Loading effects in deep silicon etching

Jani Karttunen, Jyrki Kiihamäki, Sami Franssila

Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

60 Citations (Scopus)
Original languageEnglish
Title of host publicationSymposium on Micromachining and Microfabrication VI, MF00
Subtitle of host publicationSanta Clara, CA, US, 18-20 September 2000
PublisherInternational Society for Optics and Photonics SPIE
Pages90-97
ISBN (Print)0-8194-3830-8
Publication statusPublished - 2000
MoE publication typeA4 Article in a conference publication

Publication series

SeriesProceedings of SPIE
Volume4174
ISSN0277-786X

Cite this

Karttunen, J., Kiihamäki, J., & Franssila, S. (2000). Loading effects in deep silicon etching. In Symposium on Micromachining and Microfabrication VI, MF00: Santa Clara, CA, US, 18-20 September 2000 (pp. 90-97). International Society for Optics and Photonics SPIE. Proceedings of SPIE, Vol.. 4174