Low-loss multiple-slot waveguides fabricated by optical lithography and atomic layer deposition

Lasse Karvonen; Antti Säynätjoki; Ya Chen; Xiaoguang Tu; Tsung-Yang Liow; Jussi Hiltunen; Marianne Hiltunen; Guo-Qiang Lo; Seppo Honkanen

doi:10.1109/LPT.2012.2219856

Low-loss multiple-slot waveguides fabricated by optical lithography and atomic layer deposition

Lasse Karvonen, Antti Säynätjoki, Ya Chen, Xiaoguang Tu, Tsung-Yang Liow, Jussi Hiltunen, Marianne Hiltunen, Guo-Qiang Lo, Seppo Honkanen

Research output: Contribution to journal › Article › Scientific › peer-review

14 Citations (Scopus)

Abstract

We demonstrate silicon-based multiple-slot waveguides filled with dual atomic layer deposited oxide layers. Slot modes for both polarizations, transverse electric (TE) and transverse magnetic (TM), are supported in the waveguide. Propagation loss in the order of 8 dB/cm is achieved for the TE-polarization and 4 dB/cm for the TM-polarization in the waveguides with dual (Al 2 O 3 -TiO 2 ) thin film layers. The devices are fabricated using low-temperature complementary metal-oxide-semiconductor compatible processes. To our knowledge, this is the first demonstration of dual-filled slot waveguides.

Original language	English
Pages (from-to)	2074-2076
Journal	IEEE Photonics Technology Letters
Volume	24
Issue number	22
DOIs	https://doi.org/10.1109/LPT.2012.2219856
Publication status	Published - 2012
MoE publication type	A1 Journal article-refereed

Keywords

Atomic layer deposition (ALD)
integrated optics
slot waveguide

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10.1109/LPT.2012.2219856

Cite this

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title = "Low-loss multiple-slot waveguides fabricated by optical lithography and atomic layer deposition",

abstract = "We demonstrate silicon-based multiple-slot waveguides filled with dual atomic layer deposited oxide layers. Slot modes for both polarizations, transverse electric (TE) and transverse magnetic (TM), are supported in the waveguide. Propagation loss in the order of 8 dB/cm is achieved for the TE-polarization and 4 dB/cm for the TM-polarization in the waveguides with dual (Al 2 O 3 -TiO 2 ) thin film layers. The devices are fabricated using low-temperature complementary metal-oxide-semiconductor compatible processes. To our knowledge, this is the first demonstration of dual-filled slot waveguides.",

keywords = "Atomic layer deposition (ALD), integrated optics, slot waveguide",

author = "Lasse Karvonen and Antti S{\"a}yn{\"a}tjoki and Ya Chen and Xiaoguang Tu and Tsung-Yang Liow and Jussi Hiltunen and Marianne Hiltunen and Guo-Qiang Lo and Seppo Honkanen",

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doi = "10.1109/LPT.2012.2219856",

language = "English",

volume = "24",

pages = "2074--2076",

journal = "IEEE Photonics Technology Letters",

issn = "1041-1135",

publisher = "IEEE Institute of Electrical and Electronic Engineers",

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TY - JOUR

T1 - Low-loss multiple-slot waveguides fabricated by optical lithography and atomic layer deposition

AU - Karvonen, Lasse

AU - Säynätjoki, Antti

AU - Chen, Ya

AU - Tu, Xiaoguang

AU - Liow, Tsung-Yang

AU - Hiltunen, Jussi

AU - Hiltunen, Marianne

AU - Lo, Guo-Qiang

AU - Honkanen, Seppo

PY - 2012

Y1 - 2012

N2 - We demonstrate silicon-based multiple-slot waveguides filled with dual atomic layer deposited oxide layers. Slot modes for both polarizations, transverse electric (TE) and transverse magnetic (TM), are supported in the waveguide. Propagation loss in the order of 8 dB/cm is achieved for the TE-polarization and 4 dB/cm for the TM-polarization in the waveguides with dual (Al 2 O 3 -TiO 2 ) thin film layers. The devices are fabricated using low-temperature complementary metal-oxide-semiconductor compatible processes. To our knowledge, this is the first demonstration of dual-filled slot waveguides.

AB - We demonstrate silicon-based multiple-slot waveguides filled with dual atomic layer deposited oxide layers. Slot modes for both polarizations, transverse electric (TE) and transverse magnetic (TM), are supported in the waveguide. Propagation loss in the order of 8 dB/cm is achieved for the TE-polarization and 4 dB/cm for the TM-polarization in the waveguides with dual (Al 2 O 3 -TiO 2 ) thin film layers. The devices are fabricated using low-temperature complementary metal-oxide-semiconductor compatible processes. To our knowledge, this is the first demonstration of dual-filled slot waveguides.

KW - Atomic layer deposition (ALD)

KW - integrated optics

KW - slot waveguide

U2 - 10.1109/LPT.2012.2219856

DO - 10.1109/LPT.2012.2219856

M3 - Article

SN - 1041-1135

VL - 24

SP - 2074

EP - 2076

JO - IEEE Photonics Technology Letters

JF - IEEE Photonics Technology Letters

IS - 22

ER -

Low-loss multiple-slot waveguides fabricated by optical lithography and atomic layer deposition

Abstract

Keywords

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