Low-loss silicon-on-insulator waveguides

Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientific

166 Citations (Scopus)

Abstract

The aim of photonic integrated circuits (PICs) is to realise a variety of different optical components on a single chip. Silicon-on-insulator technology is a promising candidate for realising PICs with advanced properties. In this work, a fabrication process based on dry silicon etching was developed to produce SOI optical waveguides. The base for the waveguide fabrication was a 10 cm diameter SOI wafer with a 10 µm thick device layer. The silicon etching was done with an inductively coupled plasma type reactive ion etcher. High propagation loss measurement accuracy was achieved by using a long waveguide, which diminishes the effect of the fiber-coupling losses. A 114 cm long waveguide was fitted on the 10 cm SOI wafer in a form of a spiral. As a result, propagation loss 0.13 ± 0.02 dB/cm was measured at 1550 nm for the fundamental mode in a rib-type SOI waveguide.
Original languageEnglish
Title of host publicationProceedings of Optics Days 2005
Place of PublicationJyväskylä
Publication statusPublished - 2005
MoE publication typeB3 Non-refereed article in conference proceedings
EventOptics Days - Optiikan päivät 2005 - Jyväskylä, Finland
Duration: 12 May 200513 May 2005

Conference

ConferenceOptics Days - Optiikan päivät 2005
CountryFinland
CityJyväskylä
Period12/05/0513/05/05

Fingerprint

SOI (semiconductors)
insulators
waveguides
silicon
integrated circuits
etching
wafers
photonics
fabrication
propagation
optical waveguides
chips
fibers
ions

Keywords

  • integrated optics
  • optical waveguides
  • silicon-on-insulator

Cite this

Solehmainen, K., Aalto, T., Kapulainen, M., & Harjanne, M. (2005). Low-loss silicon-on-insulator waveguides. In Proceedings of Optics Days 2005 [61] Jyväskylä.
Solehmainen, Kimmo ; Aalto, Timo ; Kapulainen, Markku ; Harjanne, Mikko. / Low-loss silicon-on-insulator waveguides. Proceedings of Optics Days 2005. Jyväskylä, 2005.
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title = "Low-loss silicon-on-insulator waveguides",
abstract = "The aim of photonic integrated circuits (PICs) is to realise a variety of different optical components on a single chip. Silicon-on-insulator technology is a promising candidate for realising PICs with advanced properties. In this work, a fabrication process based on dry silicon etching was developed to produce SOI optical waveguides. The base for the waveguide fabrication was a 10 cm diameter SOI wafer with a 10 µm thick device layer. The silicon etching was done with an inductively coupled plasma type reactive ion etcher. High propagation loss measurement accuracy was achieved by using a long waveguide, which diminishes the effect of the fiber-coupling losses. A 114 cm long waveguide was fitted on the 10 cm SOI wafer in a form of a spiral. As a result, propagation loss 0.13 ± 0.02 dB/cm was measured at 1550 nm for the fundamental mode in a rib-type SOI waveguide.",
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author = "Kimmo Solehmainen and Timo Aalto and Markku Kapulainen and Mikko Harjanne",
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Solehmainen, K, Aalto, T, Kapulainen, M & Harjanne, M 2005, Low-loss silicon-on-insulator waveguides. in Proceedings of Optics Days 2005., 61, Jyväskylä, Optics Days - Optiikan päivät 2005, Jyväskylä, Finland, 12/05/05.

Low-loss silicon-on-insulator waveguides. / Solehmainen, Kimmo; Aalto, Timo; Kapulainen, Markku; Harjanne, Mikko.

Proceedings of Optics Days 2005. Jyväskylä, 2005. 61.

Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientific

TY - GEN

T1 - Low-loss silicon-on-insulator waveguides

AU - Solehmainen, Kimmo

AU - Aalto, Timo

AU - Kapulainen, Markku

AU - Harjanne, Mikko

N1 - CA2: TTE6 CA: TTE Project code: T4SU00310

PY - 2005

Y1 - 2005

N2 - The aim of photonic integrated circuits (PICs) is to realise a variety of different optical components on a single chip. Silicon-on-insulator technology is a promising candidate for realising PICs with advanced properties. In this work, a fabrication process based on dry silicon etching was developed to produce SOI optical waveguides. The base for the waveguide fabrication was a 10 cm diameter SOI wafer with a 10 µm thick device layer. The silicon etching was done with an inductively coupled plasma type reactive ion etcher. High propagation loss measurement accuracy was achieved by using a long waveguide, which diminishes the effect of the fiber-coupling losses. A 114 cm long waveguide was fitted on the 10 cm SOI wafer in a form of a spiral. As a result, propagation loss 0.13 ± 0.02 dB/cm was measured at 1550 nm for the fundamental mode in a rib-type SOI waveguide.

AB - The aim of photonic integrated circuits (PICs) is to realise a variety of different optical components on a single chip. Silicon-on-insulator technology is a promising candidate for realising PICs with advanced properties. In this work, a fabrication process based on dry silicon etching was developed to produce SOI optical waveguides. The base for the waveguide fabrication was a 10 cm diameter SOI wafer with a 10 µm thick device layer. The silicon etching was done with an inductively coupled plasma type reactive ion etcher. High propagation loss measurement accuracy was achieved by using a long waveguide, which diminishes the effect of the fiber-coupling losses. A 114 cm long waveguide was fitted on the 10 cm SOI wafer in a form of a spiral. As a result, propagation loss 0.13 ± 0.02 dB/cm was measured at 1550 nm for the fundamental mode in a rib-type SOI waveguide.

KW - integrated optics

KW - optical waveguides

KW - silicon-on-insulator

M3 - Conference article in proceedings

BT - Proceedings of Optics Days 2005

CY - Jyväskylä

ER -

Solehmainen K, Aalto T, Kapulainen M, Harjanne M. Low-loss silicon-on-insulator waveguides. In Proceedings of Optics Days 2005. Jyväskylä. 2005. 61