Low-loss multiple-slot waveguides fabricated by optical lithography and atomic layer deposition

L. Karvonen, A. Säynätjoki, Y. Chen, X. Tu, T.-Y. Liow, Jussi Hiltunen, Marianne Hiltunen, G.-Q. Lo, S. Honkanen

    Research output: Contribution to journalArticleScientificpeer-review

    13 Citations (Scopus)

    Abstract

    We demonstrate silicon-based multiple-slot waveguides filled with dual atomic layer deposited oxide layers. Slot modes for both polarizations, transverse electric (TE) and transverse magnetic (TM), are supported in the waveguide. Propagation loss in the order of 8 dB/cm is achieved for the TE-polarization and 4 dB/cm for the TM-polarization in the waveguides with dual (Al 2 O 3 -TiO 2 ) thin film layers. The devices are fabricated using low-temperature complementary metal-oxide-semiconductor compatible processes. To our knowledge, this is the first demonstration of dual-filled slot waveguides.
    Original languageEnglish
    Pages (from-to)2074-2076
    Number of pages2
    JournalIEEE Photonics Technology Letters
    Volume24
    Issue number22
    DOIs
    Publication statusPublished - 2012
    MoE publication typeA1 Journal article-refereed

    Keywords

    • Atomic layer deposition (ALD)
    • integrated optics
    • slot waveguide

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