Local Scale Exposure and Fate of Engineered Nanomaterials

Mikko Poikkimäki, Joris T. K. Quik, Arto Säämänen, Miikka Dal Maso

Research output: Contribution to journalArticleScientificpeer-review

1 Citation (Scopus)


Nanotechnology is a growing megatrend in industrial production and innovations. Many applications utilize engineered nanomaterials (ENMs) that are potentially released into the atmospheric environment, e.g., via direct stack emissions from production facilities. Limited information exists on adverse effects such ENM releases may have on human health and the environment. Previous exposure modeling approaches have focused on large regional compartments, into which the released ENMs are evenly mixed. However, due to the localization of the ENM release and removal processes, potentially higher airborne concentrations and deposition fluxes are obtained around the production facilities. Therefore, we compare the ENM concentrations from a dispersion model to those from the uniformly mixed compartment approach. For realistic release scenarios, we based the modeling on the case study measurement data from two TiO 2 nanomaterial handling facilities. In addition, we calculated the distances, at which 50% of the ENMs are deposited, serving as a physically relevant metric to separate the local scale from the regional scale, thus indicating the size of the high exposure and risk region near the facility. As a result, we suggest a local scale compartment to be implemented in the multicompartment nanomaterial exposure models. We also present a computational tool for local exposure assessment that could be included to regulatory guidance and existing risk governance networks.

Original languageEnglish
Article number354
Number of pages27
Issue number7
Publication statusPublished - 29 Jun 2022
MoE publication typeA1 Journal article-refereed


  • airborne pollutant
  • atmospheric release
  • dispersion modeling
  • engineered nanoparticles
  • environmental exposure assessment
  • manufactured nanomaterial
  • near source exposure


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