TY - CHAP
T1 - Low loss InP U-bend gain waveguides for hybrid integration with silicon photonics
AU - Tuorila, Heidi
AU - Viheriälä, Jukka
AU - Lee, Jae Wung
AU - Harjanne, Mikko
AU - Cherchi, Matteo
AU - Aalto, Timo
AU - Guina, Mircea
N1 - Publisher Copyright:
© 2023 IEEE.
PY - 2023
Y1 - 2023
N2 - Silicon photonics (SiPh) and photonic integrated circuits (PIC) provide an increasingly important technology platform enabling the on-chip combination of photonics and electronics [1] while offering solutions for a wide range of applications, such as high-capacity networks and sensing [2], for example. As the SiPh waveguides cannot provide gain, different integration schemes of III-V compound semiconductors gain chips are necessary to enable on-chip light generation. Hybrid integration is a solution where a diced III-V gain chip is bonded on a PIC platform [3]. This approach provides the freedom to combine a multitude of different types of III-V chips on a PIC and is also compatible with current CMOS industry as the fabrication of the III-V chip is separated from the PIC production. However, one of the challenges of hybrid integration, is the alignment of the gain chip on the PIC. For low-loss operation, sub-micron alignment precision should be reached. This, however, is in part limited by the accuracy of the current dicing systems resulting in poor dimension control and a requirement for larger alignment tolerances.
AB - Silicon photonics (SiPh) and photonic integrated circuits (PIC) provide an increasingly important technology platform enabling the on-chip combination of photonics and electronics [1] while offering solutions for a wide range of applications, such as high-capacity networks and sensing [2], for example. As the SiPh waveguides cannot provide gain, different integration schemes of III-V compound semiconductors gain chips are necessary to enable on-chip light generation. Hybrid integration is a solution where a diced III-V gain chip is bonded on a PIC platform [3]. This approach provides the freedom to combine a multitude of different types of III-V chips on a PIC and is also compatible with current CMOS industry as the fabrication of the III-V chip is separated from the PIC production. However, one of the challenges of hybrid integration, is the alignment of the gain chip on the PIC. For low-loss operation, sub-micron alignment precision should be reached. This, however, is in part limited by the accuracy of the current dicing systems resulting in poor dimension control and a requirement for larger alignment tolerances.
UR - https://www.scopus.com/pages/publications/85175696095
U2 - 10.1109/CLEO/EUROPE-EQEC57999.2023.10231895
DO - 10.1109/CLEO/EUROPE-EQEC57999.2023.10231895
M3 - Conference abstract in proceedings
AN - SCOPUS:85175696095
SN - 979-8-3503-4600-8
T3 - Conference on Lasers and Electro-Optics Europe (CLEO EUROPE)
BT - 2023 Conference on Lasers and Electro-Optics Europe and European Quantum Electronics Conference, CLEO/Europe-EQEC 2023
PB - IEEE Institute of Electrical and Electronic Engineers
T2 - 2023 Conference on Lasers and Electro-Optics Europe and European Quantum Electronics Conference, CLEO/Europe-EQEC 2023
Y2 - 26 June 2023 through 30 June 2023
ER -