Loading effects in deep silicon etching

Jani Karttunen; Jyrki Kiihamäki; Sami Franssila

Loading effects in deep silicon etching

Jani Karttunen
, Jyrki Kiihamäki
, Sami Franssila

Research output: Chapter in Book/Report/Conference proceeding › Conference article in proceedings › Scientific › peer-review

88 Citations (Scopus)

Original language	English
Title of host publication	Symposium on Micromachining and Microfabrication VI, MF00
Subtitle of host publication	Santa Clara, CA, US, 18-20 September 2000
Publisher	International Society for Optics and Photonics SPIE
Pages	90-97
ISBN (Print)	0-8194-3830-8
Publication status	Published - 2000
MoE publication type	A4 Article in a conference publication

Publication series

Series	Proceedings of SPIE
Volume	4174
ISSN	0277-786X

Cite this

@inproceedings{674f58b2ff594ded99ea79fc3f390285,

title = "Loading effects in deep silicon etching",

author = "Jani Karttunen and Jyrki Kiiham{\"a}ki and Sami Franssila",

year = "2000",

language = "English",

isbn = "0-8194-3830-8",

series = "Proceedings of SPIE",

publisher = "International Society for Optics and Photonics SPIE",

pages = "90--97",

booktitle = "Symposium on Micromachining and Microfabrication VI, MF00",

address = "United States",

}

Loading effects in deep silicon etching. / Karttunen, Jani; Kiihamäki, Jyrki; Franssila, Sami.
Symposium on Micromachining and Microfabrication VI, MF00: Santa Clara, CA, US, 18-20 September 2000. International Society for Optics and Photonics SPIE, 2000. p. 90-97 (Proceedings of SPIE, Vol. 4174).

Research output: Chapter in Book/Report/Conference proceeding › Conference article in proceedings › Scientific › peer-review