Low-loss silicon-on-insulator waveguides

Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientific

188 Citations (Scopus)


The aim of photonic integrated circuits (PICs) is to realise a variety of different optical components on a single chip. Silicon-on-insulator technology is a promising candidate for realising PICs with advanced properties. In this work, a fabrication process based on dry silicon etching was developed to produce SOI optical waveguides. The base for the waveguide fabrication was a 10 cm diameter SOI wafer with a 10 µm thick device layer. The silicon etching was done with an inductively coupled plasma type reactive ion etcher. High propagation loss measurement accuracy was achieved by using a long waveguide, which diminishes the effect of the fiber-coupling losses. A 114 cm long waveguide was fitted on the 10 cm SOI wafer in a form of a spiral. As a result, propagation loss 0.13 ± 0.02 dB/cm was measured at 1550 nm for the fundamental mode in a rib-type SOI waveguide.
Original languageEnglish
Title of host publicationProceedings of Optics Days 2005
Place of PublicationJyväskylä
PublisherFinnish Optical Society
Publication statusPublished - 2005
MoE publication typeB3 Non-refereed article in conference proceedings
EventOptics Days - Optiikan päivät 2005 - Jyväskylä, Finland
Duration: 12 May 200513 May 2005


ConferenceOptics Days - Optiikan päivät 2005


  • integrated optics
  • optical waveguides
  • silicon-on-insulator


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