-photopatternability has been achieved by using the synthesized benzoylacetone modified tin and antimony 2-isopropoxyethoxides. Photopatterned pure and antimony-doped organo-tin films are crystallized by thermal annealing in order to obtain conductive SnO₂ and Sb:SnO₂ thin films. The molar ratio between benzoylacetone and metal alkoxides has to be 2 in order to obtain crack-free, good-quality structures. The effects of UV-irradiation, increasing antimony doping level and benzoylacetone concentration on the electrical properties of the single-layered films are analyzed. The highest obtained conductivity was 20 S/cm. Benzoylacetone concentration and UV-irradiation has only a negligible effect on the film electrical conductivities.

Original language	English
Pages (from-to)	184-189
Journal	Thin Solid Films
Volume	440
Issue number	1-2
DOIs	https://doi.org/10.1016/S0040-6090(03)00826-5
Publication status	Published - 2003
MoE publication type	A1 Journal article-refereed

Keywords

antimony-doped tin dioxide
direct UV-photopatterning
photopatterning
electrical properties
tin
thin films

Access to Document

10.1016/S0040-6090(03)00826-5

Cite this

@article{3dc0024e2bf9451bae455c36dd97c017,

title = "Lithographic patterning of benzoylacetone modified SnO2 and SnO2:Sb thin films",

abstract = "The synthesis of directly UV-photopatternable pure and antimony-doped organo-tin materials is presented. UV-photopatternability has been achieved by using the synthesized benzoylacetone modified tin and antimony 2-isopropoxyethoxides. Photopatterned pure and antimony-doped organo-tin films are crystallized by thermal annealing in order to obtain conductive SnO2 and Sb:SnO2 thin films. The molar ratio between benzoylacetone and metal alkoxides has to be 2 in order to obtain crack-free, good-quality structures. The effects of UV-irradiation, increasing antimony doping level and benzoylacetone concentration on the electrical properties of the single-layered films are analyzed. The highest obtained conductivity was 20 S/cm. Benzoylacetone concentration and UV-irradiation has only a negligible effect on the film electrical conductivities.",

keywords = "antimony-doped tin dioxide, direct UV-photopatterning, photopatterning, electrical properties, tin, thin films",

author = "Terho Kololuoma and K{\"a}rkk{\"a}inen, \{Ari H.O.\} and Ari Tolonen and Rantala, \{Juha T.\}",

year = "2003",

doi = "10.1016/S0040-6090(03)00826-5",

language = "English",

volume = "440",

pages = "184--189",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Elsevier",

number = "1-2",

}

TY - JOUR

T1 - Lithographic patterning of benzoylacetone modified SnO2 and SnO2:Sb thin films

AU - Kololuoma, Terho

AU - Kärkkäinen, Ari H.O.

AU - Tolonen, Ari

AU - Rantala, Juha T.

PY - 2003

Y1 - 2003

N2 - The synthesis of directly UV-photopatternable pure and antimony-doped organo-tin materials is presented. UV-photopatternability has been achieved by using the synthesized benzoylacetone modified tin and antimony 2-isopropoxyethoxides. Photopatterned pure and antimony-doped organo-tin films are crystallized by thermal annealing in order to obtain conductive SnO2 and Sb:SnO2 thin films. The molar ratio between benzoylacetone and metal alkoxides has to be 2 in order to obtain crack-free, good-quality structures. The effects of UV-irradiation, increasing antimony doping level and benzoylacetone concentration on the electrical properties of the single-layered films are analyzed. The highest obtained conductivity was 20 S/cm. Benzoylacetone concentration and UV-irradiation has only a negligible effect on the film electrical conductivities.

AB - The synthesis of directly UV-photopatternable pure and antimony-doped organo-tin materials is presented. UV-photopatternability has been achieved by using the synthesized benzoylacetone modified tin and antimony 2-isopropoxyethoxides. Photopatterned pure and antimony-doped organo-tin films are crystallized by thermal annealing in order to obtain conductive SnO2 and Sb:SnO2 thin films. The molar ratio between benzoylacetone and metal alkoxides has to be 2 in order to obtain crack-free, good-quality structures. The effects of UV-irradiation, increasing antimony doping level and benzoylacetone concentration on the electrical properties of the single-layered films are analyzed. The highest obtained conductivity was 20 S/cm. Benzoylacetone concentration and UV-irradiation has only a negligible effect on the film electrical conductivities.

KW - antimony-doped tin dioxide

KW - direct UV-photopatterning

KW - photopatterning

KW - electrical properties

KW - tin

KW - thin films

U2 - 10.1016/S0040-6090(03)00826-5

DO - 10.1016/S0040-6090(03)00826-5

M3 - Article

SN - 0040-6090

VL - 440

SP - 184

EP - 189

JO - Thin Solid Films

JF - Thin Solid Films

IS - 1-2