Low-loss multiple-slot waveguides fabricated by optical lithography and atomic layer deposition

L. Karvonen, A. Säynätjoki, Y. Chen, X. Tu, T.-Y. Liow, Jussi Hiltunen, Marianne Hiltunen, G.-Q. Lo, S. Honkanen

Research output: Contribution to journalArticleScientificpeer-review

13 Citations (Scopus)

Abstract

We demonstrate silicon-based multiple-slot waveguides filled with dual atomic layer deposited oxide layers. Slot modes for both polarizations, transverse electric (TE) and transverse magnetic (TM), are supported in the waveguide. Propagation loss in the order of 8 dB/cm is achieved for the TE-polarization and 4 dB/cm for the TM-polarization in the waveguides with dual (Al 2 O 3 -TiO 2 ) thin film layers. The devices are fabricated using low-temperature complementary metal-oxide-semiconductor compatible processes. To our knowledge, this is the first demonstration of dual-filled slot waveguides.
Original languageEnglish
Pages (from-to)2074-2076
Number of pages2
JournalIEEE Photonics Technology Letters
Volume24
Issue number22
DOIs
Publication statusPublished - 2012
MoE publication typeA1 Journal article-refereed

Keywords

  • Atomic layer deposition (ALD)
  • integrated optics
  • slot waveguide

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