Low-Loss Converters between Optical Silicon Waveguides of Different Sizes and Types

Research output: Contribution to journalArticleScientificpeer-review

43 Citations (Scopus)

Abstract

Two types of low-loss converters between different optical waveguides on silicon-on-insulator are demonstrated. A vertical taper between 9.4- and 3.8-μm-thick single-moded rib waveguides gives an excess loss of 0.7/spl plusmn/0.2 dB with negligible polarization dependency. The second structure converts a 9.7-μm-thick rib waveguide into an equally thick and highly multimoded strip waveguide with a negligible loss (<0.07 dB) for the fundamental mode. The fabrication of both structures is based on a simple two-step etch process with a relaxed mask alignment tolerance and no need for epitaxy.
Original languageEnglish
Pages (from-to)709-711
JournalIEEE Photonics Technology Letters
Volume18
Issue number5
DOIs
Publication statusPublished - 2006
MoE publication typeA1 Journal article-refereed

Fingerprint

Silicon
converters
Waveguides
waveguides
silicon
Optical waveguides
tapering
Epitaxial growth
optical waveguides
epitaxy
Masks
strip
masks
alignment
insulators
Polarization
Fabrication
fabrication
polarization

Keywords

  • adiabatic conversion
  • integrated optics
  • multistep
  • patterning
  • silicon microphotonics
  • silicon waveguide
  • silicon-oninsulator
  • (SOI) technology
  • vertical taper

Cite this

@article{18b3033324bd4301863731e759b9201c,
title = "Low-Loss Converters between Optical Silicon Waveguides of Different Sizes and Types",
abstract = "Two types of low-loss converters between different optical waveguides on silicon-on-insulator are demonstrated. A vertical taper between 9.4- and 3.8-μm-thick single-moded rib waveguides gives an excess loss of 0.7/spl plusmn/0.2 dB with negligible polarization dependency. The second structure converts a 9.7-μm-thick rib waveguide into an equally thick and highly multimoded strip waveguide with a negligible loss (<0.07 dB) for the fundamental mode. The fabrication of both structures is based on a simple two-step etch process with a relaxed mask alignment tolerance and no need for epitaxy.",
keywords = "adiabatic conversion, integrated optics, multistep, patterning, silicon microphotonics, silicon waveguide, silicon-oninsulator, (SOI) technology, vertical taper",
author = "Timo Aalto and Kimmo Solehmainen and Mikko Harjanne and Markku Kapulainen and P{\"a}ivi Heimala",
year = "2006",
doi = "10.1109/LPT.2006.871150",
language = "English",
volume = "18",
pages = "709--711",
journal = "IEEE Photonics Technology Letters",
issn = "1041-1135",
publisher = "IEEE Institute of Electrical and Electronic Engineers",
number = "5",

}

Low-Loss Converters between Optical Silicon Waveguides of Different Sizes and Types. / Aalto, Timo; Solehmainen, Kimmo; Harjanne, Mikko; Kapulainen, Markku; Heimala, Päivi.

In: IEEE Photonics Technology Letters, Vol. 18, No. 5, 2006, p. 709-711.

Research output: Contribution to journalArticleScientificpeer-review

TY - JOUR

T1 - Low-Loss Converters between Optical Silicon Waveguides of Different Sizes and Types

AU - Aalto, Timo

AU - Solehmainen, Kimmo

AU - Harjanne, Mikko

AU - Kapulainen, Markku

AU - Heimala, Päivi

PY - 2006

Y1 - 2006

N2 - Two types of low-loss converters between different optical waveguides on silicon-on-insulator are demonstrated. A vertical taper between 9.4- and 3.8-μm-thick single-moded rib waveguides gives an excess loss of 0.7/spl plusmn/0.2 dB with negligible polarization dependency. The second structure converts a 9.7-μm-thick rib waveguide into an equally thick and highly multimoded strip waveguide with a negligible loss (<0.07 dB) for the fundamental mode. The fabrication of both structures is based on a simple two-step etch process with a relaxed mask alignment tolerance and no need for epitaxy.

AB - Two types of low-loss converters between different optical waveguides on silicon-on-insulator are demonstrated. A vertical taper between 9.4- and 3.8-μm-thick single-moded rib waveguides gives an excess loss of 0.7/spl plusmn/0.2 dB with negligible polarization dependency. The second structure converts a 9.7-μm-thick rib waveguide into an equally thick and highly multimoded strip waveguide with a negligible loss (<0.07 dB) for the fundamental mode. The fabrication of both structures is based on a simple two-step etch process with a relaxed mask alignment tolerance and no need for epitaxy.

KW - adiabatic conversion

KW - integrated optics

KW - multistep

KW - patterning

KW - silicon microphotonics

KW - silicon waveguide

KW - silicon-oninsulator

KW - (SOI) technology

KW - vertical taper

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DO - 10.1109/LPT.2006.871150

M3 - Article

VL - 18

SP - 709

EP - 711

JO - IEEE Photonics Technology Letters

JF - IEEE Photonics Technology Letters

SN - 1041-1135

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ER -